Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock for Sale

Oxford Plasmalab System 100 for immediate sale.
The Oxford Plasmalab 100 is a modular plasma processing system. It can be configured to carry out Reactive Ion Etching (RIE), Plasma Enhanced Chemical Vapour Deposition (PECVD) and Inductively Coupled Plasma (ICP) processes.
The system can be tailored to suit different rates of throughput using transfer and load lock chambers with manual or automatic loading.
Combinations of processes can be achieved by using a transfer chamber robot to serve up to four process chambers.

System Description:
-One Machine with 2 Process Modules and one Square LoadLock in between,
-Left Chamber: PECVD (No turbo).
-Right Chamber ICP/RIE (with Turbo) and ENDPOINT DETECTOR(LASER),1 Quartz Clamp 6".
-LoadLock- Square with rotating arm.

-PLC are the original version of "Black" PLC.
-Computer Oxford Software  Version-PC2000
-Also included: Mechanical Oil pump qty 3 Pumps.
-One Chiller attached to ICP/RIE
-2 Gas Pods:
PECVD- SiH4 (silane)
              N2O
              NH3 (ammonia)
              Another 3 gas lines available (not in use now)
ICP/RIE-C4F8
               O2
               He
               Another 1 gas line available (not in use now)
NOTE: The machine is complete, nothing is missing, and it is ready to be installed and operated. Please refer to the attached photos showing the system for details.