Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
66389 | AMAT | Centura WxZ 3ch | 1 | as is where is | ||||
86674 | AMAT | Ultima + | HDP CVD CHAMBER | 2 | as is where is | |||
86675 | AMAT | Ultima PLUS | HDP CVD tool | 1 | inquire | immediately | ||
86136 | Applied Materials | PRODUCER_SE_2CH | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
87078 | Applied Materials | Centura Ultima X | HDP CVD, 2 chamber | 300 mm | 31.05.2003 | 1 | as is where is | immediately |
87897 | Applied Materials | P5000 SACVD | CVD | 200 mm | 31.05.1996 | 1 | as is where is | |
87899 | Applied Materials | Centura Ultima X | CVD | 300 mm | 1 | as is where is | ||
91046 | APPLIED MATERIALS | PRODUCER SE_BPSG (2CH) | CVD | 300 mm | 31.05.2006 | 1 | as is where is | |
91145 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
91146 | Applied Materials | CENTURA 5200 | WxZ | 200 mm | 1 | as is where is | ||
91147 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
91148 | Applied Materials | CENTURA 5200 | DxZ (TEOS) | 200 mm | 31.05.1996 | 1 | as is where is | |
91149 | Applied Materials | CENTURA 5200 | WXP (2CVD/2ETCH) | 200 mm | 31.05.2005 | 1 | as is where is | immediately |
91150 | Applied Materials | CENTURA 5200 | DLH | 200 mm | 1 | as is where is | ||
91152 | Applied Materials | CENTURA 5200 | DxZ (SLAINE) | 200 mm | 31.05.1997 | 1 | as is where is | |
91153 | Applied Materials | CENTURA 5200 | WxZ | 200 mm | 1 | as is where is | ||
91156 | Applied Materials | Centura Ultima X | Ultima_X RPS TYPE | 300 mm | 1 | as is where is | ||
91157 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91161 | Applied Materials | Centura WCVD | WSIX(OPTIMA) 4 chamber WxZ | 200 mm | 31.05.2002 | 1 | as is where is | immediately |
91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
91163 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91164 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91165 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
91166 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 31.05.1999 | 1 | as is where is | |
91167 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
91171 | Applied Materials | P5000 | WXZ 1ch, sputter 1ch | 150 mm | 31.05.1999 | 1 | as is where is | |
91172 | Applied Materials | P5000 | WXZ 2ch, sputter 1ch | 200 mm | 31.05.1995 | 1 | as is where is | |
91173 | Applied Materials | P5000 | WXZ | 200 mm | 31.05.1995 | 1 | as is where is | |
91174 | Applied Materials | P5000 | PECVD | 200 mm | 31.05.1995 | 1 | as is where is | |
91175 | Applied Materials | P5000 | WXZ 1ch, sputter 1ch | 150 mm | 31.05.1995 | 1 | as is where is | |
91176 | Applied Materials | P5000 | WXZ Mark II | 200 mm | 31.05.1996 | 1 | as is where is | |
91181 | Applied Materials | P5000 CVD | Delta TEOS 3ch + Sputter 1Ch | 200 mm | 31.05.2000 | 1 | as is where is | |
91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | |
91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
91184 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1995 | 1 | as is where is | |
91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | |
91187 | Applied Materials | P5000 CVD | Delta Teos 3ch, Etch 1ch | 200 mm | 31.05.1998 | 1 | as is where is | |
91188 | Applied Materials | P5000 CVD | Delta Teos 3ch, sputter 1ch | 200 mm | 1 | as is where is | ||
91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
91191 | Applied Materials | P5000 Mark-II CVD | DxL Nitride | 200 mm | 1 | as is where is | ||
91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
91197 | Applied Materials | P5000 Mark-II CVD+Etch | SACVD Delta TEOS 3Ch, Etch 1ch | 200 mm | 31.05.1996 | 1 | as is where is | |
91198 | Applied Materials | P5000 Mark-II CVD+Etch | Delta TEOS 3Ch, Etch 1ch | 200 mm | 31.05.1997 | 1 | as is where is | |
91199 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Etch 2Ch | 200 mm | 31.05.1997 | 1 | as is where is | |
91200 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 31.05.1997 | 1 | as is where is | |
91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 31.05.2000 | 1 | as is where is | |
91202 | Applied Materials | P5000 SACVD | Delta TEOS sacvd 3ch + Sputter 1Ch | 200 mm | 31.05.2000 | 1 | as is where is | immediately |
91203 | Applied Materials | P5000 SACVD | Delta | 1 | as is where is | |||
91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
91206 | Applied Materials | P5000 WCVD | WXZ | 150 mm | 1 | as is where is | ||
91207 | Applied Materials | P5000 WCVD | WxZ Metal | 200 mm | 1 | as is where is | ||
91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
91210 | Applied Materials | Producer GT Chamber (C) | SICONI Chamber only | 300 mm | 1 | as is where is | immediately | |
91211 | Applied Materials | Producer SE | BPSG Server OS Type | 300 mm | 31.05.2006 | 1 | as is where is | |
91212 | Applied Materials | Producer SE | TEOS | 300 mm 3 chambers | 31.05.2007 | 1 | as is where is | |
91213 | Applied Materials | Producer SE | SILANE Server OS Type | 300 mm | 31.05.2011 | 1 | as is where is | |
91691 | Applied Materials | Producer S TEOS/SiN | CVD System | 200 mm | 31.05.2005 | 1 | inquire | 1 month |
92429 | Applied Materials | P5000 | CVD | 1 | inquire | |||
93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | |
93052 | Applied Materials | P5000 | WXZ | 150 mm | 31.05.1991 | 1 | as is where is | |
93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | |
93895 | Applied Materials | Centura PC-II CH. | Chamber | 200 mm | 1 | as is where is | 1 month | |
94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
94517 | Applied Materials | Producer SE | ACL | 300 mm | 31.05.2007 | 1 | as is where is | |
94518 | Applied Materials | Producer SE | Low K(BD2) | 300 mm | 31.05.2009 | 1 | as is where is | |
95545 | Applied Materials | Centura Ultima | DCVD cluster tool, 2 chamber HDP CVD | 200 mm | 31.05.1997 | 1 | as is where is | immediately |
97220 | Applied Materials | PRODUCER GT | CVD System | 300 mm | 30.09.2006 | 1 | as is where is | immediately |
98078 | Applied Materials | P5000 | TEOS | 150 mm | 31.05.1990 | 1 | as is where is | |
98079 | Applied Materials | P5000 | PECVD | 120 mm | 1 | as is where is | ||
98081 | Applied Materials | Producer GT Chamber | Low K | 300 mm | 31.05.2017 | 1 | as is where is | |
98082 | Applied Materials | Producer SE | ACL | 300 mm | 31.05.2007 | 1 | as is where is | |
98263 | Applied Materials | ULTIMA X | HDP | 300 mm | 31.05.2005 | 1 | as is where is | |
98514 | Applied Materials | P5000 | PE CVD | 200 mm | 1 | as is where is | ||
98825 | Applied Materials | PRODUCER-GT | CVD | 300 mm | 31.05.2012 | 1 | as is where is | |
99296 | Applied Materials | P5000 | 4 CH system with 2 x SiN CVD, 2 x Etch | 150 mm | 31.05.1994 | 1 | as is where is | immediately |
99297 | Applied Materials | P5000 | CVD with 2 CH etch, 2 CH CVD TEOS | 200 mm | 30.11.1996 | 1 | as is where is | immediately |
99847 | Applied Materials | P5000 | PECVD | 200 mm | 31.10.1994 | 1 | inquire | |
100079 | Applied Materials | Centura AP Ultima X | HDP CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
100915 | Applied Materials | PRODUCER GT | CVD System | 300 mm | 31.05.2009 | 1 | as is where is | |
100916 | Applied Materials | PRODUCER SE (3-Twin) | HARP-USG CVD | 300 mm | 31.05.2002 | 1 | as is where is | |
101377 | Applied Materials | P5000 Mark II | PECVD | 200 mm | 1 | as is where is | immediately | |
101405 | Applied Materials | Centura AP iSprint | Metal CVD | 300mm | 1 | as is where is | ||
101410 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101411 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101412 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101413 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101414 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101415 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101416 | Applied Materials | Producer GT Eterna FCVD | PECVD | 300mm | 1 | as is where is | ||
101537 | Applied Materials | PRODUCER-SE | CVD | 300 mm | 31.05.2007 | 1 | as is where is | immediately |
101728 | Applied Materials | P5000 | PECVD | 31.05.1995 | 1 | inquire | ||
102080 | Applied Materials | Centura AP iSPRINT | ALD /CVD SSW Metal CVD | 300 mm | 31.05.2008 | 1 | as is where is | |
102106 | Applied Materials | Olympia | SiN, LowK, ALD | 300 mm | 31.05.2015 | 1 | as is where is | |
102107 | Applied Materials | P5000 | LTO CVD, TEOS | 200 mm | 31.05.1996 | 1 | as is where is | |
102108 | Applied Materials | P5000 | TEOS | 150 mm | 31.05.1988 | 1 | as is where is | |
102116 | Applied Materials | Producer GT Chamber | CVD, BloK, CVD | 300 mm | 31.05.2014 | 1 | as is where is | |
102118 | Applied Materials | Producer SE | PETEOS | 300 mm | 31.05.2003 | 1 | as is where is | |
102119 | Applied Materials | Producer SE | HT-SiN | 300 mm | 31.05.2004 | 1 | as is where is | |
102120 | Applied Materials | Producer SE | PETEOS | 300 mm | 31.05.2006 | 1 | as is where is | |
102662 | Applied Materials | Centura AP Ultima X | HDP CVD 3 chamber Ultima STI Process | 300 mm | 31.03.2007 | 1 | as is where is | |
102663 | Applied Materials | Centura AP Ultima X | HDP CVD 3 chamber Ultima | 300 mm | 31.05.2005 | 1 | as is where is | |
102664 | Applied Materials | Centura AP Ultima X | HDP CVD 3 chamber Ultima | 300 mm | 31.05.2005 | 1 | as is where is | |
102667 | Applied Materials | Producer GT Eterna FCVD | PECVD DCVD TYPE | 300 mm | 1 | as is where is | ||
102668 | Applied Materials | Producer GT Eterna FCVD | PECVD FCVD TYPE | 300 mm | 1 | as is where is | ||
102669 | Applied Materials | Producer SE APF | PECVD 2CH APF | 300 mm | 31.05.2005 | 1 | as is where is | |
102855 | Applied Materials | Centura 5200 | WxP Chamber (Mechanical Clamp Chuck) Tungsten etch Back | 200 mm | 4 | as is where is | ||
102857 | Applied Materials | P5000 | PECVD TEOS with 3 x SACVD chambers | 200 mm | 1 | as is where is | ||
103448 | Applied Materials | Producer SE | HT-ACL | 300 mm | 1 | as is where is | ||
103479 | Applied Materials | CENTURA ULTIMA X | ULITMA_X / Server OS type | 300 mm | 1 | as is where is | ||
103480 | Applied Materials | CENTURA ULTIMA X | ULITMA_X / Server OS type | 300 mm | 1 | as is where is | ||
103481 | Applied Materials | CENTURA ULTIMA X | CVD ULITMA_X / Server OS type | 300 mm | 31.05.2007 | 1 | as is where is | |
103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | |
103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | |
103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | |
103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | ||
103682 | Applied Materials | P5000 | CVD (4 Chamber) | 200 mm | 31.05.2001 | 1 | as is where is | |
106013 | Applied Materials | Producer | GT | 31.05.2010 | 2 | as is where is | ||
103066 | Applied Materials AKT | AKT Applied G5 PECVD 5.7 | PECVD (Chemical Vapor Deposition) | G5 | 1 | as is where is | ||
106005 | Applied Materials AMAT | Producer GT | CVD system | 300 mm | 31.05.2010 | 1 | as is where is | immediately |
88464 | ASM | Dragon 2300 | PECVD Equipment for Barrier | 300 MM | 31.05.2003 | 1 | as is where is | |
95767 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 31.07.2005 | 1 | as is where is | |
97592 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 30.04.2005 | 1 | as is where is | |
97593 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
97594 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
97598 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
99118 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 31.12.2007 | 1 | as is where is | immediately |
100097 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
100098 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300mm | 30.04.2005 | 1 | as is where is | |
102682 | ASM | Eagle XP | 4 Chamber TEOS PE CVD | 300 mm | 31.12.2008 | 1 | as is where is | immediately |
102683 | ASM | Eagle-12 Rapidfire | 3 Chamber TEOS PE CVD | 300 mm | 30.04.2007 | 1 | as is where is | |
103219 | ASM | Eagle XP | PECVD (Chemical Vapor Deposition) | 300 mm | 31.08.2007 | 1 | as is where is | immediately |
98502 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98503 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98504 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
98505 | Canon | APT-5800 | AP CVD | 200 mm | 1 | as is where is | ||
99059 | CVD Equipment Corporation | Easy Tube 3000 | CVD SYSTEM WITH GLOVE BOX | 30.04.2013 | 1 | as is where is | ||
98349 | LAM Research | VECTOR | CVD | 300 mm | 31.05.2005 | 1 | inquire | |
98350 | LAM Research | VECTOR | CVD | 300 mm | 31.05.2005 | 1 | inquire | |
98612 | LAM Research | VECTOR EXPRESS | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
99921 | LAM Research | SPEED | HDP CVD | 300 mm | 31.05.2005 | 1 | as is where is | |
100037 | LAM Research | Vector Express | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
100919 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2001 | 1 | as is where is | |
100920 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | |
100921 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2003 | 1 | as is where is | |
103449 | LAM Research | Vector Express AHM | PECVD | 300 mm | 31.05.2011 | 1 | as is where is | |
97000 | Novellus | SPEED C2 Concept Two | CVD-System | 200 mm | 31.05.2001 | 1 | as is where is | immediately |
97002 | Novellus | SPEED C2 Concept Two | CVD-System | 200 mm | 31.05.1998 | 1 | as is where is | immediately |
66390 | Novellus | 676 | 1 | as is where is | ||||
66392 | Novellus | 676 | 1 | as is where is | ||||
84041 | Novellus | Concept 2 Dual Altus (Shrink) | CVD system for Tungsten Deposition | 200 mm | 1 | inquire | immediately | |
88471 | Novellus | C3 Speed NEXT | HDP | 300 MM | 31.05.2004 | 1 | as is where is | |
88479 | Novellus | Vector Extreme | CVD | 300 MM | 31.05.2010 | 1 | as is where is | |
91030 | Novellus | Concept 2 Dual Speed | HDP CVD system, 2 chamber | 200 mm | 1 | inquire | immediately | |
91218 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
91219 | NOVELLUS | CONCEPT 3 GAMMA 2130 | 300 mm | 1 | as is where is | |||
91220 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | |
91221 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2006 | 1 | as is where is | |
91222 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | |
91223 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | |
91224 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2007 | 1 | as is where is | |
91225 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | |
91226 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | |
91233 | NOVELLUS | NOVELLUS CONCEPT 3 INOVA | NEXT | 300 mm | 31.05.2010 | 1 | as is where is | |
92748 | Novellus | Vector Express | PESiN/PETEOS (CVD) | 300 mm | 31.05.2004 | 1 | as is where is | |
94542 | Novellus | Vector | SiO2/SiN, BL ARC | 300 mm | 31.05.2005 | 1 | as is where is | |
95854 | Novellus | Concept Three Altus Max EFX | WCVD (Chemical Vapor Deposition) | 300 mm | 31.05.2014 | 1 | as is where is | |
97183 | Novellus | C2 Dual Speed Sequel | CVD System | 200 mm | 1 | 3 months | ||
98295 | NOVELLUS | VECTOR | CVD | 300 mm | 31.05.2012 | 1 | as is where is | |
99867 | Novellus | Concept One | PECVD Nitride/TEOS | 1 | inquire | |||
100924 | NOVELLUS | VECTOR EXTREME | PECVD Nitride | 300 mm | 31.05.2007 | 1 | as is where is | |
100925 | NOVELLUS | VECTOR EXTREME | PECVD Nitride | 300 mm | 31.05.2007 | 1 | as is where is | |
100926 | NOVELLUS | VECTOR EXTREME | PECVD Nitride | 300 mm | 31.05.2007 | 1 | as is where is | |
103112 | Novellus | Concept Three Altus | W CVD | 300mm | 1 | as is where is | ||
103113 | Novellus | Concept Three Altus | W CVD | 300mm | 1 | as is where is | ||
103114 | Novellus | Concept Three Altus Max | W CVD | 300mm | 1 | as is where is | ||
103546 | NOVELLUS | VECTOR | PECVD Nitride | 300 mm | 31.05.2005 | 1 | as is where is | |
98419 | Oxford | 100 Plus | PECVD Nitride System | 150 mm | 1 | as is where is | ||
99399 | Oxford | Micro-dep 300 | PE CVD system (For spares use) | 1 | as is where is | immediately | ||
98420 | Plasma Therm | 790 | PE CVD System | 150/200 mm | 1 | as is where is | ||
103009 | Plasma-Therm | 730/740 | PECVD, Plasma Etch, Reactive Ion Etch | 200 mm | 1 | as is where is | immediately | |
103012 | Plasma-Therm | VLR 700 VLR-PM1-ICRB-PM | Single Chamber PECVD | 31.05.1999 | 1 | as is where is | ||
91047 | PLASMATHERM | 7300 | PECVD SYSTEM | 200 mm | 31.05.1996 | 1 | as is where is | |
103661 | Plasmatherm | SLR 720 | PECVD RIE System | 1 | as is where is | |||
100746 | Samco | PD-2400L | PECVD | 1 | as is where is | |||
103703 | Shibaura | CDE300 | Isotropic Dry Etcher | 300 mm | 31.05.2005 | 1 | as is where is | |
101009 | SPTS | Trikon Delta | CVD | 100 mm | 31.05.2003 | 1 | as is where is | immediately |
98013 | TEL | MB2-730-Wsi | CVD | 200 mm | 1 | as is where is | ||
21064 | TEL TOKYO ELECTRON | MB2 730 HT HT | CVD SYSTEM, 2 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
21270 | TEL TOKYO ELECTRON | MB2 730HT | CVD SYSTEM, 3 CHAMBER WSi Process | 200 mm | 01.08.1996 | 1 | as is where is | immediately |
84346 | TEL Tokyo Electron | Vigas Chamber | Vigas chamber | 1 | as is where is | |||
87822 | TEL TOKYO ELECTRON | Trias | 2 chamber metal CVD cluster tool | 300 MM | 31.05.2002 | 1 | as is where is | immediately |
88485 | TEL Tokyo Electron | Trias | CVD TiN | 300 MM | 31.05.2004 | 1 | as is where is | |
88486 | TEL Tokyo Electron | Trias | Metal | 300 MM | 31.05.2012 | 1 | as is where is | |
90943 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
90944 | TEL Tokyo Electron | Trias SPA | CVD | 300 mm | 31.05.2010 | 1 | as is where is | |
91239 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91240 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91241 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91242 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (N2/H2/CIF3) | 300 mm | 1 | as is where is | ||
91243 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91244 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI (NH3/H2/CIF3) | 300 mm | 1 | as is where is | ||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
92747 | TEL Tokyo Electron | Trias | ALD TiN (CVD) | 300 mm | 31.05.2013 | 1 | as is where is | |
93054 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
93055 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
93056 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
93057 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TI/TIN (N2/NH3/H2/Ar/CIF3) | 300 MM | 1 | as is where is | ||
95013 | TEL Tokyo Electron | SPA-TRIAS | Niride CVD | 200 MM / 300 MM | 31.05.2008 | 0 | as is where is | |
97038 | TEL Tokyo Electron | TRIAS | PECVD Oxynitride | 300 mm | 31.05.2008 | 1 | as is where is | |
97826 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
98190 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
98191 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
98192 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
98193 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 1 | as is where is | ||
98194 | TEL Tokyo Electron | Trias | CVD Ti | 300 mm | 31.05.2016 | 1 | as is where is | |
98307 | TEL Tokyo Electron | TRIAS | CVD | 300 mm | 1 | as is where is | ||
98840 | TEL Tokyo Electron | INDY | Diffusion Furnace | 300 mm | 30.11.2012 | 1 | as is where is | |
100314 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.05.2007 | 1 | as is where is | |
100315 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
100323 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 31.01.2014 | 1 | as is where is | |
102436 | TEL Tokyo Electron | Trias | CVD TiN | 300 mm | 31.05.2006 | 1 | as is where is | |
102827 | TEL Tokyo Electron | Trias W | MOCVD 3 CH WHARD Type | 300 mm | 30.09.2013 | 1 | as is where is | |
102828 | TEL Tokyo Electron | Trias W | MOCVD 4 CH W HARD TYPE | 300 mm | 1 | as is where is | ||
102830 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) - Deposition Equipment | 300 mm | 1 | as is where is | ||
103133 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | ||
103135 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 28.02.2014 | 1 | as is where is | |
105785 | TEL Tokyo Electron | MB2 | CVD System | 1 | as is where is | |||
91246 | TEL/Varian | MB2-730 | WSIX | 200 mm | 31.05.1996 | 1 | as is where is | |
87901 | TES | CHALLENGER_ST | Plasma-Enhanced CVD system | 300 mm | 31.05.2010 | 1 | as is where is | |
98369 | ULTECH | LPCVD ULTECH#04 | CVD | 200 mm | 31.05.2004 | 1 | inquire | |
91249 | VARIAN | MBB | W CVD | 200 mm | 1 | as is where is | ||
103446 | Wonik IPS | MAHA SP | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | |
103447 | Wonik IPS | MAHA SP | CVD System | 300 mm | 31.05.2008 | 1 | as is where is |