Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 108131 | AMEC | PRIMO | 3CH Dry etcher | 300 mm | 1 | as is where is | ||
| 91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
| 91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 31.05.1993 | 1 | as is where is | |
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately |
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | |
| 93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
| 95928 | Applied Materials | Centura AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2016 | 1 | as is where is | |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | |
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | |
| 102856 | Applied Materials | Centura 5200 DPS II | Metal Etch with 2 x DPS2 Metal etch and 2 x Axiom CH | 300 mm | 31.05.2008 | 1 | as is where is | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | |
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | |
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | ||
| 103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | ||
| 103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | ||
| 103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103494 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 106339 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106340 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106341 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2010 | 1 | as is where is | |
| 106342 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106343 | Applied Materials | Centura ENABLER-E5 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106576 | Applied Materials | CENTURA DPS G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | |
| 106577 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106578 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106579 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106580 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 106581 | Applied Materials | CENTURA DPS G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | |
| 106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | ||
| 106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106617 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106619 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106620 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | ||
| 106625 | Applied Materials | PRODUCER GT | CH_A_FOX / CH_B_eHARP / Server OS Type | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106626 | Applied Materials | PRODUCER GT | Ht_Acl 3ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106627 | Applied Materials | PRODUCER GT | Siconi 3ch | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106628 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 106629 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 106630 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106632 | Applied Materials | Producer GT Chamber only | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106872 | Applied Materials | Centura AP AdvantEdge Minos Poly | Polysilicon Etch (3 CH ETCH AND 1 CH STRIP) | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | ||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | ||
| 108144 | Applied Materials | P5000 | Mark II Metal ETCH | 150 mm | 1 | as is where is | ||
| 108146 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 108316 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.12.2014 | 1 | as is where is | immediately |
| 108337 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 MESA 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 108338 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 Centris Mesa 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 108339 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 108340 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 1 | as is where is | immediately | |
| 108341 | Applied Materials | Centris SYM3Y Poly | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 108342 | Applied Materials | Centura AP - Mainframe Only (Poly Etch) | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108343 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 3 | as is where is | ||
| 108344 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108345 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 7 | as is where is | ||
| 108346 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | ||
| 108348 | Applied Materials | Centura AP ASP II - Chamber Only | Metal Etch | 300 mm | 1 | as is where is | ||
| 108349 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 3 | as is where is | ||
| 108350 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108351 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108360 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300 mm | 3 | as is where is | ||
| 108364 | Applied Materials | Producer GT Selectra | Selective Etch | 300 mm | 1 | as is where is | ||
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | |
| 106691 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2010 | 1 | as is where is | |
| 106692 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106693 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106694 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106695 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2014 | 1 | as is where is | |
| 106696 | LAM | 2300 FX EX+ CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106697 | LAM | 2300 MWAVE STRPR CHAMBER | MWAVE STRIP (POLY) | 300 mm | 01.06.2018 | 1 | as is where is | |
| 106699 | LAM | FLEX FX CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106701 | LAM | TORUS300K | DRY Bevel Etcher | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106852 | Lam | 2300 Exelan Flex 45 | Poly etcher, 4 chamber | 300 mm | 01.07.2006 | 1 | as is where is | immediately |
| 106856 | Lam | 2300 (CHAMBER) | Microwave Strip Chamber | 300 mm | 01.07.2006 | 1 | as is where is | immediately |
| 106874 | Lam | 2300 Exelan Flex | Dry Etcher with 3 chambers | 300 mm | 01.07.2004 | 1 | as is where is | immediately |
| 82257 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
| 82258 | Lam Research | 2300 EXELAN | Dry etcher | 8" | 01.06.2004 | 1 | as is where is | immediately |
| 91320 | LAM Research | EXELAN 2300 | OXIDE ETCH | 300 mm | 1 | as is where is | ||
| 98279 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 31.05.2008 | 1 | as is where is | |
| 98280 | LAM Research | FLEX GX E6 | OXIDE ETCH | 300 mm | 31.05.2008 | 1 | as is where is | |
| 102568 | LAM Research | TORUS 300K | Dry Etch | 2 | inquire | |||
| 102569 | LAM Research | TORUS 300S | Dry Etch | 2 | inquire | |||
| 103538 | LAM Research | INOVA Concept 3 | NExT | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106371 | Lam Research | 2300 Exelan Chamber | Dry etch cluster tool (Chamber) | 300 mm | 1 | as is where is | ||
| 106372 | Lam Research | 2300 Exelan Flex Chamber | Dry etch cluster tool (Chamber) | 300 mm | 1 | as is where is | ||
| 106373 | Lam Research | 2300 Exelan Flex Chamber | Dry etch cluster tool (Chamber) | 300 mm | 1 | as is where is | ||
| 106374 | Lam Research | 2300 SELIS Chamber | Dry etch cluster tool (Chamber) | 300 mm | 1 | as is where is | ||
| 106375 | Lam Research | 2300 Strip Chamber | Dry etch cluster tool (Chamber) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 106376 | Lam Research | 2300 Strip Chamber | Dry etch cluster tool (Chamber) | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106377 | Lam Research | 2300 Strip Chamber | Dry etch cluster tool (Chamber) | 300 mm | 01.06.2012 | 1 | as is where is | |
| 106379 | Lam Research | FLEX e4/EFEM | Dry etch cluster tool EFEM | 300 mm | 01.06.2020 | 1 | as is where is | |
| 106380 | Lam Research | FLEX e4/EFEM | Dry etch cluster tool EFEM | 300 mm | 01.06.2004 | 1 | as is where is | |
| 106386 | Lam Research | LAM 2300 FLEX45(3CH) | Dry etch cluster tool | 300 mm | 01.06.2008 | 1 | as is where is | |
| 106390 | Lam Research | RAINBOW 4520 | Dry Etcher | 200 mm | 1 | as is where is | ||
| 106392 | Lam Research | RAINBOW 4720 | Dry Etcher - Refurbished condition | 200 mm | 1 | as is where is | immediately | |
| 108012 | LAM Research | 2300E5 EXELAN FLEX EX | Dry etch cluster tool | 300 mm | 01.06.2010 | 1 | as is where is | |
| 108014 | LAM Research | LAM ALLIANCE6 9400PTX | Dry etch cluster tool | 200 mm | 1 | as is where is | ||
| 108015 | LAM Research | RAINBOW 4420 | Dry etcher | 200 mm | 1 | as is where is | ||
| 108016 | LAM Research | RAINBOW 4520i | Dry etcher | 200 mm | 1 | as is where is | ||
| 108017 | LAM Research | TCP9400SE | Dry etcher | 200 mm | 1 | as is where is | ||
| 108018 | LAM Research | TCP9600SE | Dry etcher | 200 mm | 1 | as is where is | ||
| 108167 | LAM Research | 2300 MWAVE STRPR | Chamber only | 300 mm | 01.06.2012 | 1 | as is where is | |
| 108168 | LAM Research | FLEX_GX_E6 | Oxide ETCH | 300 mm | 01.06.2008 | 1 | as is where is | |
| 108280 | LAM Research | TCP 9600SE | metal etcher | 01.06.1995 | 1 | as is where is | ||
| 108448 | LAM Research | 2300 Coronus | Wafer Edge Cleaning - Plasma | 300 mm | 1 | as is where is | ||
| 108449 | LAM Research | 2300 Exelan Flex | Dielectric Etch | 300 mm | 6 | as is where is | ||
| 108450 | LAM Research | 2300 Exelan Flex 45 | Dielectric Etch | 300 mm | 2 | as is where is | ||
| 108451 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108452 | LAM Research | 2300 Exelan Flex FX | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108453 | LAM Research | 2300 KIYO EX | Polysilicon Etch | 300 mm | 6 | as is where is | ||
| 108454 | LAM Research | 2300 Versys KIYO Poly | Polysilicon Etch | 300 mm | 4 | as is where is | ||
| 108455 | LAM Research | 2300 Versys Metal | Metal Etch | 300 mm | 1 | as is where is | ||
| 108456 | LAM Research | 2300e4 Exelan Flex ES | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108457 | LAM Research | 2300e4 Exelan Flex GXE | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108458 | LAM Research | 2300e5 Exelan Flex FX | Dielectric Etch | 300 mm | 2 | as is where is | ||
| 108459 | LAM Research | 2300e5 Exelan Flex Series - MF Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108460 | LAM Research | 2300e5 KIYO EX | Polysilicon Etch | 300 mm | 4 | as is where is | ||
| 108704 | Lam Research | 490 Autoetch | Polysilicon Dry Etcher | 150 mm | 01.06.1990 | 3 | inquire | immediately |
| 98284 | MATTSON | PARADIGME SI | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108578 | MATTSON | PARADIGM_SI | DRY ETCH | 300mm | 01.06.2012 | 1 | as is where is | immediately |
| 108579 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.05.2011 | 1 | as is where is | immediately |
| 91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | ||
| 99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | ||
| 108860 | OXFORD | 80 | Reactive Ion Etcher | 1 | inquire | |||
| 91330 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
| 91331 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | ||
| 108863 | PLASMA-THERM | 790 | Reactive Ion Etcher, Refurbished - Call for Details | 1 | inquire | |||
| 108864 | PLASMA-THERM | SLR770 | Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details | 1 | as is all rebuilt | immediately | ||
| 99403 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.04.1999 | 1 | as is where is | immediately |
| 103451 | Plasmatherm | SLR-770 ICP | Silicon Deep Etching | 100 mm | 01.05.1998 | 1 | as is where is | immediately |
| 106759 | Plasmatherm | SLR 770 | Dual Chamber R.I.E. | 200 mm | 01.06.1994 | 1 | as is where is | immediately |
| 95112 | PSK | EVOLITE2 | ETCH | - | 31.05.2011 | 1 | as is where is | |
| 106296 | PSK | SUPRA3 | ETCH | N/A | 01.06.2007 | 1 | as is where is | immediately |
| 106297 | PSK | SUPRA3 | ETCH | N/A | 01.06.2013 | 1 | as is where is | immediately |
| 86163 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
| 86164 | SAMCO | RIE-10N | RIE | 200 mm | 1 | as is where is | ||
| 86165 | SAMCO | RIE-10NR | RIE | 200 mm | 1 | as is where is | ||
| 91076 | SAMCO | RIE-10NR | ETCH | 200 mm | 31.05.2000 | 1 | as is where is | |
| 106736 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106737 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | |
| 79584 | SPTS | 320 PC | Reactive Ion Etcher -Manual loading for laboratory use | UP TO 200 mm | 01.05.1995 | 1 | as is where is | immediately |
| 102623 | SPTS | Omega 201 | Plasma Dry etcher (For spares use) | 200 mm | 01.05.2010 | 1 | as is where is | immediately |
| 83689 | Tegal | 981 | Nitride Dry Etcher | 200 mm | 01.06.1999 | 1 | as is where is | immediately |
| 106150 | Tegal | 903E | Dry Etcher | 150 mm | 1 | as is all rebuilt | immediately | |
| 106151 | TEGAL | 900 | Plasma dry etch | 100 mm | 01.10.1984 | 1 | as is where is | immediately |
| 106152 | TEGAL | 903E | Plasma dry etch | 100 mm | 01.06.1985 | 1 | as is where is | immediately |
| 91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | |
| 93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | |
| 93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
| 98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately |
| 98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately |
| 108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108121 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108122 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108123 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108124 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108125 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
| 108207 | TEL Tokyo Electron | VIGUS_NEST | Dry ETCHing System | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108208 | TEL Tokyo Electron | VIGUS_PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108504 | TEL Tokyo Electron | Tactras BX JIN | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108505 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108506 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 6 | as is where is | ||
| 108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108509 | TEL Tokyo Electron | Tactras Vesta NV4 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108510 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108511 | TEL Tokyo Electron | Tactras Vigus - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108512 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108513 | TEL Tokyo Electron | Tactras Vigus RK5 | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108526 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | ||
| 108528 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 3 | as is where is | ||
| 108537 | TEL Tokyo Electron | Unity Me 85 DRM | Dielectric Etch | 200 MM | 01.06.2013 | 1 | as is where is | immediately |
| 108538 | TEL Tokyo Electron | Unity Me 85 SCCM | Dielectric Etch | 200 MM | 1 | as is where is | ||
| 108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | |
| 106309 | ULVAC | NE-5700 | Metal Etcher | 150 mm | 01.06.2007 | 1 | as is where is | immediately |
| 106567 | Ulvac | FRE200E | XeF2 Etching System | 01.06.2018 | 1 | as is where is | immediately | |
| 108610 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | immediately |