DNS AS-2000 Post CMP cleaning system for sale

SDI fabsurplus.com is pleased to announce the availability of the following listed used DNS AS-2000 Post CMP cleaning system.
Please click on the "Get Quote" button at the end of the AS-2000 description, if you'd like to get a quotation, photos and specifications of this Post CMP cleaning system, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This DNS AS-2000 Post CMP cleaning system is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.

DNS AS-2000 Equipment Details

SDI ID:	114257
Manufacturer:	DNS
Model:	AS-2000
Description:	Post CMP cleaning system
Version:	200 mm
Vintage:	01.06.1999
Quantity:	1
Sales Condition:	as is where is
Lead Time:	immediately
Sales Price:	Inquire
Comments:	DNS® / DAINIPPON® AS-2000 A Compact CMP Wafer Cleaner with a High Throughput The DNS AS-2000 is a post-CMP cleaner designed so as to achive high productivity. By reducing wafer transfer and drying time, throughput is improved by 50% over previous models. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with a chemical mechanical polisher system is also possible. Key features: -The wet loader prevents wafer dehydration, enabling effective removal of slurries and other particles left on the wafers after CMP. -After cleaning both sides of a wafer with a disk brush, the wafer surface is precisely cleaned with a horizontally rotating brush. D-Sonic cleaning with 1.5MHZ ultrasonic DI water is also available. -Productivity It can process 60 or more wafers per hour. -Footprint is reduced by 25%. -Inline configuration with chemical mechanical polisher is available. -Can be applied to both post-oxide-CMP cleaning and post-metal-CMP cleaning. -This system was professionally de-installed from working condition in February 2024. -It is currently located at the warehouse and can be inspected by appointment. -It was used in the fab with a Mirra 3400 Polisher, which is also available for purchase. -It was used for Tungsten CMP. Process configuration is: Dual brush and top-side brush chambers, with spin dry. WAFER SIZE: 8 INCH PROCRESS TYPE: WET/ CMP COMPONENTS : MAINFRAME CHEMICAL CABINET x 2EA MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR AC TRANSFOMER FA-21000A PC SGD DRIVE_YASKAWA HF CIRCULATION FILTER UT3-F3AE-B TOUCH PANEL HFC-VWE HITACHI INVERTER RORZE CURT-2032-0 SLURRY FLOW CONTROLLER INTERFACE/ POWER BOX Item 1: MAIN FRAME 213 cm X 188 cm X 221 cm Item 2 CHEMICAL CABINET 1 76 cm X 135 cm X 206 cm Item 3 CHEMICAL CABINET 2 76 cm X 127 cm X 188 cm -The tool come with a decontamination certificate
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DNS AS-2000 Post CMP cleaning system for Sale

DNS AS-2000 Equipment Details

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