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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 111413 | AMAT | Centura RTP Vantage | 300mm | 1 | as is where is | immediately | |||
| 113408 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 111617 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 111622 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111624 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111625 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 111626 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
| 113420 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 108557 | Applied Materials | Centura EPI | Epitaxial Deposition, reduced pressure, 2 chamber | 300 mm | 01.05.2002 | 1 | as is where is | immediately | |
| 113421 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113422 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113423 | Applied Materials | Centura DTI | Plasma Etch | 150 mm | 01.06.2003 | 1 | as is where is | ||
| 111632 | Applied Materials | Centura Ultima Plus | HDP CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 113424 | Applied Materials | Centura DTI | Plasma Etch | 150 mm | 01.06.1998 | 1 | as is where is | ||
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | |||
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | |||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | |||
| 110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | |||
| 113693 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
| 113694 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113695 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | ||
| 113193 | Applied Materials | Centura AP AdvantEdge G5 Metal | Dry Etch | 300 mm | 1 | as is where is | |||
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher With 3 poly etch chambers and 1 axiom chamber | 300 mm | 01.01.2015 | 1 | as is where is | immediately | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher with 3 x DPS2 and 1 x Axiom CH | 300 mm | 01.04.2015 | 1 | as is where is | immediately | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | ||
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
| 108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | |||
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 109139 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 114005 | Applied Materials | Centura | MXP+ Oxide | 200 MM | 01.06.1998 | 1 | as is where is | ||
| 114006 | Applied Materials | Centura DPS + Metal | Metal 2ch, ASP+ 2ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 114007 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.1006 | 1 | as is where is | ||
| 114008 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.2007 | 1 | as is where is | ||
| 114009 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
| 114010 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2008 | 1 | as is where is | ||
| 114011 | Applied Materials | CENTURA DPS 2 | Poly 3ch / Axiom 1ch | 300 MM | 01.06.2010 | 1 | as is where is | ||
| 114012 | Applied Materials | CENTURA DPS 2 | Poly Etcher with 4ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | ||
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | ||
| 113008 | Applied Materials | CENTURA | DXZ | 200 mm | 1 | as is where is | |||
| 113009 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113010 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
| 110712 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1996 | 1 | as is where is | immediately | |
| 113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 110713 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1999 | 1 | as is where is | immediately | |
| 113017 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 113018 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2002 | 1 | as is where is | ||
| 113019 | Applied Materials | CENTURA PVD | Ti 2CH, Cu 1CH, Preclean 1CH | 200 mm | 01.06.2005 | 1 | as is where is | ||
| 114049 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114050 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 114051 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
| 114052 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
| 114053 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114054 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114055 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
| 114056 | Applied Materials | Centura SiNgen Chamber | LPCVD | 200 mm | 1 | as is where is | |||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | |||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | ||
| 113309 | Applied Materials | Centura AP Enabler E5 | Dielectric Etcher with 4 process chambers | 300 mm | 01.04.2010 | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
| 112080 | Applied Materials | Centura | CVD EPI + SiCoNi | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 112081 | Applied Materials | Centura | CVD RP EPI + SiCoNi | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112082 | Applied Materials | Centura 4.0 Radiance | RTP with 2 x Radiance Plus Toxic ATM chambers | 300 mm | 01.06.2001 | 1 | as is where is | ||
| 112083 | Applied Materials | Centura 4.0 Radiance | RTP with 2 x Radiance Plus Toxic ATM chambers | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 112084 | Applied Materials | Centura AP eMAX CT+ | Etch OX emax CT Plus 3 chambers | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112085 | Applied Materials | Centura AP ISPRINT | CVD VIA W, with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112086 | Applied Materials | Centura Avatar (Chamber) | Etch OX Chamber only, position D | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112087 | Applied Materials | Centura Axiom Chamber | Etch Strip Chamber only, without s/n | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 112088 | Applied Materials | Centura DPS Metal 4 chamber | Metal Etch DPS Metal*2CH, ASP+*2CH, Steelhead1 Chiller*3 | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 112089 | Applied Materials | Centura DPS2 4 chamber | Etch Poly 4x (D4) SILICON DPS II chamber,12 gas line ( Standard gas Line ) | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112090 | Applied Materials | Centura DPS2 532 Metal 3 chamber | Etch Metal with EFEM (Yaskawa, NT), TM, 2xDPS532, 1xAxiom, AC Rack, | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112091 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2014 | 1 | as is where is | ||
| 112603 | Applied Materials | Centura DPS | Metal etcher with 2 x DPS chambers and 2 x clean chambers | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 112092 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2015 | 1 | as is where is | ||
| 112604 | Applied Materials | Centura EPi SiCoNi Reduced Pressure | Reduced Pressure 2 x EPI deposition with1 x SiCoNi chamber | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
| 112093 | Applied Materials | Centura DPS2 Metal 3 chamber | Etch Metal with EFEM(Kawasaki, Server), TM, 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112605 | Applied Materials | Centura RTP XE+ | RTP system with TPCC XE+ RP AB: Gate-ox (DPN+RTO);C:Singen Spacer | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
| 112094 | Applied Materials | Centura DPS2 Metal 4 chamber | Etch Metal with Windows NT, DPS2 Metal x2CH, ASP2 x2CH | 300 mm | 1 | as is where is | |||
| 112095 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112096 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112097 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiller | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112098 | Applied Materials | Centura DPS2 Poly 3 chamber | Etch Poly with EFEM, TM, 2x DPS2 Poly, 1x Axiom, AC Rack | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112099 | Applied Materials | Centura DT Hart 3 chamber | Etch Oxide with EFEM, TM, 3x DT Hart, AC Rack, Chiller | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 112100 | Applied Materials | Centura Enabler Chamber | Etch Oxide Chamber only | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately | |
| 112101 | Applied Materials | Centura Enabler Chamber | Etch Oxide Chamber only | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately | |
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
| 109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 113403 | Applied Materials | 5200 Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113404 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.1999 | 1 | as is where is | ||
| 111613 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 113405 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.2001 | 1 | as is where is | ||
| 111614 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
| 113406 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113407 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 108162 | HYPERFLOW | CENTURA WET | Wafer Carrier Boat Wash System | 150 mm | 1 | as is where is |