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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 111341 | TEL (Tokyo Electron Ltd) | ACT 8 (Parts) | Carrier Send Block, SMIF | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 111907 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
| 113187 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon EX14, L to R flow | 200 mm | 01.06.2001 | 2 | as is where is | immediately | |
| 111908 | TEL TOKYO ELECTRON | CLEAN TRACK ACT 8 SINGLE BLOCK | Single Block (Resist Coater/Developer) | 200mm | 1 | as is where is | |||
| 113188 | TEL Tokyo Electron | ACT 8 | Single block DUV photo track with I/F for Nikon S204, L to R flow | 200 mm | 01.06.2001 | 1 | as is where is | immediately | |
| 108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately | |
| 112590 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
| 112591 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
| 112592 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 2C, 2D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2001 | 1 | as is where is | immediately | |
| 112593 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.1999 | 1 | as is where is | immediately | |
| 112594 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.06.2000 | 1 | as is where is | immediately | |
| 112595 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 112596 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 2C, 4D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 112597 | TEL TOKYO ELECTRON | ACT 8 | Single Block Photoresist Coater and Developer with 1C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately | |
| 112598 | TEL TOKYO ELECTRON | ACT 8 | Dual Block Photoresist Coater and Developer with 3C, 3D, R to L, ASML, i-line | 200 mm SMIF | 01.04.2000 | 1 | as is where is | immediately |