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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 113373 | Advantest | E7002-69520 | Pin Scale HCDPS� | SPARES | 1 | inquire | |||
| 84241 | Anaheim Automation | TM4500 AA4520 | Stepper controller/driver board | Spares | 1 | as is where is | immediately | ||
| 113408 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113420 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113421 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113422 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 110712 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1996 | 1 | as is where is | immediately | |
| 110713 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1999 | 1 | as is where is | immediately | |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | ||
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
| 113403 | Applied Materials | 5200 Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113404 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.1999 | 1 | as is where is | ||
| 113405 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.2001 | 1 | as is where is | ||
| 113406 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113407 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 111284 | AXCELIS | 17164520 | ELECTRODE FILAMENT, GPH, CG - AXCELIS HE3 | Spares | 5 | inquire | |||
| 111076 | Axcelis | 17308520 | LINER BOTTOM W-ELS, W, HIGH PURITY - AXCELIS HE3 | Spares | 5 | inquire | |||
| 82286 | ESA | ET5200LX2000 | Touch Screen Computer | spares | 01.10.2007 | 1 | as is where is | immediately | |
| 109611 | EVG | 520 | Wafer Bonder | 150 mm | 1 | inquire | |||
| 103140 | EVG | 520 | Manual Wafer Load Substrate Bonder | 150 mm | 01.05.2003 | 1 | as is where is | 2 months | |
| 74794 | Hitachi | S5200 | FE SEM with EDX | Inspection | 31.05.2005 | 1 | as is where is | immediately | |
| 112193 | Hitachi | S-5200 | Metrology FE-SEM | 200 mm | 01.06.2001 | 1 | as is where is | ||
| 113782 | JORDAN VALLEY | 5200 | Metrology XRF | 150 mm | 01.06.2003 | 1 | as is where is | ||
| 110686 | KLA | eDR-5200 PLUS | Defect Review Sem WITH DEFECT CLASSIFICATION CAPABILITY | 300 mm | 01.06.2009 | 1 | as is where is | immediately | |
| 113794 | KLA | 5200XP | Metrology Alignment \ Overlay Measurement | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113795 | KLA | 5200XP | Metrology Alignment \ Overlay Measurement | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113814 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 113815 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 113816 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 113817 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 113818 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113819 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113820 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 108103 | Shibuya | EH520 | TestHandler | TEST | 1 | as is where is | |||
| 106742 | SSM | Fastgate 5200 | Resistivity / CV Measurement | 200 mm | 01.06.2008 | 1 | as is where is | immediately | |
| 113677 | Thermco | THERMCO 5200 | BROOKS (AMAT) Sentinel, ver 2.4 - Furnace | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 111191 | Varian | E17292520 | BAR, CATHODE, IHC 80, W, HIGH PURITY - HC | Spares | 5 | inquire |