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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
109604 | Ulvac | Enviro | Downstream Microwave Asher | 1 | inquire | ||||
114215 | Ulvac | Entron-EX W300 | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
114216 | Ulvac | Entron-EX: Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | |||
112953 | ULVAC | NE 7800 | high-temperature, high-density plasma etching system | 01.10.2007 | 1 | as is where is | |||
106567 | Ulvac | FRE200E | XeF2 Etching System | 01.06.2018 | 1 | as is where is | immediately | ||
108903 | Ulvac | Ceraus ZX-1000 | PVD | 200 MM | 01.05.1996 | 1 | as is where is | immediately | |
108913 | Ulvac | Ceraus ZX-1000 | PVD Cluster tool | 200 MM | 01.05.1996 | 1 | as is where is | immediately | |
108914 | Ulvac | Ceraus ZX-1000 | PVD | 200 MM | 01.05.1995 | 1 | as is where is | immediately | |
108915 | Ulvac | Ceraus ZX-1000 | PVD Cluster tool | 200 MM | 01.05.2000 | 1 | as is where is | immediately | |
113276 | Ulvac | Entron-EX: Aluminum Interconnect | PVD Aluminium Interconnect process | 300 mm | 1 | as is where is | |||
108947 | Ulvac | Entron-EX W300 | PVD (Physical Vapor Deposition) cluster tool, 3 chamber | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
108948 | Ulvac | Entron-EX W300 | PVD (Physical Vapor Deposition) cluster tool, 3 x PVD chambers+ support chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
113317 | Ulvac | IH-860DSIC | High-temperature Ion Implanter for SiC | 100 mm | 01.06.2010 | 1 | as is where is | immediately | |
113318 | Ulvac | SOPHI-200 | Medium Current Ion Implanter for Thin Wafers | 150 mm | 01.06.2006 | 1 | as is where is | immediately | |
112567 | Ulvac | Entron EX W300 | PVD with 6 x process chamber, TMP-1003LM | 300 mm | 01.06.2007 | 1 | as is where is |