Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
---|---|---|---|---|---|---|---|---|---|
111579 | AMAT / Applied Materials | Centris MESA | Dry Etch cluster tool | 300 mm | 01.01.2011 | 4 | as is where is | immediately | |
91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | |||
91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | |||
91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | ||
91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | |||
91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 31.05.1993 | 1 | as is where is | ||
91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | |||
93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately | |
93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | ||
93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | ||
100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher With 3 poly etch chambers and 1 axiom chamber | 300 mm | 01.01.2015 | 1 | as is where is | immediately | |
100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher with 3 x DPS2 and 1 x Axiom CH | 300 mm | 01.04.2015 | 1 | as is where is | immediately | |
100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | ||
100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | ||
103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | ||
103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | ||
103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | ||
103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | ||
103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | |||
103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | |||
103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | |||
103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | |||
103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | ||
103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | ||
103494 | Applied Materials | DPS2 AE | POLY MESA (Dry Etch) | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | ||
103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 01.06.2014 | 1 | as is where is | immediately | |
106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | ||
106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | |||
106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | |||
106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | |||
108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | |||
108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | |||
108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | |||
108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | ||
109139 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately | |
109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately | |
109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately | |
109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | |||
110701 | Applied Materials | P5000 | Poly Etcher 2 Chamber | 150 mm | 01.06.1995 | 2 | as is where is | immediately | |
111613 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111614 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111617 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | |||
111622 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | |||
111624 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
111625 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
111626 | Applied Materials | Centura AP DPS II Polysilicon | Polysilicon Etch | 300mm | 1 | as is where is | |||
111639 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300mm | 1 | as is where is | |||
111640 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 1 | as is where is | ||||
111641 | Applied Materials | Producer Etch eXT Poly | Polysilicon Etch | 300mm | 1 | as is where is | |||
112084 | Applied Materials | Centura AP eMAX CT+ | Etch OX emax CT Plus 3 chambers | 300 mm | 01.06.2007 | 1 | as is where is | ||
112086 | Applied Materials | Centura Avatar (Chamber) | Etch OX Chamber only, position D | 300 mm | 01.06.2016 | 1 | as is where is | ||
112087 | Applied Materials | Centura Axiom Chamber | Etch Strip Chamber only, without s/n | 300 mm | 01.06.2004 | 1 | as is where is | ||
112088 | Applied Materials | Centura DPS Metal 4 chamber | Metal Etch DPS Metal*2CH, ASP+*2CH, Steelhead1 Chiller*3 | 200 mm | 01.06.2000 | 1 | as is where is | ||
112089 | Applied Materials | Centura DPS2 4 chamber | Etch Poly 4x (D4) SILICON DPS II chamber,12 gas line ( Standard gas Line ) | 300 mm | 01.06.2005 | 1 | as is where is | ||
112090 | Applied Materials | Centura DPS2 532 Metal 3 chamber | Etch Metal with EFEM (Yaskawa, NT), TM, 2xDPS532, 1xAxiom, AC Rack, | 300 mm | 01.06.2006 | 1 | as is where is | ||
112091 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2014 | 1 | as is where is | ||
112092 | Applied Materials | Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber | Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories | 300 mm | 01.06.2015 | 1 | as is where is | ||
112093 | Applied Materials | Centura DPS2 Metal 3 chamber | Etch Metal with EFEM(Kawasaki, Server), TM, 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote | 300 mm | 01.06.2005 | 1 | as is where is | ||
112094 | Applied Materials | Centura DPS2 Metal 4 chamber | Etch Metal with Windows NT, DPS2 Metal x2CH, ASP2 x2CH | 300 mm | 1 | as is where is | |||
112095 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller | 300 mm | 01.06.2006 | 1 | as is where is | ||
112096 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 | 300 mm | 01.06.2007 | 1 | as is where is | ||
112097 | Applied Materials | Centura DPS2 Poly 4 chamber | Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiller | 300 mm | 01.06.2007 | 1 | as is where is | ||
112098 | Applied Materials | Centura DPS2 Poly 3 chamber | Etch Poly with EFEM, TM, 2x DPS2 Poly, 1x Axiom, AC Rack | 300 mm | 01.06.2006 | 1 | as is where is | ||
112099 | Applied Materials | Centura DT Hart 3 chamber | Etch Oxide with EFEM, TM, 3x DT Hart, AC Rack, Chiller | 300 mm | 01.06.2002 | 1 | as is where is | ||
112100 | Applied Materials | Centura Enabler Chamber | Etch Oxide Chamber only | 300 mm | 01.06.2006 | 1 | as is where is | ||
112101 | Applied Materials | Centura Enabler Chamber | Etch Oxide Chamber only | 300 mm | 01.06.2006 | 1 | as is where is | ||
112103 | Applied Materials | DPS2 532 Metal Chamber | Etch Metal Chamber Only | 300 mm | 01.06.2004 | 1 | as is where is | ||
112113 | Applied Materials | P5000 | Etch Metal with 2x Metal, 1xASP | 150 mm | 1 | as is where is | |||
112603 | Applied Materials | Centura DPS | Metal etcher with 2 x DPS chambers and 2 x clean chambers | 200 mm | 01.06.2000 | 1 | as is where is | immediately | |
113009 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2011 | 1 | as is where is | ||
113010 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 mm | 01.06.2007 | 1 | as is where is | ||
113012 | Applied Materials | CENTURA DPS2 G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | ||
113015 | Applied Materials | CENTURA DPS2 G5 | Metal 3ch, Axiom 1ch | 300 mm | 01.06.2008 | 1 | as is where is | ||
113016 | Applied Materials | CENTURA DPS2 G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
113020 | Applied Materials | DPS2 G5-MESA EFEM ONLY | 300 mm | 1 | as is where is | ||||
113026 | Applied Materials | P5000 | 2 Metal | 1 | as is where is | ||||
113027 | Applied Materials | P5000 | 2 MXP oxide | 200 mm | 1 | as is where is | |||
113193 | Applied Materials | Centura AP AdvantEdge G5 Metal | Dry Etch | 300 mm | 1 | as is where is | |||
113309 | Applied Materials | Centura AP Enabler E5 | Dielectric Etcher with 4 process chambers | 300 mm | 01.04.2010 | 1 | as is where is | immediately | |
113404 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.1999 | 1 | as is where is | ||
113405 | Applied Materials | 5200 Centura DPS | Plasma Etch | 150 mm | 01.06.2001 | 1 | as is where is | ||
113423 | Applied Materials | Centura DTI | Plasma Etch | 150 mm | 01.06.2003 | 1 | as is where is | ||
113424 | Applied Materials | Centura DTI | Plasma Etch | 150 mm | 01.06.1998 | 1 | as is where is | ||
113426 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1996 | 1 | as is where is | ||
113427 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1993 | 1 | as is where is | ||
113428 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1992 | 1 | as is where is | ||
113429 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113434 | Applied Materials | P5000 | Plasma Etch | 200 mm | 01.06.1995 | 1 | as is where is | ||
113435 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1992 | 1 | as is where is | ||
113436 | Applied Materials | P5000 | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113438 | Applied Materials | P5000 dual chamber MxP | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113693 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113694 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113695 | Applied Materials | Centura MXP | Dry Etch Poly Poly/trench Etcher | 150 mm | 01.06.1995 | 1 | as is where is | ||
113949 | Applied Materials | 5200 Centura II | Metal Etch System - with 2 x DPS -DPM chambers | 200 mm | 01.04.2019 | 1 | as is where is | immediately | |
114005 | Applied Materials | Centura | MXP+ Oxide | 200 MM | 01.06.1998 | 1 | as is where is | ||
114006 | Applied Materials | Centura DPS + Metal | Metal 2ch, ASP+ 2ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
114007 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.1006 | 1 | as is where is | ||
114008 | Applied Materials | CENTURA DPS 2 | Metal 2ch / ASP 2ch | 300 MM | 01.06.2007 | 1 | as is where is | ||
114009 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
114010 | Applied Materials | CENTURA DPS 2 | Metal 3ch / ASP 1ch | 300 MM | 01.06.2008 | 1 | as is where is | ||
114011 | Applied Materials | CENTURA DPS 2 | Poly 3ch / Axiom 1ch | 300 MM | 01.06.2010 | 1 | as is where is | ||
114012 | Applied Materials | CENTURA DPS 2 | Poly Etcher with 4ch | 300 MM | 01.06.2006 | 1 | as is where is | ||
114013 | Applied Materials | DPS | Poly Etcher with 3ch | 200 MM | 01.06.2000 | 1 | as is where is | ||
114049 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114050 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
114051 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 1 | as is where is | |||
114052 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114053 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114054 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114055 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114022 | BMR | GAN (A49-3) | ETCH | 100 mm | 1 | as is where is | |||
113829 | Gasonics | AURA 2000 | DRY ETCH Dry Etch Silicon isotropic gasonic | 150 mm | 1 | as is where is | |||
113830 | Gasonics | AURA 2000 | DRY ETCH Dry Etch Silicon isotropic gasonic | 150 mm | 1 | as is where is | |||
112189 | Hitachi | M-501AW | Etch AL microwave etching equipment | 150 mm | 1 | as is where is | |||
106691 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2010 | 1 | as is where is | ||
106695 | LAM | 2300 CHAMBER ONLY | MWAVE STRIP (POLY) | 300 mm | 01.06.2014 | 1 | as is where is | ||
106696 | LAM | 2300 FX EX+ CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | immediately | |
106697 | LAM | 2300 MWAVE STRPR CHAMBER | MWAVE STRIP (POLY) | 300 mm | 01.06.2018 | 1 | as is where is | ||
106699 | LAM | FLEX FX CHAMBER ONLY | PLASMA OXIDE ETCH | 300 mm | 01.06.2013 | 1 | as is where is | ||
106701 | LAM | TORUS300K | DRY Bevel Etcher | 300 mm | 01.06.2006 | 1 | as is where is | ||
106874 | Lam | 2300 Exelan Flex | Dry Etcher with 3 chambers | 300 mm | 01.07.2004 | 1 | as is where is | immediately | |
112226 | Lam | 2300 Exelan Flex 4 chamber | Dielectric Etch, V2, with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | ||
112227 | Lam | 2300 Flex EX 3 chamber | Oxide etcher, V2 platform, with 3 chambers | 300 mm | 01.06.2010 | 1 | as is where is | ||
112228 | Lam | 2300 Kiyo 4 chamber | Etch Poly – 4 Kiyo CX chambers | 300 mm | 01.06.2007 | 1 | as is where is | ||
112234 | Lam | Rainbow 4420XL | Etch Poly | 150 mm, 200 mm | 01.06.1994 | 1 | as is where is | ||
113090 | LAM | TORUS300K | DRY Bevel Etcher | 300 mm | 01.06.2006 | 1 | as is where is | ||
113806 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113807 | LAM | 4400 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113808 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113809 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113810 | LAM | 4420 | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113811 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113812 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113813 | LAM | 4500 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113814 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113815 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113816 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113817 | LAM | 4520 | Oxide Etcher | 150 mm | 01.06.1993 | 1 | as is where is | ||
113818 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113819 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113820 | LAM | 4520i | Oxide Etcher (Isotropic) | 150 mm | 01.06.1995 | 1 | as is where is | ||
113821 | LAM | 9400 SE | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113822 | LAM | 9400 SE | Poly Etcher | 150 mm | 01.06.1994 | 1 | as is where is | ||
113823 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113824 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113825 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113826 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113827 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
113828 | LAM | 9600 SE | Metal etcher – fitted with ESC | 150 mm | 01.06.1993 | 1 | as is where is | ||
102568 | LAM Research | TORUS 300K | Dry Etch | 2 | inquire | ||||
102569 | LAM Research | TORUS 300S | Dry Etch | 2 | inquire | ||||
108167 | LAM Research | 2300 MWAVE STRPR | Chamber only | 300 mm | 01.06.2012 | 1 | as is where is | ||
108704 | Lam Research | 490 Autoetch | Polysilicon Dry Etcher | 150 mm | 01.06.1990 | 3 | inquire | immediately | |
109207 | LAM Research | 2300 Exelan Flex FX - Chamber Only | Dielectric Etch | 300mm | 1 | as is where is | |||
110728 | LAM Research | 2300 | Dry etch cluster tool Mainframe without chambers | 200 MM | 01.06.2008 | 1 | as is where is | immediately | |
111576 | LAM RESEARCH | 2300 EXELAN FLEX | Dry Etching Chamber (Suitable for spares use) | 300 mm | 01.01.2013 | 5 | as is where is | immediately | |
111814 | LAM Research | 2300 Versys Metal H | Metal Etch | 300mm | 1 | as is where is | |||
113228 | LAM Research | 2300 KIYO EX | Poly Etcher | 300 mm | 1 | as is where is | |||
113229 | LAM Research | 2300 KIYO EX | Poly Etcher | 300 mm | 1 | as is where is | |||
113234 | LAM Research | 2300e4 KIYO MCX | Dry Etch | 300 mm | 1 | as is where is | |||
113236 | LAM Research | 2300e5 Exelan Flex FX | Oxide Etcher | 300 mm | 1 | as is where is | |||
113237 | LAM Research | 2300e5 Exelan Flex FX | Oxide Etcher | 300 mm | 1 | as is where is | |||
113536 | Lam Research | 4506I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113537 | Lam Research | 4506I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113538 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113539 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113540 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | ||
113541 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113542 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113543 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113544 | Lam Research | 4526I | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | ||
113545 | Lam Research | 4526XL | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | ||
113546 | Lam Research | 4526XL | Plasma Etch | 150 mm | 01.06.2000 | 1 | as is where is | ||
113547 | Lam Research | 4528I | Plasma Etch | 200 mm | 1 | as is where is | |||
113548 | Lam Research | 4528XL | Plasma Etch | 200 mm | 1 | as is where is | |||
113553 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 1 | as is where is | |||
113554 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113555 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2002 | 1 | as is where is | ||
113556 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113557 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113558 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113559 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113560 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113561 | Lam Research | TCP 9600SE II standalone with DSQ | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
113562 | Lam Research | TCP 9600SE II standalone with DSQ - Plasma Etch | Plasma Etch | 150 mm | 01.06.2005 | 1 | as is where is | ||
114028 | LAM Research | 2300 EXELAN | FLEX 4CH Silicon Etcher | 300 MM | 01.06.2005 | 1 | as is where is | ||
114133 | LAM Research | 2300 Exelan Flex FX+ - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | |||
114134 | LAM Research | 2300 KIYO EX | Polysilicon Etch | 300 mm | 1 | as is where is | |||
114135 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
114136 | LAM Research | 2300 Versys Metal H | Metal Etch | 300 mm | 1 | as is where is | |||
114137 | LAM Research | 2300e4 KIYO EX Metal | Metal Etch | 1 | as is where is | ||||
114138 | LAM Research | 2300e6 Exelan Flex HX | Dielectric Etch | 300 mm | 1 | as is where is | |||
114139 | LAM Research | 2300e6 Exelan Flex HX | Dielectric Etch | 300 mm | 1 | as is where is | |||
113870 | Matrix | 403 | Poly Etcher | 150 mm | 01.06.1996 | 1 | as is where is | ||
98284 | MATTSON | PARADIGME SI | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108578 | MATTSON | PARADIGM_SI | DRY ETCH | 300mm | 01.06.2012 | 1 | as is where is | immediately | |
108579 | MATTSON | PARADIGM_SI | Poly-silicon etcher | 300 mm | 01.05.2011 | 1 | as is where is | immediately | |
109552 | Mattson | Aspen 3 ICP | Dual Chamber Light Etcher | 300 mm | 01.07.2008 | 1 | as is where is | immediately | |
112240 | Mattson | ParadigmE | Etch | 300 mm | 01.06.2012 | 1 | as is where is | ||
112241 | Mattson | ParadigmE XP | Light Etch | 300 mm | 01.06.2010 | 1 | as is where is | ||
112865 | Nexx Systems | Cirrus 300 | ECR PECVD RIE SYSTEM | 1 | as is where is | ||||
113593 | Oerlikon | Versaline | Plasma Etch | 150 mm | 01.06.2008 | 1 | as is where is | ||
91329 | OXFORD | 800+ | RIE (Reactive Ion Etcher) | 1 | as is where is | immediately | |||
99398 | Oxford | Micro-etch 300 | Dry Etcher | 1 | as is where is | immediately | |||
111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
113117 | OXFORD | 800 | RIE | 125 mm | 1 | as is where is | |||
113981 | Oxford | Plasmalab 100 ICP 180 | Dry Etcher | 200 mm | 1 | inquire | |||
91330 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | |||
91331 | Plasma Therm | Wafer/ Batch 740 | DUAL PLASMA ETCH AND RIE | 4" | 1 | as is where is | |||
108863 | PLASMA-THERM | 790 | Reactive Ion Etcher, Refurbished - Call for Details | 1 | inquire | ||||
108864 | PLASMA-THERM | SLR770 | Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details | 1 | as is all rebuilt | immediately | |||
112902 | Plasma-Therm | 790 | RIE PECVD | 1 | as is where is | ||||
112903 | Plasma-Therm | 790 ICP | Etcher | 1 | as is where is | ||||
112904 | Plasma-Therm | BT | Reactive Ion Etch System | 150 mm | 1 | as is where is | |||
112906 | Plasma-Therm | VII 734 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112907 | Plasma-Therm | VII 734MF | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112908 | Plasma-Therm | Wafer Batch 740/740 | Reactive Ion Etch System | 200 mm | 1 | as is where is | |||
112909 | Plasma-Therm | 73/74 | PECVD/Plasma Etch/Reactive Ion Etch | 200 mm | 1 | as is where is | |||
103451 | Plasmatherm | SLR-770 ICP | Silicon Deep Etching | 100 mm | 01.05.1998 | 1 | as is where is | immediately | |
106759 | Plasmatherm | SLR 770 | Dual Chamber R.I.E. | 200 mm | 01.06.1994 | 1 | as is where is | immediately | |
109586 | Plasmatherm | SLR 720 | RIE Etcher | 150 mm | 1 | inquire | |||
110613 | PlasmaTherm | SLR 740 | Dual Chamber RIE / Plasma etch | 200 mm | 01.04.1999 | 1 | as is where is | immediately | |
111602 | PlasmaTherm | SLR 770 ICP | Deep Silicon Etcher | 4 inch | 01.06.1998 | 1 | as is where is | immediately | |
111603 | PlasmaTherm | Versaline DSE-III | Deep Silicon Etcher | 4,6 and 8 inch | 01.06.2012 | 1 | as is where is | immediately | |
114158 | PlasmaTherm | 790 Etch | Multi-Process Etch | 200 mm | 1 | as is where is | |||
113118 | PSC | DES-220-456AVL | Dry ETCHing System | N/A | 1 | as is where is | |||
106736 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | ||
106737 | SAMCO | RIE-300NR | Reactive Ion Etching System | 300 mm | 01.06.2006 | 1 | as is where is | ||
111464 | Shibaura | CDE -80 | Dry Etcher | 200 mm | 1 | as is where is | immediately | ||
111879 | Shibaura Engineering Works Ltd. | CDE-300 | Metal Etch | 300mm | 1 | as is where is | |||
102623 | SPTS | Omega 201 | Plasma Dry etcher (For spares use) | 200 mm | 01.05.2010 | 1 | as is where is | immediately | |
112939 | SPTS | MXP Multiplex ICP ASE HR | ICP ETCHER | 01.06.2003 | 1 | as is where is | |||
112940 | SPTS | MXP Multiplex ICP HR | Chlorine Etch | 150 MM | 01.06.2003 | 1 | as is where is | ||
112943 | Technics | Micro Stripper -- Series 200 | Plasma etchert | 100 MM | 1 | as is where is | |||
106150 | Tegal | 903E | Dry Etcher | 150 mm | 1 | as is all rebuilt | immediately | ||
106151 | TEGAL | 900 | Plasma dry etch | 100 mm | 01.10.1984 | 1 | as is where is | immediately | |
106152 | TEGAL | 903E | Plasma dry etch | 100 mm | 01.06.1985 | 1 | as is where is | immediately | |
113621 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113622 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113623 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113624 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113625 | Tegal | Tegal 901e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113626 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113627 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113628 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113629 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
113630 | Tegal | Tegal903e | Plasma Etch | 150 mm | 01.06.1995 | 1 | as is where is | ||
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately | |
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | ||
93040 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2009 | 1 | as is where is | immediately | |
93041 | TEL TOKYO ELECTRON | VIGUS | MASK ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
93042 | TEL TOKYO ELECTRON | VIGUS | Mask ETCH | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
98846 | TEL Tokyo Electron | VIGUS Mask | Oxide Mask Etch | 300 mm | 01.04.2009 | 1 | as is where is | immediately | |
98847 | TEL Tokyo Electron | VIGUS PK2 (PARTS) | Oxide Etch EFEM ONLY | 300 mm | 01.07.2013 | 1 | as is where is | immediately | |
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | DRY ETCH Cluster tool | 300 mm | 1 | as is where is | immediately | ||
108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | |||
108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | |||
108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | |||
108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | ||
109269 | TEL TOKYO ELECTRON | Telius 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
109565 | TEL Tokyo Electron | Unity SCCM Shin | Oxide Etcher with qty 3 chambers | 300 mm | 01.05.2005 | 1 | as is where is | immediately | |
110641 | TEL Tokyo Electron | Telius | Dry Etcher | 300 mm | 1 | as is where is | |||
110642 | TEL Tokyo Electron | Telius SP-Vesta | Dry Etcher | 300 mm | 1 | as is where is | |||
110645 | TEL Tokyo Electron | UNITY2e-855DD | Dry Etcher | 200 mm | 1 | as is where is | |||
110646 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110647 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110648 | TEL Tokyo Electron | Unity2e-855II | Dry Etcher | 200 mm | 1 | as is where is | |||
110649 | TEL Tokyo Electron | Unity2e-855II IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
110650 | TEL Tokyo Electron | Unity2e-855PP DP | Dry Etcher | 200 mm | 1 | as is where is | |||
110651 | TEL Tokyo Electron | Unity2e-855SS | Dry Etcher | 200 mm | 1 | as is where is | |||
110652 | TEL Tokyo Electron | Unity2e-85DPA | Dry Etcher | 200 mm | 1 | as is where is | |||
110653 | TEL Tokyo Electron | Unity2E-85IEM | Dry Etcher | 200 mm | 1 | as is where is | |||
110654 | TEL Tokyo Electron | Unity2e-85TPATC | Dry Etcher | 200 mm | 1 | as is where is | |||
111951 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300 mm | 01.03.2015 | 1 | as is where is | immediately | |
111952 | TEL TOKYO ELECTRON | Tactras Vigus RK3 | Dielectric Etch | 300mm | 1 | as is where is | |||
111975 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
111976 | TEL TOKYO ELECTRON | Telius SP 305 DRM | Dielectric Etch | 300mm | 1 | as is where is | |||
112332 | TEL Tokyo Electron | Certas Wing | Etch ETCH | 300 mm | 01.06.2008 | 1 | as is where is | ||
112333 | TEL Tokyo Electron | EFEM | Etch - | 300 mm | 1 | as is where is | |||
112492 | TEL Tokyo Electron | Tactras RLSA | Etch Oxide, Nitride, Polysilicon | 300 mm | 01.06.2010 | 1 | as is where is | ||
112493 | TEL Tokyo Electron | Tactras Vesta | Etch Polysilicon | 300 mm | 01.06.2014 | 1 | as is where is | ||
112494 | TEL Tokyo Electron | Tactras Vigus MK | Oxide Etcher, fitted with 4 process chambers | 300 mm | 01.06.2012 | 1 | as is where is | immediately | |
112495 | TEL Tokyo Electron | Tactras Vigus RK2 | Oxide Etcher, fitted with 4 process chambers | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
112496 | TEL Tokyo Electron | TE8500 | Etch Oxide | 200 mm | 01.06.1996 | 1 | as is where is | ||
112497 | TEL Tokyo Electron | Telius | Etch Poly-T4 ATCC | 300 mm | 01.06.2011 | 1 | as is where is | ||
112498 | TEL Tokyo Electron | Telius 305 SCCM SE | Etch Oxide | 300 mm | 01.06.2000 | 1 | as is where is | ||
112499 | TEL Tokyo Electron | Telius SCCM Jin | Etch Oxide | 300 mm | 01.06.2008 | 1 | as is where is | ||
112512 | TEL Tokyo Electron | TSP 305 DRM | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
112513 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2006 | 1 | as is where is | ||
112514 | TEL Tokyo Electron | TSP 305 SCCM SE+ | Etch Oxide | 300 mm | 01.06.2007 | 1 | as is where is | ||
112515 | TEL Tokyo Electron | Unity Me 85QD | Etch Oxide | 200 mm | 01.06.2004 | 1 | as is where is | ||
112516 | TEL Tokyo Electron | Unity2 84DI | Etch Polysilicon | 200 mm | 01.06.1999 | 1 | as is where is | ||
112517 | TEL Tokyo Electron | Unity2 85DD | Etch DRY ETCHER | 200 mm | 1 | as is where is | |||
113303 | TEL TOKYO ELECTRON | VIGUS NEST | DRY ETCH | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
113304 | TEL Tokyo Electron | VIGUS PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | immediately | |
113324 | TEL Tokyo Electron | Tactras Vigus (Chamber only) | Oxide etcher (Chamber Only) | 300 mm | 01.06.2010 | 1 | as is where is | immediately | |
113632 | TEL Tokyo Electron | Clean Track Mk V, WEE | Track | 150 mm | 01.06.1992 | 1 | as is where is | ||
114203 | TEL Tokyo Electron | Tactras Vigus - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | |||
114208 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 1 | as is where is | |||
112951 | TRION TECHNOLOGY | Oracle | RIE Dielectric Etcher | 200 mm | 01.06.2006 | 1 | as is where is | ||
106567 | Ulvac | FRE200E | XeF2 Etching System | 01.06.2018 | 1 | as is where is | immediately | ||
112953 | ULVAC | NE 7800 | high-temperature, high-density plasma etching system | 01.10.2007 | 1 | as is where is | |||
108610 | UNAXIS | SLR-720 | RIE | 150 mm | 1 | as is where is | immediately | ||
109532 | UNAXIS | SLR-720 | REACTIVE ION ETCHER | 200mm | 01.06.2012 | 1 | as is where is |