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Pre-owned and used Dry Etch Equipment for sale by fabsurplus.com

Please find below a list of pre-owned, surplus and Used Dry Etch Equipment for sale by fabsurplus.com .Click on any listed Dry Etcher to see further data.


SDI ID Manufacturer Model Description Version Vintage Q. ty Sales Conditions Lead Time
111579 AMAT / Applied Materials Centris MESA Dry Etch cluster tool 300 mm 01.01.2011 4 as is where is immediately
91269 Applied Materials CENTURA 5200 MxP Poly 200 mm 1 as is where is
91277 Applied Materials Centura DPS II CHAMBER Chamber only 300 mm 1 as is where is
91279 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91280 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91281 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91282 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91283 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 31.05.2008 1 as is where is
91284 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91285 Applied Materials Etch dry chamber Only AXIOM, DPS 300 mm 1 as is where is
91287 Applied Materials P5000 DELTA DLH 150 mm 31.05.1993 1 as is where is
91316 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
91317 Applied Materials CENTURA ENABLER Oxide Etcher /server OS PC 300 mm 1 as is where is
93032 Applied Materials CENTRIS DPS MESA Dry Etch, Twin 3chamber 300 MM 01.05.2010 1 as is where is immediately
93034 Applied Materials CENTURA ENABLER E2 Oxide Etcher /server OS PC 300 MM 31.05.2007 1 as is where is
93035 Applied Materials CENTURA ENABLER E5 Oxide Etcher /server OS PC 300 MM 31.05.2010 1 as is where is
100909 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher With 3 poly etch chambers and 1 axiom chamber 300 mm 01.01.2015 1 as is where is immediately
100910 Applied Materials CENTURA DPS ll MESA T2 Poly Etcher with 3 x DPS2 and 1 x Axiom CH 300 mm 01.04.2015 1 as is where is immediately
100913 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2006 1 as is where is
100914 Applied Materials DPS II AE Poly G3 dry etcher 300 mm 31.05.2007 1 as is where is
103473 Applied Materials CENTURA DPS G3 Poly 1ch / Mesa 1ch 300 mm 31.05.2007 1 as is where is
103474 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2003 1 as is where is
103475 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2005 1 as is where is
103476 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 31.05.2010 1 as is where is
103477 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103478 Applied Materials CENTURA DPS G5 MESA MESA 3ch / Axiom 1ch 300 mm 1 as is where is
103482 Applied Materials DPS SILVIA Silvia 2ch / Axiom 1ch 300 mm 1 as is where is
103483 Applied Materials DPS2 Poly Etcher 300 mm 1 as is where is
103484 Applied Materials DPS2 Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103485 Applied Materials DPS2 AE Poly Etcher 300 mm 1 as is where is
103486 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103487 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103488 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103489 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103490 Applied Materials DPS2 AE Poly Mesa 3ch / Axiom 1ch 300 mm 1 as is where is
103491 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 1 as is where is
103492 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2005 1 as is where is
103493 Applied Materials DPS2 AE MINOS (Dry Etch) 300 mm 31.05.2006 1 as is where is
103494 Applied Materials DPS2 AE POLY MESA (Dry Etch) 300 mm 01.05.2013 1 as is where is immediately
103495 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 01.06.2014 1 as is where is
103496 Applied Materials DPS2 AE MESA (Dry Etch) 300 mm 01.06.2014 1 as is where is immediately
106583 Applied Materials CENTURA 5200 DPS Poly Etcher 200 mm 01.06.1999 1 as is where is
106615 Applied Materials G5-MESA DRY ETCH EFEM 300 MM 1 as is where is
106616 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106618 Applied Materials MESA CHAMBER ONLY DRY ETCH CHAMBER 300 mm 1 as is where is
106624 Applied Materials PRODUCER GT ACL 1ch / Server X 300 mm 1 as is where is
108059 Applied Materials CENTURA 2 DPS Deep Trench Etcher, 2 chambers 150 mm 1 as is where is
108060 Applied Materials Centura 5300 HDP Omega Dry etch cluster tool with 2 Chambers SIO2 etch 200 mm 1 as is where is
108347 Applied Materials Centura AP AdvantEdge G5 Poly Polysilicon Etch 300 mm 2 as is where is
108705 Applied Materials Centura 5200 MxP Chamber MxP Etching Chamber 200 mm 1 inquire immediately
109139 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300mm 1 as is where is
109541 Applied Materials Centura AP DPS 2 G5 Polysilicon etcher, 3 chamber 300 mm 01.08.2008 1 as is where is immediately
109542 Applied Materials Centura DPS II Advantedge POLY POLY ETCHER, 4 CHAMBER 300 mm 01.06.2010 1 as is where is immediately
109543 Applied Materials Centura AP DPS 2 Advantedge Mesa Polysilicon Etcher with 4 chambers 300 mm 01.08.2006 1 as is where is immediately
109544 Applied Materials Centura 5200 AP DPS2 Advantedge Carina Mesa Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS 300 mm 01.05.2013 1 as is where is immediately
109545 Applied Materials Centura AP DPS II Advantedge Polysilicon Etcher with 4 chambers 300 mm 01.06.2006 1 as is where is immediately
109549 Applied Materials Centura DPS2 AE Minos Poly Dry Etch with 2CH DPS2 and 2 CH Axiom 300 mm 01.06.2006 1 as is where is immediately
110620 Applied Materials Centura Enabler Dry etcher 300 mm 1 as is where is
110701 Applied Materials P5000 Poly Etcher 2 Chamber 150 mm 01.06.1995 2 as is where is immediately
111613 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300mm 1 as is where is
111614 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300mm 1 as is where is
111617 Applied Materials Centura AP DPS AdvantEdge G2 Metal Metal Etch 300mm 1 as is where is
111622 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300mm 1 as is where is
111624 Applied Materials Centura AP DPS II Polysilicon Polysilicon Etch 300mm 1 as is where is
111625 Applied Materials Centura AP DPS II Polysilicon Polysilicon Etch 300mm 1 as is where is
111626 Applied Materials Centura AP DPS II Polysilicon Polysilicon Etch 300mm 1 as is where is
111639 Applied Materials Producer Etch eXT Dielectric Dielectric Etch 300mm 1 as is where is
111640 Applied Materials Producer Etch eXT Dielectric Dielectric Etch 1 as is where is
111641 Applied Materials Producer Etch eXT Poly Polysilicon Etch 300mm 1 as is where is
112084 Applied Materials Centura AP eMAX CT+ Etch OX emax CT Plus 3 chambers 300 mm 01.06.2007 1 as is where is
112086 Applied Materials Centura Avatar (Chamber) Etch OX Chamber only, position D 300 mm 01.06.2016 1 as is where is
112087 Applied Materials Centura Axiom Chamber Etch Strip Chamber only, without s/n 300 mm 01.06.2004 1 as is where is
112088 Applied Materials Centura DPS Metal 4 chamber Metal Etch DPS Metal*2CH, ASP+*2CH, Steelhead1 Chiller*3 200 mm 01.06.2000 1 as is where is
112089 Applied Materials Centura DPS2 4 chamber Etch Poly 4x (D4) SILICON DPS II chamber,12 gas line ( Standard gas Line ) 300 mm 01.06.2005 1 as is where is
112090 Applied Materials Centura DPS2 532 Metal 3 chamber Etch Metal with EFEM (Yaskawa, NT), TM, 2xDPS532, 1xAxiom, AC Rack, 300 mm 01.06.2006 1 as is where is
112091 Applied Materials Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories 300 mm 01.06.2014 1 as is where is
112092 Applied Materials Centura DPS2 AdvantEdge G5 Mesa HP 4 chamber Etch Poly with EFEM(Server, Single Kawasaki), 3x Mesa HP, Axiom Chamber, AC Rack, Generator Rack, Accessories 300 mm 01.06.2015 1 as is where is
112093 Applied Materials Centura DPS2 Metal 3 chamber Etch Metal with EFEM(Kawasaki, Server), TM, 3x G2 Metal, AC Rack, 1x Side Storage, 2x SMC Chiller, 3x Cathode Chiller, Utility Box, Tote 300 mm 01.06.2005 1 as is where is
112094 Applied Materials Centura DPS2 Metal 4 chamber Etch Metal with Windows NT, DPS2 Metal x2CH, ASP2 x2CH 300 mm 1 as is where is
112095 Applied Materials Centura DPS2 Poly 4 chamber Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5, 1x Axiom(No VODM), AC Rack, Chiller 300 mm 01.06.2006 1 as is where is
112096 Applied Materials Centura DPS2 Poly 4 chamber Etch Poly with EFEM, TM, 3x DPS2 Poly; 1x Axiom, AC Rack, Side Storage, EE-EAS-12 300 mm 01.06.2007 1 as is where is
112097 Applied Materials Centura DPS2 Poly 4 chamber Etch Poly with EFEM(Kawasaki, Server), TM, 3x G5 Poly, 1x Axiom, AC Rack, Chiller 300 mm 01.06.2007 1 as is where is
112098 Applied Materials Centura DPS2 Poly 3 chamber Etch Poly with EFEM, TM, 2x DPS2 Poly, 1x Axiom, AC Rack 300 mm 01.06.2006 1 as is where is
112099 Applied Materials Centura DT Hart 3 chamber Etch Oxide with EFEM, TM, 3x DT Hart, AC Rack, Chiller 300 mm 01.06.2002 1 as is where is
112100 Applied Materials Centura Enabler Chamber Etch Oxide Chamber only 300 mm 01.06.2006 1 as is where is
112101 Applied Materials Centura Enabler Chamber Etch Oxide Chamber only 300 mm 01.06.2006 1 as is where is
112103 Applied Materials DPS2 532 Metal Chamber Etch Metal Chamber Only 300 mm 01.06.2004 1 as is where is
112113 Applied Materials P5000 Etch Metal with 2x Metal, 1xASP 150 mm 1 as is where is
112603 Applied Materials Centura DPS Metal etcher with 2 x DPS chambers and 2 x clean chambers 200 mm 01.06.2000 1 as is where is immediately
113009 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 mm 01.06.2011 1 as is where is
113010 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 mm 01.06.2007 1 as is where is
113012 Applied Materials CENTURA DPS2 G3 Poly 2ch / Mesa 1ch 300 mm 01.06.2001 1 as is where is
113015 Applied Materials CENTURA DPS2 G5 Metal 3ch, Axiom 1ch 300 mm 01.06.2008 1 as is where is
113016 Applied Materials CENTURA DPS2 G5 MESA Poly 3ch / AXIOM 1ch / Server OS Type 300 mm 01.06.2011 1 as is where is immediately
113020 Applied Materials DPS2 G5-MESA EFEM ONLY 300 mm 1 as is where is
113026 Applied Materials P5000 2 Metal 1 as is where is
113027 Applied Materials P5000 2 MXP oxide 200 mm 1 as is where is
113193 Applied Materials Centura AP AdvantEdge G5 Metal Dry Etch 300 mm 1 as is where is
113309 Applied Materials Centura AP Enabler E5 Dielectric Etcher with 4 process chambers 300 mm 01.04.2010 1 as is where is immediately
113404 Applied Materials 5200 Centura DPS Plasma Etch 150 mm 01.06.1999 1 as is where is
113405 Applied Materials 5200 Centura DPS Plasma Etch 150 mm 01.06.2001 1 as is where is
113423 Applied Materials Centura DTI Plasma Etch 150 mm 01.06.2003 1 as is where is
113424 Applied Materials Centura DTI Plasma Etch 150 mm 01.06.1998 1 as is where is
113426 Applied Materials P5000 Plasma Etch 150 mm 01.06.1996 1 as is where is
113427 Applied Materials P5000 Plasma Etch 150 mm 01.06.1993 1 as is where is
113428 Applied Materials P5000 Plasma Etch 150 mm 01.06.1992 1 as is where is
113429 Applied Materials P5000 Plasma Etch 150 mm 01.06.1995 1 as is where is
113434 Applied Materials P5000 Plasma Etch 200 mm 01.06.1995 1 as is where is
113435 Applied Materials P5000 Plasma Etch 150 mm 01.06.1992 1 as is where is
113436 Applied Materials P5000 Plasma Etch 150 mm 01.06.1995 1 as is where is
113438 Applied Materials P5000 dual chamber MxP Plasma Etch 150 mm 01.06.1995 1 as is where is
113693 Applied Materials Centura MXP Dry Etch Poly Poly/trench Etcher 150 mm 01.06.1995 1 as is where is
113694 Applied Materials Centura MXP Dry Etch Poly Poly/trench Etcher 150 mm 01.06.1995 1 as is where is
113695 Applied Materials Centura MXP Dry Etch Poly Poly/trench Etcher 150 mm 01.06.1995 1 as is where is
113949 Applied Materials 5200 Centura II Metal Etch System - with 2 x DPS -DPM chambers 200 mm 01.04.2019 1 as is where is immediately
114005 Applied Materials Centura MXP+ Oxide 200 MM 01.06.1998 1 as is where is
114006 Applied Materials Centura DPS + Metal Metal 2ch, ASP+ 2ch 200 MM 01.06.2000 1 as is where is
114007 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 MM 01.06.1006 1 as is where is
114008 Applied Materials CENTURA DPS 2 Metal 2ch / ASP 2ch 300 MM 01.06.2007 1 as is where is
114009 Applied Materials CENTURA DPS 2 Metal 3ch / ASP 1ch 300 MM 01.06.2006 1 as is where is
114010 Applied Materials CENTURA DPS 2 Metal 3ch / ASP 1ch 300 MM 01.06.2008 1 as is where is
114011 Applied Materials CENTURA DPS 2 Poly 3ch / Axiom 1ch 300 MM 01.06.2010 1 as is where is
114012 Applied Materials CENTURA DPS 2 Poly Etcher with 4ch 300 MM 01.06.2006 1 as is where is
114013 Applied Materials DPS Poly Etcher with 3ch 200 MM 01.06.2000 1 as is where is
114049 Applied Materials Centura AP AdvantEdge G5 Mesa Poly Polysilicon Etch 300 mm 1 as is where is
114050 Applied Materials Centura AP AdvantEdge G5 Metal Metal Etch 300 mm 1 as is where is
114051 Applied Materials Centura AP DPS AdvantEdge G2 Metal Metal Etch 300 mm 1 as is where is
114052 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
114053 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
114054 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
114055 Applied Materials Centura AP DPS AdvantEdge G2 Poly Polysilicon Etch 300 mm 1 as is where is
114022 BMR GAN (A49-3) ETCH 100 mm 1 as is where is
113829 Gasonics AURA 2000 DRY ETCH Dry Etch Silicon isotropic gasonic 150 mm 1 as is where is
113830 Gasonics AURA 2000 DRY ETCH Dry Etch Silicon isotropic gasonic 150 mm 1 as is where is
112189 Hitachi M-501AW Etch AL microwave etching equipment 150 mm 1 as is where is
106691 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2010 1 as is where is
106695 LAM 2300 CHAMBER ONLY MWAVE STRIP (POLY) 300 mm 01.06.2014 1 as is where is
106696 LAM 2300 FX EX+ CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is immediately
106697 LAM 2300 MWAVE STRPR CHAMBER MWAVE STRIP (POLY) 300 mm 01.06.2018 1 as is where is
106699 LAM FLEX FX CHAMBER ONLY PLASMA OXIDE ETCH 300 mm 01.06.2013 1 as is where is
106701 LAM TORUS300K DRY Bevel Etcher 300 mm 01.06.2006 1 as is where is
106874 Lam 2300 Exelan Flex Dry Etcher with 3 chambers 300 mm 01.07.2004 1 as is where is immediately
112226 Lam 2300 Exelan Flex 4 chamber Dielectric Etch, V2, with 4 chambers 300 mm 01.06.2006 1 as is where is
112227 Lam 2300 Flex EX 3 chamber Oxide etcher, V2 platform, with 3 chambers 300 mm 01.06.2010 1 as is where is
112228 Lam 2300 Kiyo 4 chamber Etch Poly – 4 Kiyo CX chambers 300 mm 01.06.2007 1 as is where is
112234 Lam Rainbow 4420XL Etch Poly 150 mm, 200 mm 01.06.1994 1 as is where is
113090 LAM TORUS300K DRY Bevel Etcher 300 mm 01.06.2006 1 as is where is
113806 LAM 4400 Poly Etcher 150 mm 01.06.1994 1 as is where is
113807 LAM 4400 Poly Etcher 150 mm 01.06.1994 1 as is where is
113808 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is
113809 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is
113810 LAM 4420 Poly Etcher 150 mm 01.06.1994 1 as is where is
113811 LAM 4500 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113812 LAM 4500 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113813 LAM 4500 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113814 LAM 4520 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113815 LAM 4520 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113816 LAM 4520 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113817 LAM 4520 Oxide Etcher 150 mm 01.06.1993 1 as is where is
113818 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is
113819 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is
113820 LAM 4520i Oxide Etcher (Isotropic) 150 mm 01.06.1995 1 as is where is
113821 LAM 9400 SE Poly Etcher 150 mm 01.06.1994 1 as is where is
113822 LAM 9400 SE Poly Etcher 150 mm 01.06.1994 1 as is where is
113823 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113824 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113825 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113826 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113827 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
113828 LAM 9600 SE Metal etcher – fitted with ESC 150 mm 01.06.1993 1 as is where is
102568 LAM Research TORUS 300K Dry Etch 2 inquire
102569 LAM Research TORUS 300S Dry Etch 2 inquire
108167 LAM Research 2300 MWAVE STRPR Chamber only 300 mm 01.06.2012 1 as is where is
108704 Lam Research 490 Autoetch Polysilicon Dry Etcher 150 mm 01.06.1990 3 inquire immediately
109207 LAM Research 2300 Exelan Flex FX - Chamber Only Dielectric Etch 300mm 1 as is where is
110728 LAM Research 2300 Dry etch cluster tool Mainframe without chambers 200 MM 01.06.2008 1 as is where is immediately
111576 LAM RESEARCH 2300 EXELAN FLEX Dry Etching Chamber (Suitable for spares use) 300 mm 01.01.2013 5 as is where is immediately
111814 LAM Research 2300 Versys Metal H Metal Etch 300mm 1 as is where is
113228 LAM Research 2300 KIYO EX Poly Etcher 300 mm 1 as is where is
113229 LAM Research 2300 KIYO EX Poly Etcher 300 mm 1 as is where is
113234 LAM Research 2300e4 KIYO MCX Dry Etch 300 mm 1 as is where is
113236 LAM Research 2300e5 Exelan Flex FX Oxide Etcher 300 mm 1 as is where is
113237 LAM Research 2300e5 Exelan Flex FX Oxide Etcher 300 mm 1 as is where is
113536 Lam Research 4506I Plasma Etch 150 mm 01.06.1995 1 as is where is
113537 Lam Research 4506I Plasma Etch 150 mm 01.06.1995 1 as is where is
113538 Lam Research 4526I Plasma Etch 150 mm 01.06.1995 1 as is where is
113539 Lam Research 4526I Plasma Etch 150 mm 01.06.1995 1 as is where is
113540 Lam Research 4526I Plasma Etch 150 mm 01.06.2000 1 as is where is
113541 Lam Research 4526I Plasma Etch 150 mm 01.06.1995 1 as is where is
113542 Lam Research 4526I Plasma Etch 150 mm 01.06.1995 1 as is where is
113543 Lam Research 4526I Plasma Etch 150 mm 01.06.1995 1 as is where is
113544 Lam Research 4526I Plasma Etch 150 mm 01.06.2000 1 as is where is
113545 Lam Research 4526XL Plasma Etch 150 mm 01.06.2000 1 as is where is
113546 Lam Research 4526XL Plasma Etch 150 mm 01.06.2000 1 as is where is
113547 Lam Research 4528I Plasma Etch 200 mm 1 as is where is
113548 Lam Research 4528XL Plasma Etch 200 mm 1 as is where is
113553 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 1 as is where is
113554 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.1995 1 as is where is
113555 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2002 1 as is where is
113556 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113557 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113558 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113559 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113560 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113561 Lam Research TCP 9600SE II standalone with DSQ Plasma Etch 150 mm 01.06.2005 1 as is where is
113562 Lam Research TCP 9600SE II standalone with DSQ - Plasma Etch Plasma Etch 150 mm 01.06.2005 1 as is where is
114028 LAM Research 2300 EXELAN FLEX 4CH Silicon Etcher 300 MM 01.06.2005 1 as is where is
114133 LAM Research 2300 Exelan Flex FX+ - Chamber Only Dielectric Etch 300 mm 1 as is where is
114134 LAM Research 2300 KIYO EX Polysilicon Etch 300 mm 1 as is where is
114135 LAM Research 2300 Versys Metal H Metal Etch 300 mm 1 as is where is
114136 LAM Research 2300 Versys Metal H Metal Etch 300 mm 1 as is where is
114137 LAM Research 2300e4 KIYO EX Metal Metal Etch 1 as is where is
114138 LAM Research 2300e6 Exelan Flex HX Dielectric Etch 300 mm 1 as is where is
114139 LAM Research 2300e6 Exelan Flex HX Dielectric Etch 300 mm 1 as is where is
113870 Matrix 403 Poly Etcher 150 mm 01.06.1996 1 as is where is
98284 MATTSON PARADIGME SI Polysilicon Etch 300 mm 1 as is where is
108578 MATTSON PARADIGM_SI DRY ETCH 300mm 01.06.2012 1 as is where is immediately
108579 MATTSON PARADIGM_SI Poly-silicon etcher 300 mm 01.05.2011 1 as is where is immediately
109552 Mattson Aspen 3 ICP Dual Chamber Light Etcher 300 mm 01.07.2008 1 as is where is immediately
112240 Mattson ParadigmE Etch 300 mm 01.06.2012 1 as is where is
112241 Mattson ParadigmE XP Light Etch 300 mm 01.06.2010 1 as is where is
112865 Nexx Systems Cirrus 300 ECR PECVD RIE SYSTEM 1 as is where is
113593 Oerlikon Versaline Plasma Etch 150 mm 01.06.2008 1 as is where is
91329 OXFORD 800+ RIE (Reactive Ion Etcher) 1 as is where is immediately
99398 Oxford Micro-etch 300 Dry Etcher 1 as is where is immediately
111600 Oxford Plasmalab 100 Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock 150 mm 1 as is where is immediately
113117 OXFORD 800 RIE 125 mm 1 as is where is
113981 Oxford Plasmalab 100 ICP 180 Dry Etcher 200 mm 1 inquire
91330 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
91331 Plasma Therm Wafer/ Batch 740 DUAL PLASMA ETCH AND RIE 4" 1 as is where is
108863 PLASMA-THERM 790 Reactive Ion Etcher, Refurbished - Call for Details 1 inquire
108864 PLASMA-THERM SLR770 Inductively Coupled Etcher with Load-Lock, Refurbished - Call for Details 1 as is all rebuilt immediately
112902 Plasma-Therm 790 RIE PECVD 1 as is where is
112903 Plasma-Therm 790 ICP Etcher 1 as is where is
112904 Plasma-Therm BT Reactive Ion Etch System 150 mm 1 as is where is
112906 Plasma-Therm VII 734 Reactive Ion Etch System 200 mm 1 as is where is
112907 Plasma-Therm VII 734MF Reactive Ion Etch System 200 mm 1 as is where is
112908 Plasma-Therm Wafer Batch 740/740 Reactive Ion Etch System 200 mm 1 as is where is
112909 Plasma-Therm 73/74 PECVD/Plasma Etch/Reactive Ion Etch 200 mm 1 as is where is
103451 Plasmatherm SLR-770 ICP Silicon Deep Etching 100 mm 01.05.1998 1 as is where is immediately
106759 Plasmatherm SLR 770 Dual Chamber R.I.E. 200 mm 01.06.1994 1 as is where is immediately
109586 Plasmatherm SLR 720 RIE Etcher 150 mm 1 inquire
110613 PlasmaTherm SLR 740 Dual Chamber RIE / Plasma etch 200 mm 01.04.1999 1 as is where is immediately
111602 PlasmaTherm SLR 770 ICP Deep Silicon Etcher 4 inch 01.06.1998 1 as is where is immediately
111603 PlasmaTherm Versaline DSE-III Deep Silicon Etcher 4,6 and 8 inch 01.06.2012 1 as is where is immediately
114158 PlasmaTherm 790 Etch Multi-Process Etch 200 mm 1 as is where is
113118 PSC DES-220-456AVL Dry ETCHing System N/A 1 as is where is
106736 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
106737 SAMCO RIE-300NR Reactive Ion Etching System 300 mm 01.06.2006 1 as is where is
111464 Shibaura CDE -80 Dry Etcher 200 mm 1 as is where is immediately
111879 Shibaura Engineering Works Ltd. CDE-300 Metal Etch 300mm 1 as is where is
102623 SPTS Omega 201 Plasma Dry etcher (For spares use) 200 mm 01.05.2010 1 as is where is immediately
112939 SPTS MXP Multiplex ICP ASE HR ICP ETCHER 01.06.2003 1 as is where is
112940 SPTS MXP Multiplex ICP HR Chlorine Etch 150 MM 01.06.2003 1 as is where is
112943 Technics Micro Stripper -- Series 200 Plasma etchert 100 MM 1 as is where is
106150 Tegal 903E Dry Etcher 150 mm 1 as is all rebuilt immediately
106151 TEGAL 900 Plasma dry etch 100 mm 01.10.1984 1 as is where is immediately
106152 TEGAL 903E Plasma dry etch 100 mm 01.06.1985 1 as is where is immediately
113621 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113622 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113623 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113624 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113625 Tegal Tegal 901e Plasma Etch 150 mm 01.06.1995 1 as is where is
113626 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is
113627 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is
113628 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is
113629 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is
113630 Tegal Tegal903e Plasma Etch 150 mm 01.06.1995 1 as is where is
2181 TEL TOKYO ELECTRON TE 5480 Nitride Plasma Reactive Ion Etch 150 mm 01.11.1992 1 as is where is immediately
91341 TEL TOKYO ELECTRON TELIUS SCCM T-3044SS DRY ETCHER 300 mm 31.05.2007 1 as is where is
93040 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.05.2009 1 as is where is immediately
93041 TEL TOKYO ELECTRON VIGUS MASK ETCH 300 mm 01.05.2010 1 as is where is immediately
93042 TEL TOKYO ELECTRON VIGUS Mask ETCH 300 mm 01.05.2010 1 as is where is immediately
98846 TEL Tokyo Electron VIGUS Mask Oxide Mask Etch 300 mm 01.04.2009 1 as is where is immediately
98847 TEL Tokyo Electron VIGUS PK2 (PARTS) Oxide Etch EFEM ONLY 300 mm 01.07.2013 1 as is where is immediately
106751 TEL TOKYO ELECTRON TEL TRIAS 200 SPA DRY ETCH Cluster tool 300 mm 1 as is where is immediately
108120 TEL Tokyo Electron TE8500 Dry Etch 200 mm 1 as is where is
108507 TEL Tokyo Electron Tactras Vesta NV3 Polysilicon Etch 300 mm 1 as is where is
108508 TEL Tokyo Electron Tactras Vesta NV3 Polysilicon Etch 300 mm 1 as is where is
108527 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 4 as is where is
108707 TEL Tokyo Electron Tactras RLSA (Chamber) Polysilicon Dry Etch Chamber 300 MM 01.06.2012 1 inquire
109269 TEL TOKYO ELECTRON Telius 305 DRM Dielectric Etch 300mm 1 as is where is
109565 TEL Tokyo Electron Unity SCCM Shin Oxide Etcher with qty 3 chambers 300 mm 01.05.2005 1 as is where is immediately
110641 TEL Tokyo Electron Telius Dry Etcher 300 mm 1 as is where is
110642 TEL Tokyo Electron Telius SP-Vesta Dry Etcher 300 mm 1 as is where is
110645 TEL Tokyo Electron UNITY2e-855DD Dry Etcher 200 mm 1 as is where is
110646 TEL Tokyo Electron Unity2e-855II Dry Etcher 200 mm 1 as is where is
110647 TEL Tokyo Electron Unity2e-855II Dry Etcher 200 mm 1 as is where is
110648 TEL Tokyo Electron Unity2e-855II Dry Etcher 200 mm 1 as is where is
110649 TEL Tokyo Electron Unity2e-855II IEM Dry Etcher 200 mm 1 as is where is
110650 TEL Tokyo Electron Unity2e-855PP DP Dry Etcher 200 mm 1 as is where is
110651 TEL Tokyo Electron Unity2e-855SS Dry Etcher 200 mm 1 as is where is
110652 TEL Tokyo Electron Unity2e-85DPA Dry Etcher 200 mm 1 as is where is
110653 TEL Tokyo Electron Unity2E-85IEM Dry Etcher 200 mm 1 as is where is
110654 TEL Tokyo Electron Unity2e-85TPATC Dry Etcher 200 mm 1 as is where is
111951 TEL TOKYO ELECTRON Tactras Vigus RK3 Dielectric Etch 300 mm 01.03.2015 1 as is where is immediately
111952 TEL TOKYO ELECTRON Tactras Vigus RK3 Dielectric Etch 300mm 1 as is where is
111975 TEL TOKYO ELECTRON Telius SP 305 DRM Dielectric Etch 300mm 1 as is where is
111976 TEL TOKYO ELECTRON Telius SP 305 DRM Dielectric Etch 300mm 1 as is where is
112332 TEL Tokyo Electron Certas Wing Etch ETCH 300 mm 01.06.2008 1 as is where is
112333 TEL Tokyo Electron EFEM Etch - 300 mm 1 as is where is
112492 TEL Tokyo Electron Tactras RLSA Etch Oxide, Nitride, Polysilicon 300 mm 01.06.2010 1 as is where is
112493 TEL Tokyo Electron Tactras Vesta Etch Polysilicon 300 mm 01.06.2014 1 as is where is
112494 TEL Tokyo Electron Tactras Vigus MK Oxide Etcher, fitted with 4 process chambers 300 mm 01.06.2012 1 as is where is immediately
112495 TEL Tokyo Electron Tactras Vigus RK2 Oxide Etcher, fitted with 4 process chambers 300 mm 01.06.2010 1 as is where is immediately
112496 TEL Tokyo Electron TE8500 Etch Oxide 200 mm 01.06.1996 1 as is where is
112497 TEL Tokyo Electron Telius Etch Poly-T4 ATCC 300 mm 01.06.2011 1 as is where is
112498 TEL Tokyo Electron Telius 305 SCCM SE Etch Oxide 300 mm 01.06.2000 1 as is where is
112499 TEL Tokyo Electron Telius SCCM Jin Etch Oxide 300 mm 01.06.2008 1 as is where is
112512 TEL Tokyo Electron TSP 305 DRM Etch Oxide 300 mm 01.06.2006 1 as is where is
112513 TEL Tokyo Electron TSP 305 SCCM SE+ Etch Oxide 300 mm 01.06.2006 1 as is where is
112514 TEL Tokyo Electron TSP 305 SCCM SE+ Etch Oxide 300 mm 01.06.2007 1 as is where is
112515 TEL Tokyo Electron Unity Me 85QD Etch Oxide 200 mm 01.06.2004 1 as is where is
112516 TEL Tokyo Electron Unity2 84DI Etch Polysilicon 200 mm 01.06.1999 1 as is where is
112517 TEL Tokyo Electron Unity2 85DD Etch DRY ETCHER 200 mm 1 as is where is
113303 TEL TOKYO ELECTRON VIGUS NEST DRY ETCH 300 mm 01.06.2007 1 as is where is immediately
113304 TEL Tokyo Electron VIGUS PX Dry Etcher 300 mm 01.06.2007 1 as is where is immediately
113324 TEL Tokyo Electron Tactras Vigus (Chamber only) Oxide etcher (Chamber Only) 300 mm 01.06.2010 1 as is where is immediately
113632 TEL Tokyo Electron Clean Track Mk V, WEE Track 150 mm 01.06.1992 1 as is where is
114203 TEL Tokyo Electron Tactras Vigus - Chamber Only Dielectric Etch 300 mm 1 as is where is
114208 TEL Tokyo Electron Telius SP 305 DRM Dielectric Etch 300 mm 1 as is where is
112951 TRION TECHNOLOGY Oracle RIE Dielectric Etcher 200 mm 01.06.2006 1 as is where is
106567 Ulvac FRE200E XeF2 Etching System 01.06.2018 1 as is where is immediately
112953 ULVAC NE 7800 high-temperature, high-density plasma etching system 01.10.2007 1 as is where is
108610 UNAXIS SLR-720 RIE 150 mm 1 as is where is immediately
109532 UNAXIS SLR-720 REACTIVE ION ETCHER 200mm 01.06.2012 1 as is where is


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