Please find below a list of Used CVD Equipment for sale by fabsurplus.com - Click on any listed item of CVD Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time | |
|---|---|---|---|---|---|---|---|---|---|
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | |||
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | ||
| 91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | |||
| 91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | |||
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | |||
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | ||
| 91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | |||
| 93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | ||
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | |||
| 106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | immediately | |
| 108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | |||
| 108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | immediately | ||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | ||
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 109582 | Applied Materials | P5000 | CVD SiN Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately | |
| 109583 | Applied Materials | P5000 | CVD TEOS Process with 2 x CVD chambers | 150 MM | 01.06.1989 | 1 | as is where is | immediately | |
| 110716 | Applied Materials | P5000 Mark 2 | 2 Chambers TEOS PECVD and 2 Chambers Dry Etch | 150 MM | 01.06.2000 | 1 | as is where is | immediately | |
| 110717 | Applied Materials | P5000 | 3 Chambers PECVD TEOS | 150 MM | 01.06.1996 | 1 | as is where is | immediately | |
| 111632 | Applied Materials | Centura Ultima Plus | HDP CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 111637 | Applied Materials | P-5000 Mark II DLH PECVD TEOS | PECVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 111638 | Applied Materials | P-5000 Mark II DLH PECVD TEOS | PECVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | |||
| 111647 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111649 | Applied Materials | Producer SE SACVD | SACVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112085 | Applied Materials | Centura AP ISPRINT | CVD VIA W, with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112112 | Applied Materials | P5000 | CVD ILD BPTEOS with 3 process chambers | 200 mm | 01.06.1996 | 1 | as is where is | ||
| 112114 | Applied Materials | Producer S TEOS-BPSG | CVD TEOS-BPSG with 3 x twin chambers | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 113008 | Applied Materials | CENTURA | DXZ | 200 mm | 1 | as is where is | |||
| 113017 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | ||
| 113018 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2002 | 1 | as is where is | ||
| 113024 | Applied Materials | P5000 | 2 MARK II | 150 mm | 01.06.1990 | 1 | as is where is | ||
| 113025 | Applied Materials | P5000 | 2 MARK II Oxide | 200 mm | 1 | as is where is | |||
| 113028 | Applied Materials | P5000 | 2 Teos DLH, 2 MARK II | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 113029 | Applied Materials | P5000 | 3 DxZ | 200 mm | 01.06.1998 | 1 | as is where is | ||
| 113030 | Applied Materials | P5000 | 3 Teos DLH, 1 MARK II | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113403 | Applied Materials | 5200 Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113406 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113407 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113408 | Applied Materials | 5200 HDP Centura | CVD | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113420 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1997 | 1 | as is where is | ||
| 113421 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113422 | Applied Materials | 5200 Centura | WCVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113430 | Applied Materials | P5000 | CVD | 200 mm | 01.06.1992 | 1 | as is where is | ||
| 113431 | Applied Materials | P5000 | CVD | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113432 | Applied Materials | P5000 | CVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113433 | Applied Materials | P5000 | CVD | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113437 | Applied Materials | P5000 | WCVD | 150 mm | 01.06.1994 | 1 | as is where is | ||
| 113696 | Applied Materials | P5000 | TF BPSG - SACVD BPSG | 150 mm | 01.06.1994 | 1 | as is where is | ||
| 113697 | Applied Materials | P5000 | TF Silan - PECVD SILAN | 150 mm | 01.06.1990 | 1 | as is where is | ||
| 113698 | Applied Materials | P5000 | TF Silan - PECVD SILAN | 150 mm | 01.06.1994 | 1 | as is where is | ||
| 113699 | Applied Materials | P5000 | TF Silan - PECVD SILAN | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113700 | Applied Materials | P5000 | TF TEOS - PECVD SPT ETCH | 150 mm | 01.06.1990 | 1 | as is where is | ||
| 113701 | Applied Materials | P5000 | TF TEOS - PECVD SPT ETCH | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113702 | Applied Materials | P5000 | TF TEOS - SACVD TEOS | 150 mm | 01.06.1990 | 1 | as is where is | ||
| 113703 | Applied Materials | P5000 | TF TEOS - SACVD TEOS | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113704 | Applied Materials | P5000 | TF W Tungsten - CVD W BLANKET | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113705 | Applied Materials | P5000 | TF W Tungsten - CVD W BLANKET | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113706 | Applied Materials | P5000 | TF W Tungsten - CVD WSI | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 114018 | Applied Materials | P5000 | 3 Delta SACVD DLH, 1 Mark II | 200 MM | 01.06.1997 | 1 | as is where is | ||
| 114019 | Applied Materials | P5000 | 3 PEOX DLH | 200 MM | 1 | as is where is | |||
| 114020 | Applied Materials | Producer GT | ACL 3 Twin | 300 MM | 01.06.2008 | 1 | as is where is | ||
| 114021 | Applied Materials | PRODUCER SE | UV CURE (CHAMBER ONLY) | 300 mm | 1 | as is where is | |||
| 114056 | Applied Materials | Centura SiNgen Chamber | LPCVD | 200 mm | 1 | as is where is | |||
| 114068 | Applied Materials | Producer GT PECVD Silane | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114069 | Applied Materials | Producer GT PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | immediately | ||
| 114070 | Applied Materials | Producer GT3 PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114071 | Applied Materials | Producer GT3 PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114072 | Applied Materials | Producer GT3 PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 108384 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300 mm | 3 | as is where is | |||
| 109117 | ASM | XP8 | Dual Chamber PECVD system for Oxide and Nitride | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
| 111662 | ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112124 | ASM | Dragon 2300 | CVD PECVD Equipment for Barrier | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 112125 | ASM | Eagle10 | CVD PETEOS | 200 mm | 01.06.1999 | 1 | as is where is | ||
| 112126 | ASM | Eagle12 | CVD CVD | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 106641 | BMR | HIDEP | PECVD | N/A | 01.06.2006 | 1 | as is where is | ||
| 109044 | CVD Equipment Corporation | Easy Tube 3000 | Growth Equipment | 06.01.2009 | 2 | as is where is | |||
| 112178 | EUGENE TECH | BJM3000 | CVD SINGLE HTO | 300 mm | 1 | as is where is | |||
| 106698 | LAM | ALTUS | CVD | 300 mm | 01.06.2009 | 1 | as is where is | ||
| 113832 | LAM | Novellus C1 | TF BPSG - SACVD BPSG | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113833 | LAM | Novellus C1 | TF BPSG - SACVD BPSG | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113834 | LAM | Novellus C1 | TF BPSG - SACVD BPSG | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 100919 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2001 | 1 | as is where is | ||
| 100920 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2010 | 1 | as is where is | ||
| 100921 | LAM Research | ALTUS | CVD System | 300 mm | 31.05.2003 | 1 | as is where is | ||
| 106307 | Lam Research | Vector Express AHM | PECVD | 300 mm | 01.06.2011 | 1 | as is where is | immediately | |
| 108574 | LAM RESEARCH | STRATA-3 | CVD | 300mm | 01.06.2021 | 1 | as is where is | immediately | |
| 108577 | LAM RESEARCH | Vector Express | CVD | 300 mm | 01.06.2003 | 1 | as is where is | immediately | |
| 111340 | LAM RESEARCH | CONCEPT 3 (Parts) | Preclean module | 300 mm | 01.06.2010 | 2 | as is where is | immediately | |
| 111525 | LAM Research | STRATA-GX | CVD Cluster tool | 300 mm | 01.06.2016 | 1 | as is where is | immediately | |
| 111541 | Lam Research | Vector (Parts) | Hub Only | 300 mm | 01.06.2006 | 1 | as is where is | immediately | |
| 114029 | LAM Research | C3 SPEED MAX (LITE) | STI cvd 3CH | 300 MM | 01.06.2005 | 1 | as is where is | ||
| 91220 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2004 | 1 | as is where is | ||
| 91221 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2006 | 1 | as is where is | ||
| 91223 | NOVELLUS | CONCEPT 3 SPEED | NEXT | 300 mm | 31.05.2005 | 1 | as is where is | ||
| 106710 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2003 | 1 | as is where is | ||
| 106711 | NOVELLUS | VECTOR | TEOS CVD SYSTEM | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 111854 | Novellus | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111855 | Novellus | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112261 | Novellus | C3 Altus | CVD W | 300 mm | 01.06.2007 | 1 | as is where is | ||
| 112262 | Novellus | C3 Altus | CVD WCVD | 300 mm | 01.06.2005 | 1 | as is where is | ||
| 112263 | Novellus | C3 Altus | CVD WCVD | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112264 | Novellus | C3 Speed | CVD | 300 mm | 01.06.2002 | 1 | as is where is | ||
| 112265 | Novellus | C3 Speed NeXT | CVD HDP | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112274 | Novellus | Vector Express AHMS | CVD – Ashable Hard Mask | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 112275 | Novellus | Vector SOLA xT | CVD CVD | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 113591 | Novellus | Concept One | CVD | 150 mm | 01.06.1990 | 1 | as is where is | ||
| 113592 | Novellus | Concept One | CVD | 150 mm | 01.06.1993 | 1 | as is where is | ||
| 114132 | Novellus | VECTOR Extreme | PECVD (Chemical Vapor Deposition) | 1 | as is where is | ||||
| 109097 | Oxford | Plasmalab System 100 | PECVD TEOS with Load Lock | 200 mm | 01.05.2001 | 1 | as is where is | immediately | |
| 109595 | Oxford | NGP 1000 | PECVD | 150 mm | 01.06.2012 | 1 | inquire | ||
| 111600 | Oxford | Plasmalab 100 | Laboratory PECVD and ICP/RIE tool with 2 chambers and a loadlock | 150 mm | 1 | as is where is | immediately | ||
| 112895 | Oxford Instruments | Plasmalab System 100 | pecvd teos with load lock | 1 | as is where is | ||||
| 112905 | Plasma-Therm | Unaxis 790 | DRIE PECVD | 1 | as is where is | ||||
| 106953 | PLASMATHERM | LAPECVD | Large Area PECVD system, used for SiO and SiN process depositions | 150 mm | 01.06.2015 | 4 | as is where is | immediately | |
| 112910 | PLASMATHERM | VLR 700 | Single Chamber PECVD | 1 | as is where is | ||||
| 113911 | SPTS | PLANAR 200 | TF Silan - PECVD FLOW FILL | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113912 | SPTS | PLANAR 200 | TF Silan - PECVD FLOW FILL | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113913 | SPTS | PLANAR 200 | TF Silan - PECVD FLOW FILL | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 113914 | SPTS | PLANAR 200 | TF Silan - PECVD PLASMA | 150 mm | 01.06.1995 | 1 | as is where is | ||
| 113915 | SPTS | PLANAR 200 | TF Silan - PECVD PLASMA | 150 mm | 01.06.1996 | 1 | as is where is | ||
| 113916 | SPTS | PLANAR 200 | TF Silan - PECVD PLASMA | 150 mm | 01.06.2000 | 1 | as is where is | ||
| 91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | |||
| 108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | ||
| 109118 | TEL TOKYO ELECTRON | Trias | CVD | 300 mm | 01.06.2010 | 14 | as is where is | immediately | |
| 110643 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
| 110644 | TEL Tokyo Electron | Trias Ti/TiN | TiN CVD | 300 mm | 1 | as is where is | |||
| 111980 | TEL TOKYO ELECTRON | Trias EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111984 | TEL TOKYO ELECTRON | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111985 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111986 | TEL TOKYO ELECTRON | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111987 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 111988 | TEL TOKYO ELECTRON | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300mm | 1 | as is where is | |||
| 112500 | TEL Tokyo Electron | Trias | CVD ALD TiN | 300 mm | 01.06.2013 | 1 | as is where is | ||
| 112501 | TEL Tokyo Electron | Trias | CVD Copper Barrier Seed | 300 mm | 01.06.2012 | 1 | as is where is | ||
| 112502 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2006 | 1 | as is where is | ||
| 112503 | TEL Tokyo Electron | Trias | CVD CVD TiN | 300 mm | 01.06.2004 | 1 | as is where is | ||
| 112504 | TEL Tokyo Electron | Trias | CVD UV Cure | 300 mm | 01.06.2011 | 1 | as is where is | ||
| 112505 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
| 112506 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 1 | as is where is | |||
| 112507 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112508 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112509 | TEL Tokyo Electron | Trias Chamber | CVD CVD Ti | 300 mm | 01.06.2016 | 1 | as is where is | ||
| 112510 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 112511 | TEL Tokyo Electron | Trias SPA | CVD CVD | 300 mm | 01.06.2010 | 1 | as is where is | ||
| 113274 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Ti / TiN CVD | 300 mm | 1 | as is where is | |||
| 114209 | TEL Tokyo Electron | Trias EX-II Plus HT Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114210 | TEL Tokyo Electron | Trias High-k CVD | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114211 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114212 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114213 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 114214 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | |||
| 108608 | TES | CHALLENGER_ST | Plasma-Enhanced CVD system | 300 mm | 01.05.2010 | 1 | as is where is | immediately | |
| 112954 | Unaxis | 790 ICP | DRIE PECVD | 1 | as is where is | ||||
| 91249 | VARIAN | MBB | W CVD | 200 mm | 1 | as is where is |