Nikon NSR 2205 i14E2 i line Stepper - COMPLETELY REFURBISHED for Sale

The NSR-2205i14E2 offers a peak NA of 0.63 and achieves a resolution of 350 nm or better. Through modified illumination, it allows optimization of various processing conditions for 256M DRAM mass production.
Key Features of the equipment
• High Throughput
A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers).
• High Resolution and Modified Illumination
The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better.
With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse  process requirements, including rough and middle layers.
• Overall Alignment Accuracy
The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy.
Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved.
• Refined Operation Interface
The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements.

Specifications
Resolution: 0.35μm or better
N.A.: 0.63 Exposure light source: i line
Reduction ratio:1:5
Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm
Alignment accuracy (EGA, |x|+3σ):40nm or better
Alignment system:LSA(standard), FIA(standard), LIA(optional)
Throughput     ≧ 103 wafers/hour (200 mm wafer)