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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 84241 | Anaheim Automation | TM4500 AA4520 | Stepper controller/driver board | Spares | 1 | as is where is | immediately | |
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | |
| 110712 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 110713 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1999 | 1 | as is where is | immediately |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | |
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately |
| 111354 | Applied Materials | Centura 5200 XE+ | RTP system with TPCC | 200 mm | 1 | as is where is | immediately | |
| 111355 | Applied Materials | Centura 5200 XE+ | RTP system with TPCC | 200 mm | 01.06.2003 | 1 | as is where is | immediately |
| 111284 | AXCELIS | 17164520 | ELECTRODE FILAMENT, GPH, CG - AXCELIS HE3 | Spares | 5 | inquire | ||
| 111076 | Axcelis | 17308520 | LINER BOTTOM W-ELS, W, HIGH PURITY - AXCELIS HE3 | Spares | 5 | inquire | ||
| 82286 | ESA | ET5200LX2000 | Touch Screen Computer | spares | 01.10.2007 | 1 | as is where is | immediately |
| 109611 | EVG | 520 | Wafer Bonder | 150 mm | 1 | inquire | ||
| 103140 | EVG | 520 | Manual Wafer Load Substrate Bonder | 150 mm | 01.05.2003 | 1 | as is where is | 2 months |
| 74794 | Hitachi | S5200 | FE SEM with EDX | Inspection | 31.05.2005 | 1 | as is where is | immediately |
| 110686 | KLA | eDR-5200 | Defect Review Sem | 300 mm | 01.06.2009 | 2 | as is where is | immediately |
| 2873 | Lam | 4520 (spares) | REMOTE CART | FACILITIES | 01.12.1994 | 1 | as is where is | immediately |
| 95408 | Lam | 4520 (spares) | REMOTE CART | FACILITIES | 01.12.1994 | 1 | as is where is | immediately |
| 108103 | Shibuya | EH520 | TestHandler | TEST | 1 | as is where is | ||
| 106742 | SSM | Fastgate 5200 | Resistivity / CV Measurement | 200 mm | 01.06.2008 | 1 | as is where is | immediately |
| 111191 | Varian | E17292520 | BAR, CATHODE, IHC 80, W, HIGH PURITY - HC | Spares | 5 | inquire |