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SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
98304 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
98305 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2010 | 1 | as is where is | |
102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
108036 | TEL Tokyo Electron | INDY PLUS | BCD POLY | 300 mm | 01.07.2010 | 1 | as is where is | |
102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 31.05.2012 | 1 | as is where is | |
102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.1997 | 1 | as is where is | |
108300 | TEL Tokyo Electron | ACT 12 | Photoresist coater + developer track, dual block, 4C4D | 01.06.2002 | 1 | as is where is | ||
102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.2000 | 1 | as is where is | |
102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | |
102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
102941 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
98846 | TEL Tokyo Electron | VIGUS Mask | Dielectric Etch | 300 mm | 30.04.2009 | 1 | as is where is | immediately |
102942 | TEL Tokyo Electron | P12XL | Automatic Wafer Prober/Probe Station | 300 mm | 1 | as is where is | ||
98847 | TEL Tokyo Electron | VIGUS RK2 | Dielectric Etch | 300 mm | 31.07.2013 | 1 | as is where is | immediately |
77089 | TEL TOKYO ELECTRON | 3387-002688-12 | Tel P8XL Camera assembly | Spares | 1 | as is where is | immediately | |
106290 | TEL TOKYO ELECTRON | P-8XL | Prober | 200 mm | 1 | as is where is | immediately | |
106291 | TEL TOKYO ELECTRON | P-8 | Prober | 200 mm | 1 | as is where is | immediately | |
106292 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
106293 | TEL TOKYO ELECTRON | P-12XLm | Prober | 300 mm | 1 | as is where is | immediately | |
106295 | TEL TOKYO ELECTRON | ALPHA-303i | TEOS | 300 mm | 01.06.2007 | 1 | as is where is | immediately |
108599 | TEL TOKYO ELECTRON | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | inquire | immediately |
108600 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
108601 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
108602 | TEL Tokyo Electron | A303I | Vertical furnace | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
106299 | TEL TOKYO ELECTRON | A303I | LTO POLY | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
108603 | TEL Tokyo Electron | P12XLM | Prober | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
108604 | TEL TOKYO ELECTRON | Precio Nano | FULLY AUTOMATED PROBER | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
108605 | TEL Tokyo Electron | ACT 8 | Photoresist coater and developer track with 3C and 3D | 200 mm | 01.09.2001 | 1 | as is where is | immediately |
108606 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 01.05.1997 | 1 | as is where is | |
106305 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
106306 | TEL TOKYO ELECTRON | FORMULA | ALO | 300 mm | 1 | as is where is | immediately | |
106310 | TEL TOKYO ELECTRON | LITHIUS | Photoresist Coater and Developer, 4C3D, 2 Block | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
108614 | TEL Tokyo Electron | P8XL | Fully Automated Prober | 200 mm | 01.06.2001 | 1 | as is where is | immediately |
108106 | TEL Tokyo Electron | Alpha-303i-H | Vertical Furnace, MTO | 300 mm | 1 | as is where is | ||
108107 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, DCS MTO | 300 mm | 1 | as is where is | ||
108108 | TEL Tokyo Electron | Alpha-303i-K | Vertical Furnace, MTO | 300 mm | 1 | as is where is | ||
108109 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | ||
108110 | TEL Tokyo Electron | Formula | Vertical Furnace | 300 mm | 1 | as is where is | ||
108111 | TEL Tokyo Electron | Indy-A-L | Vertical Furnace, LPRO | 300 mm | 1 | as is where is | ||
108112 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace | 300 mm | 1 | as is where is | ||
108113 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | ||
108114 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, D-poly | 300 mm | 1 | as is where is | ||
108115 | TEL Tokyo Electron | Indy-B-L | Vertical Furnace, DCS Nitride | 300 mm | 1 | as is where is | ||
108116 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace | 300 mm | 1 | as is where is | ||
108117 | TEL Tokyo Electron | Indy-I-L | Vertical Furnace, LT ALD SIN | 300 mm | 1 | as is where is | ||
108118 | TEL Tokyo Electron | Interface module | For Mark7, Mark8 | spares | 2 | as is where is | ||
108119 | TEL Tokyo Electron | LU-8209 | Auto refill system for TEL ALPHA-8S TEOS | spares | 1 | as is where is | ||
108120 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108121 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108122 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108123 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108124 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108125 | TEL Tokyo Electron | TE8500 | Dry Etch | 200 mm | 1 | as is where is | ||
108126 | TEL Tokyo Electron | VMU-40-007 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | ||
108127 | TEL Tokyo Electron | VOS-40-017 | Heater for Alpha 8SE furnace | spares | 1 | as is where is | ||
103528 | TEL Tokyo Electron | EXPEDIUS | DUMMY CLN | 300 mm | 1 | as is where is | ||
91245 | TEL TOKYO ELECTRON | TRIAS CHAMBER ONLY | LT TIN (N2/NH3/N2/CIF3) | 300 mm | 1 | as is where is | ||
93040 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2009 | 1 | as is where is | |
93041 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
93042 | TEL TOKYO ELECTRON | VIGUS MASK | ETCH | 300 mm | 31.05.2010 | 1 | as is where is | |
91255 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
83832 | TEL Tokyo Electron | 028-016314-1 | FITTING TUBE...1016-0 8 | SPARES | 1 | as is where is | immediately | |
91256 | TEL TOKYO ELECTRON | ALPHA-303i | H type / Poly | 300 mm | 1 | as is where is | ||
91258 | TEL TOKYO ELECTRON | ALPHA-303i | K type | 300 mm | 1 | as is where is | ||
91259 | TEL TOKYO ELECTRON | Telformula(ver.0) | optimal thermal processing | 300 mm | 1 | as is where is | ||
108929 | TEL TOKYO ELECTRON | Alpha 8 SZ | Vertical Furnace, Fast Thermal Oxidation process | 200 mm | 01.06.2001 | 2 | as is where is | immediately |
96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
93059 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
93060 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
2181 | TEL TOKYO ELECTRON | TE 5480 | Nitride Plasma Reactive Ion Etch | 150 mm | 01.11.1992 | 1 | as is where is | immediately |
103557 | TEL Tokyo Electron | ALPHA 303I | K type / Nitride | 300 mm | 1 | as is where is | ||
108933 | TEL TOKYO ELECTRON | Alpha 8SEi | HT Pyrogenic furnaces | 200 mm | 01.03.2023 | 2 | as is where is | immediately |
93062 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2004 | 1 | as is where is | |
103558 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 1 | as is where is | ||
93063 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2005 | 1 | as is where is | |
93064 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
103560 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
108936 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.04.2004 | 1 | as is where is | |
93065 | TEL TOKYO ELECTRON | ALPHA-303i | Vertical Furnace K type / MTO | 300 MM | 31.05.2007 | 1 | as is where is | |
103561 | TEL Tokyo Electron | ALPHA 303I | Poly / K type | 300 mm | 31.05.2004 | 1 | as is where is | |
108937 | TEL TOKYO ELECTRON | Lithius | Photoresist Coater and Developer Track | 300 mm | 01.06.2007 | 1 | as is where is | |
103562 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
103564 | TEL Tokyo Electron | ALPHA 303I-KVCN | Poly / K type | 300 mm | 1 | as is where is | ||
103565 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
103566 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
21135 | TEL TOKYO ELECTRON | UPGRADE FOR SCCM OXIDE TOOL | KIT FOR UPGRADE FOR SCCM OXIDE TOOL | SPARES | 1 | as is where is | immediately | |
103567 | TEL Tokyo Electron | ALPHA-303i | K type / Poly | 300 mm | 1 | as is where is | ||
108943 | TEL Tokyo Electron | Precio | Fully Automatic prober | 300 mm | 1 | as is where is | immediately | |
103568 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
103569 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
103570 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
103571 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
103572 | TEL Tokyo Electron | FORMULA | DCS SiN | 300 mm | 1 | as is where is | ||
103573 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103574 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103575 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108695 | TEL Tokyo Electron | TRIAS | High K Metal CVD and ALD system, NiOx, HfOx process | 300 MM | 01.06.2012 | 1 | inquire | |
103576 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103577 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103578 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103579 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103580 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103581 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
103582 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
108707 | TEL Tokyo Electron | Tactras RLSA (Chamber) | Polysilicon Dry Etch Chamber | 300 MM | 01.06.2012 | 1 | inquire | |
108966 | TEL Tokyo Electron | ACT 12 | DOUBLE BLOCK TRACK with 3 PCT, 1 COT, 4 DEV, R to L | 200 mm | 01.06.2018 | 1 | inquire | immediately |
103597 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102574 | TEL Tokyo Electron | D204 | Chiller | 1 | inquire | |||
103598 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
102575 | TEL Tokyo Electron | D250 | Chiller | 2 | inquire | |||
103599 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108207 | TEL Tokyo Electron | VIGUS_NEST | Dry ETCHing System | 300 mm | 01.06.2007 | 1 | as is where is | |
103600 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
106416 | TEL TOKYO ELECTRON | INDY-PLUS-B-M | VERTICAL CVD FURNACE | 300 mm | 01.07.2010 | 1 | as is where is | immediately |
108208 | TEL Tokyo Electron | VIGUS_PX | Dry Etcher | 300 mm | 01.06.2007 | 1 | as is where is | |
103601 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108209 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
103602 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108210 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
103603 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108211 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
103604 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
108212 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2007 | 1 | as is where is | |
103605 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103606 | TEL Tokyo Electron | FORMULA | Vertical Diffusion Furnace | 300 mm | 1 | as is where is | ||
103611 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 1 | as is where is | ||
103612 | TEL Tokyo Electron | INDY | ALD High-K | 300 mm | 31.05.2011 | 1 | as is where is | |
103613 | TEL Tokyo Electron | INDY | Doped Poly | 300 mm | 1 | as is where is | ||
103614 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 31.05.2014 | 1 | as is where is | |
103615 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
103616 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
103617 | TEL Tokyo Electron | INDY PLUS | ALD High-K | 300 mm | 1 | as is where is | ||
103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
18890 | TEL TOKYO ELECTRON | 201345 | Operations manual | 1 | as is where is | |||
103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
18891 | TEL TOKYO ELECTRON | 201336 | Operations manual | 1 | as is where is | |||
103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
18892 | TEL TOKYO ELECTRON | 201341 | Operations manual | 1 | as is where is | |||
108492 | TEL Tokyo Electron | ALPHA-303i Anneal | Vertical Furnace | 300 mm | 3 | as is where is | ||
18893 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
91341 | TEL TOKYO ELECTRON | TELIUS SCCM T-3044SS | DRY ETCHER | 300 mm | 31.05.2007 | 1 | as is where is | |
103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
108493 | TEL Tokyo Electron | ALPHA-303i Nitride | Vertical Furnace | 300 mm | 5 | as is where is | ||
18894 | TEL TOKYO ELECTRON | 201339 | Operations manual | 1 | as is where is | |||
103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
108494 | TEL Tokyo Electron | ALPHA-303i TEOS | Vertical Furnace | 300 mm | 6 | as is where is | ||
18895 | TEL TOKYO ELECTRON | 201335 | Operations manual | 1 | as is where is | |||
103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
108495 | TEL Tokyo Electron | Cellcia | Production Wafer Prober | 300 mm | 20 | as is where is | ||
18896 | TEL TOKYO ELECTRON | 201342 | Operations manual | 1 | as is where is | |||
103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
108496 | TEL Tokyo Electron | Cellesta+ | Single Wafer Processing | 300 mm | 3 | as is where is | ||
18897 | TEL TOKYO ELECTRON | 201346 | Operations manual | 1 | as is where is | |||
108497 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 5 | as is where is | ||
103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
108498 | TEL Tokyo Electron | CLEAN TRACK LITHIUS_ | Single Block (Coat/Develop) | 300 mm | 8 | as is where is | ||
108499 | TEL Tokyo Electron | CLEAN TRACK MARK 8 | Single Block (Resist Coater/Developer) | 200 MM | 1 | as is where is | ||
108500 | TEL Tokyo Electron | Expedius | Batch Wafer Processing | 300 mm | 3 | as is where is | ||
108501 | TEL Tokyo Electron | Expedius+ | Batch Wafer Processing | 300 mm | 1 | as is where is | ||
108502 | TEL Tokyo Electron | NS 300 | Wafer Scrubber | 300 mm | 6 | as is where is | ||
108503 | TEL Tokyo Electron | P-12XLn+ | Production Wafer Prober | 300 mm | 1 | as is where is | ||
108504 | TEL Tokyo Electron | Tactras BX JIN | Dielectric Etch | 300 mm | 1 | as is where is | ||
108505 | TEL Tokyo Electron | Tactras RLSA Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
108506 | TEL Tokyo Electron | Tactras Vesta | Polysilicon Etch | 300 mm | 6 | as is where is | ||
108507 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
108508 | TEL Tokyo Electron | Tactras Vesta NV3 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
108509 | TEL Tokyo Electron | Tactras Vesta NV4 | Polysilicon Etch | 300 mm | 1 | as is where is | ||
108510 | TEL Tokyo Electron | Tactras Vigus | Dielectric Etch | 300 mm | 1 | as is where is | ||
108511 | TEL Tokyo Electron | Tactras Vigus - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
108512 | TEL Tokyo Electron | Tactras Vigus RK3 - Chamber Only | Dielectric Etch | 300 mm | 1 | as is where is | ||
108513 | TEL Tokyo Electron | Tactras Vigus RK5 | Dielectric Etch | 300 mm | 1 | as is where is | ||
108002 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, DRY OXIDE | 200 mm | 1 | as is where is | immediately | |
108514 | TEL Tokyo Electron | TELFORMULA ALD High-K | Vertical Furnace | 300 mm | 7 | as is where is | ||
108003 | TEL Tokyo Electron | Alpha 805 | VERTICAL CVD FURNACE, TEOS PROCESS | 200 mm | 1 | as is where is | immediately | |
108515 | TEL Tokyo Electron | TELFORMULA Anneal | Vertical Furnace | 300 mm | 3 | as is where is | ||
109027 | TEL Tokyo Electron | Alpha 8S-Z (AP) | Vertical Furnace Oxide Process | 200 mm | 01.08.1999 | 1 | as is where is | immediately |
108004 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, PYRO PROCESS | 200 mm | 1 | as is where is | immediately | |
108516 | TEL Tokyo Electron | TELFORMULA LPRO | Vertical Furnace | 300 mm | 1 | as is where is | ||
108005 | TEL Tokyo Electron | Alpha 8S | VERTICAL CVD FURNACE, POCL3 PROCESS | 200 mm | 1 | as is where is | immediately | |
108517 | TEL Tokyo Electron | TELFORMULA LPRO | Vertical Furnace | 300 mm | 1 | as is where is | ||
108518 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical Furnace | 300 mm | 10 | as is where is | ||
108519 | TEL Tokyo Electron | TELINDY Nitride | Vertical Furnace | 300 mm | 4 | as is where is | ||
108520 | TEL Tokyo Electron | TELINDY Plus ALD | Vertical Furnace | 300 mm | 7 | as is where is | ||
108521 | TEL Tokyo Electron | TELINDY Plus ALD HighK | Vertical Furnace | 300 mm | 3 | as is where is | ||
108522 | TEL Tokyo Electron | TELINDY Plus Anneal | Vertical Furnace | 300 mm | 1 | as is where is | ||
108523 | TEL Tokyo Electron | TELINDY Plus IRAD Oxide | Vertical Furnace | 300 mm | 1 | as is where is | ||
108524 | TEL Tokyo Electron | TELINDY Plus Oxide | Vertical Furnace | 300 mm | 1 | as is where is | ||
86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
108525 | TEL Tokyo Electron | TELINDY Plus process TBD | Vertical Furnace | 300 mm | 1 | as is where is | ||
108526 | TEL Tokyo Electron | Telius 305 SCCM | Dielectric Etch | 300 mm | 1 | as is where is | ||
108527 | TEL Tokyo Electron | Telius SP 305 DRM | Dielectric Etch | 300 mm | 4 | as is where is | ||
108528 | TEL Tokyo Electron | Telius SP-305 SCCM | Dielectric Etch | 300 mm | 3 | as is where is | ||
102897 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System, SINGLE BLOCK | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
108529 | TEL Tokyo Electron | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 8 | as is where is | ||
102898 | TEL Tokyo Electron | Clean Track ACT 12 | Photo Resist Coat and Develop System | 300 mm | 01.05.1998 | 1 | as is where is | immediately |
108530 | TEL Tokyo Electron | Trias W | MOCVD | 300 mm | 2 | as is where is | ||
102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 01.06.2006 | 1 | as is where is | immediately |
108531 | TEL Tokyo Electron | Trias W - Chamber Only | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
108532 | TEL Tokyo Electron | Triase+ EX-II Plus Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
108533 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
108534 | TEL Tokyo Electron | Triase+ EX-II Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
87287 | TEL Tokyo Electron | TELFORMULA Nitride | Vertical LPCVD Furnace | 300 mm | 31.05.2004 | 1 | as is where is | immediately |
102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
108535 | TEL Tokyo Electron | Triase+ SFD-W | MOCVD | 300 mm | 1 | as is where is | ||
102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 01.05.1998 | 2 | as is where is | immediately |
106744 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
108536 | TEL Tokyo Electron | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
106745 | TEL TOKYO ELECTRON | ALPHA 303I | Nitride CVD Furnace | 300 mm | 1 | as is where is | ||
108537 | TEL Tokyo Electron | Unity Me 85 DRM | Dielectric Etch | 200 MM | 01.06.2013 | 1 | as is where is | immediately |
106746 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
108538 | TEL Tokyo Electron | Unity Me 85 SCCM | Dielectric Etch | 200 MM | 1 | as is where is | ||
98299 | TEL Tokyo Electron | FORMULA | Vertical LPCVD Furnace | 300 mm | 1 | as is where is | ||
106747 | TEL TOKYO ELECTRON | FORMULA | ALD High K FURNACE | 300 mm | 1 | as is where is | ||
102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 01.05.1999 | 1 | as is where is | immediately |
106748 | TEL TOKYO ELECTRON | LITHIUS | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2005 | 1 | as is where is | |
102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106749 | TEL TOKYO ELECTRON | LITHIUS i+ | High Reliability and Productivity Coater Developer (5C/5D) | 300 mm | 01.06.2006 | 1 | as is where is | |
98302 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2006 | 1 | as is where is | |
102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106750 | TEL TOKYO ELECTRON | TEL TRIAS | CVD Cluster tool | 300 mm | 1 | as is where is | ||
98303 | TEL Tokyo Electron | INDY | Vertical Furnace | 300 mm | 31.05.2004 | 1 | as is where is | |
102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
106751 | TEL TOKYO ELECTRON | TEL TRIAS 200 SPA | CVD Cluster tool | 300 mm | 1 | as is where is | ||
83831 | TOKYO ELECRON | 015 | RELAY | SPARES | 1 | as is where is | immediately | |
83833 | TOKYO ELECRON | 011 | SUPPORT.PCB..SQ-80 | SPARES | 1 | as is where is | immediately | |
108039 | Tokyo Electron | Spare Parts | Various Spare Parts for sale | Spares | 1 | as is where is | immediately | |
83641 | TOKYO ELECTRON | 1D10-317R09-12 | PLATE,GALDEN FLOW CHECKER | SPARES | 1 | as is where is | immediately | |
83640 | TOKYO ELECTRON / CONTEC | FC-SD70 | flow meter | FLOW CHECKER | 1 | as is where is | immediately | |
106338 | TOKYO ELECTRON LTD / TEL | NGT | SINGLE BLOCK FOR NIKON S307E | 300mm | 1 | as is where is |