The following are the items available for sale related to Applied Materials at SDI fabsurplus.com. To inquire about the Applied Materials equipment item you need, click on the relevant link below to get more details, and inquiry if interested. If no result is shown, please try to search for another item or inquiry us about your request of Applied Materials items.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 100868 | Applied Materials | Mirra Mesa | CMP System | 200 mm | 1 | inquire | 5 months | |
| 108037 | Applied Materials | Varius Spare Parts | Spare Parts for sale | Spares | 1 | as is where is | immediately | |
| 100873 | Applied Materials | Mirra Mesa Integrated | Oxide/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 106761 | Applied Materials | Mirra ® Mesa | CMP system with Cleaner | 200 mm | 1 | as is where is | immediately | |
| 108556 | Applied Materials | Uvision 600SP | Brightfield Inspection System | 300 mm | 01.05.2008 | 1 | as is where is | immediately |
| 108557 | Applied Materials | Centura EPI | Epitaxial Deposition, reduced pressure, 2 chamber | 300 mm | 01.05.2002 | 1 | as is where is | immediately |
| 108558 | Applied Materials | ENDURA CL | PVD Cluster tool | 300 mm | 01.05.2002 | 1 | as is where is | |
| 108559 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2006 | 1 | as is where is | immediately |
| 108560 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 108561 | Applied Materials | ENDURA II Chamber | PVD | 300 mm | 01.05.2018 | 1 | as is where is | immediately |
| 91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 96534 | Applied Materials | Mirra Mesa | CMP system | 200 mm | 1 | inquire | ||
| 91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 96537 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
| 96538 | Applied Materials | Mirra Ontrak | Poly/STI CMP | 200 mm | 31.05.1999 | 1 | inquire | |
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | ||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | ||
| 108316 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 01.12.2014 | 1 | as is where is | immediately |
| 97053 | Applied Materials | ENDURA2 Chamber only | Amber-(Ti) chamber | 300 mm | 1 | as is where is | immediately | |
| 97054 | Applied Materials | ENDURA2 Chamber only | ESIP chamber | 300 mm | 1 | as is where is | immediately | |
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 97057 | Applied Materials | ENDURA2 Chamber only | MOALD (IMP Ti) Chamber | 300 mm | 1 | as is where is | immediately | |
| 97059 | Applied Materials | ENDURA2 Chamber only | RfxT_CU Chamber | 300 mm | 1 | as is where is | immediately | |
| 97061 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 97062 | Applied Materials | ENDURA2 Chamber Only | WSI chamber only | 300 mm | 1 | as is where is | immediately | |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 91182 | Applied Materials | P5000 CVD | Delta Teos | 150 mm | 31.05.1993 | 1 | as is where is | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 91183 | Applied Materials | P5000 CVD | TEOS, DxL | 200 mm | 1 | as is where is | ||
| 100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2016 | 1 | as is where is | |
| 91185 | Applied Materials | P5000 CVD | DxL | 150 mm | 31.05.1995 | 1 | as is where is | |
| 100913 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | |
| 106289 | APPLIED MATERIALS | UVISION 5 | Bright Field Inspection | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
| 108337 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 MESA 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 100914 | Applied Materials | DPS II | AE Poly G3 dry etcher | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | |
| 108338 | Applied Materials | Centris AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch with qty 6 Centris Mesa 2 chambers | 300 mm | 1 | as is where is | immediately | |
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | |
| 108339 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | |
| 108340 | Applied Materials | Centris SYM3 Poly Chamber | Polysilicon Etch (Chamber Only) | 300 mm | 1 | as is where is | immediately | |
| 91189 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108341 | Applied Materials | Centris SYM3Y Poly | Polysilicon Etch (Chamber Only) | 300 mm | 2 | as is where is | immediately | |
| 91190 | Applied Materials | P5000 CVD | DxL | 200 mm | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108342 | Applied Materials | Centura AP - Mainframe Only (Poly Etch) | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 108343 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300 mm | 3 | as is where is | ||
| 91192 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 108344 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91193 | Applied Materials | P5000 Mark-II CVD | TEOS | 150 mm | 1 | as is where is | ||
| 108345 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 7 | as is where is | ||
| 83514 | Applied Materials | Opal 7830i Enhanced | CD-SEM | 100 mm to 200 mm | 01.05.1997 | 1 | as is where is | immediately |
| 91194 | Applied Materials | P5000 Mark-II CVD | DxL | 200 mm | 1 | as is where is | ||
| 103482 | Applied Materials | DPS SILVIA | Silvia 2ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108346 | Applied Materials | Centura AP AdvantEdge G5 Minos Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 11579 | Applied Materials | 9200 (Spares for) | IMPLANTER 6 INCH TO 8 INCH CONVERSION KIT | 200 mm | 01.06.1999 | 1 | inquire | immediately |
| 91195 | Applied Materials | P5000 Mark-II CVD | TEOS | 200 mm | 1 | as is where is | ||
| 103483 | Applied Materials | DPS2 | Poly Etcher | 300 mm | 1 | as is where is | ||
| 108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | ||
| 91196 | Applied Materials | P5000 Mark-II CVD+Etch | Sputter | 200 mm | 1 | as is where is | ||
| 103484 | Applied Materials | DPS2 | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108348 | Applied Materials | Centura AP ASP II - Chamber Only | Metal Etch | 300 mm | 1 | as is where is | ||
| 103485 | Applied Materials | DPS2 AE | Poly Etcher | 300 mm | 1 | as is where is | ||
| 108349 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 3 | as is where is | ||
| 103486 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108350 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300 mm | 1 | as is where is | ||
| 91199 | Applied Materials | P5000 Mark-II CVD+PVD | TEOS 2Ch, SPUTTER 2Ch | 200 mm | 01.05.1997 | 1 | as is where is | |
| 103487 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108351 | Applied Materials | Centura AP eMax CT | Dielectric Etch | 300 mm | 1 | as is where is | ||
| 103488 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108352 | Applied Materials | Centura AP iSprint | Metal CVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91201 | Applied Materials | P5000 Mark-II CVD+Etch | TEOS 2Ch, Sputter 2Ch | 200 mm | 01.05.2000 | 1 | as is where is | |
| 103489 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108353 | Applied Materials | Endura 5500 Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103490 | Applied Materials | DPS2 AE | Poly Mesa 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108354 | Applied Materials | Endura 5500 Chambers: Multiple | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103491 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 1 | as is where is | ||
| 108355 | Applied Materials | Endura II Aluminum Interconnect | PVD (Physical Vapor Deposition) | 300 mm | 4 | as is where is | ||
| 91204 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 103492 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2005 | 1 | as is where is | |
| 108356 | Applied Materials | Endura II Chamber: CIP W PVD | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 91205 | Applied Materials | P5000 WCVD | WxL | 200 mm | 1 | as is where is | ||
| 103493 | Applied Materials | DPS2 AE | MINOS (Dry Etch) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 108357 | Applied Materials | Endura II Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 3 | as is where is | ||
| 103494 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108358 | Applied Materials | Endura SL Front-End Metallization | PVD (Physical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103495 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108359 | Applied Materials | Oasis Clean | Batch Wafer Processing | 300 mm | 3 | as is where is | ||
| 91208 | Applied Materials | Producer GT Chamber (A) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 103496 | Applied Materials | DPS2 AE | MESA (Dry Etch) | 300 mm | 31.05.2019 | 1 | as is where is | |
| 108360 | Applied Materials | Producer Etch eXT Dielectric | Dielectric Etch | 300 mm | 3 | as is where is | ||
| 91209 | Applied Materials | Producer GT Chamber (B) | SICONI Chamber only | 300 mm | 1 | as is where is | ||
| 108361 | Applied Materials | Producer GT APF | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 108362 | Applied Materials | Producer GT Eterna FCVD | PECVD (Chemical Vapor Deposition) | 300 mm | 5 | as is where is | ||
| 103499 | Applied Materials | ENDURA 2 | CH-1_TTN/CH-2_AL/CH-3_TTN/ CH-C&D_PCXT/CH-E&F_Degas | 300 mm | 31.05.2017 | 1 | as is where is | |
| 108363 | Applied Materials | Producer GT PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103500 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 31.05.2001 | 1 | as is where is | |
| 108364 | Applied Materials | Producer GT Selectra | Selective Etch | 300 mm | 1 | as is where is | ||
| 103501 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 31.05.2008 | 1 | as is where is | |
| 108365 | Applied Materials | Producer SE APF | PECVD (Chemical Vapor Deposition) | 300 mm | 4 | as is where is | ||
| 103502 | Applied Materials | ENDURA 2 CH | Preclean XT Chamber | 300 mm | 1 | as is where is | ||
| 108366 | Applied Materials | Producer SE PECVD SILANE | PECVD (Chemical Vapor Deposition) | 300 mm | 8 | as is where is | ||
| 103503 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2004 | 1 | as is where is | |
| 106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | ||
| 108367 | Applied Materials | Producer SE PECVD TEOS | PECVD (Chemical Vapor Deposition) | 300 mm | 1 | as is where is | ||
| 103504 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106576 | Applied Materials | CENTURA DPS G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | |
| 108368 | Applied Materials | Reflexion - Dielectric | Dielectric CMP | 300 mm | 4 | as is where is | ||
| 103505 | Applied Materials | ENDURA 2 CHAMBER ONLY | Remote Plasma Clean Chamber | 300 mm | 31.05.2010 | 1 | as is where is | |
| 106065 | Applied Materials | Mirra ® 3400 | Stand-Alone CMP System | 200 mm | 01.06.2001 | 1 | inquire | immediately |
| 106577 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108369 | Applied Materials | Reflexion LK - Poly/STI | Poly/STI CMP | 300 mm | 1 | as is where is | ||
| 103506 | Applied Materials | ENDURA CL | PVD | 300 mm | 31.05.2010 | 1 | as is where is | |
| 106578 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 108370 | Applied Materials | Reflexion LK Copper | Copper CMP | 300 mm | 3 | as is where is | ||
| 106579 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 108371 | Applied Materials | Reflexion LK Oxide | Dielectric CMP | 300 mm | 9 | as is where is | ||
| 103508 | Applied Materials | PRODUCER GT | Ht ACL 3ch / Server OS Type | 300 mm | 31.05.2014 | 1 | as is where is | |
| 106580 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 108372 | Applied Materials | Vantage Radiance RTP | Platform RTP Equipment | 300 mm | 1 | as is where is | ||
| 103509 | Applied Materials | PRODUCER GT | BD2_CU | 300 mm | 31.05.2002 | 1 | as is where is | |
| 106581 | Applied Materials | CENTURA DPS G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 108373 | Applied Materials | Vantage RadiancePlus | Platform RTP Equipment | 300 mm | 1 | as is where is | ||
| 103510 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 31.05.2003 | 1 | as is where is | |
| 106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | |
| 108374 | Applied Materials | VeritySEM 2 | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103511 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | |
| 108375 | Applied Materials | VeritySEM 4i | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103512 | Applied Materials | RAIDER | ECD Copper Electroplating System | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106584 | Applied Materials | ENDURA 2 (Gray Rack) | 3CH (WxZ) | 300 mm | 01.06.2007 | 1 | as is where is | |
| 108376 | Applied Materials | VeritySEM 4i+ | SEM - Critical Dimension (CD) Measurement | 300 mm | 1 | as is where is | ||
| 103513 | Applied Materials | RAIDER | ECD Copper Electroplating System | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106585 | Applied Materials | ENDURA 2 Chamber Only | ALPS | 300 mm | 1 | as is where is | ||
| 106586 | Applied Materials | ENDURA 2 Chamber Only | MOALD (IMP TiN) | 300 mm | 1 | as is where is | ||
| 103515 | Applied Materials | VANTAGE HYBRID | RTP / Server OS Type | 300 mm | 31.05.2006 | 1 | as is where is | |
| 106587 | Applied Materials | ENDURA 2 CHAMBER ONLY | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 103516 | Applied Materials | VANTAGE RADIANCE | RTP | 300 mm | 31.05.2005 | 1 | as is where is | |
| 106588 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106589 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2018 | 1 | as is where is | |
| 106590 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2018 | 1 | as is where is | |
| 106591 | Applied Materials | ENDURA 2 Chamber Only | PCXT | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106592 | Applied Materials | ENDURA 2 CHAMBER ONLY | RPC | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106593 | Applied Materials | ENDURA 2 CHAMBER ONLY | SIP Ti | 300 mm | 1 | as is where is | ||
| 106594 | Applied Materials | ENDURA 2 CHAMBER ONLY | SIP Ti | 300 mm | 1 | as is where is | ||
| 106339 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106595 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 106340 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106596 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 106341 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2010 | 1 | as is where is | |
| 106597 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | |
| 106342 | Applied Materials | Centura ENABLER-E2 | Dry etch cluster tool | 300 mm | 01.06.2007 | 1 | as is where is | |
| 106598 | Applied Materials | ENDURA 2 Chamber Only | SIP Ti | 300 mm | 1 | as is where is | ||
| 108134 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | ||
| 106343 | Applied Materials | Centura ENABLER-E5 | Dry etch cluster tool | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106599 | Applied Materials | ENDURA 2 CHAMBER ONLY | TXZ ALD chamber | 300 mm | 1 | as is where is | immediately | |
| 108135 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Cu) Chamber only | 300 mm | 1 | as is where is | ||
| 93032 | Applied Materials | CENTRIS DPS MESA | Dry Etch, Twin 3chamber | 300 MM | 01.05.2010 | 1 | as is where is | immediately |
| 106344 | Applied Materials | P5000 SiN | CVD cluster tool | 150 mm | 1 | as is where is | ||
| 106600 | Applied Materials | ENDURA CL Chamber Only | CVD AL(AXZ) | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108136 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | ||
| 106345 | Applied Materials | P5000 TEOS | CVD cluster tool | 150 mm | 01.06.1989 | 1 | as is where is | |
| 106601 | Applied Materials | ENDURA CL Chamber Only | CVD AL(AXZ) | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108137 | Applied Materials | ENDURA 2 CHAMBER Only | EnCoRe1(Ta) Chamber only | 300 mm | 1 | as is where is | ||
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | |
| 106346 | Applied Materials | PRODUCER (2)DPN (1) RTP | CVD cluster tool | 300 mm | 01.06.2008 | 1 | as is where is | |
| 106602 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108138 | Applied Materials | ENDURA 2 CHAMBER Only | PCXT Chamber only | 300 mm | 01.06.2019 | 1 | as is where is | |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | |
| 106603 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108139 | Applied Materials | ENDURA CL | Not include XP Robot | 300 mm | 01.06.2002 | 1 | as is where is | |
| 93036 | Applied Materials | P5000 Etch | no chamber (PLIS type) | 200 mm | 1 | as is where is | ||
| 106348 | Applied Materials | PRODUCER SE ACL (2CH) | CVD cluster tool | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106604 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108140 | Applied Materials | ENDURA CL | 300 mm | 1 | as is where is | |||
| 106349 | Applied Materials | PRODUCER-GT(EFEM) | CVD cluster tool | 300 mm | 01.06.2019 | 1 | as is where is | |
| 106605 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108141 | Applied Materials | ENDURA CL Chamber Only | ESIP TAN (No Target) Chamber only | 300 mm | 1 | as is where is | ||
| 106350 | Applied Materials | Uvision 200 | Wafer Inspection | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106606 | Applied Materials | ENDURA CL Chamber Only | Degas Chamber only | 300 mm | 1 | as is where is | ||
| 108142 | Applied Materials | Olympia | ALD | 300 mm | 1 | as is where is | ||
| 106351 | Applied Materials | Centura VANTAGE VULCAN | RTP Cluster tool | 300 mm | 01.06.2013 | 1 | as is where is | |
| 106607 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108143 | Applied Materials | P5000 | Delta Dlh 3chCVD | 150 mm | 1 | as is where is | ||
| 106352 | Applied Materials | Centura VANTAGE VULCAN | RTP Cluster tool | 300 mm | 1 | as is where is | ||
| 106608 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108144 | Applied Materials | P5000 | Mark II Metal ETCH | 150 mm | 1 | as is where is | ||
| 106609 | Applied Materials | ENDURA CL Chamber Only | PRECLEAN | 300 mm | 1 | as is where is | ||
| 108145 | Applied Materials | P5000 | Teos dlh 3ch CVD | 150 mm | 1 | as is where is | ||
| 106098 | Applied Materials | Mirra ® 3400 | Stand-Alone CMP system | 200 mm | 01.06.2008 | 1 | as is all rebuilt | 4 months |
| 106610 | Applied Materials | ENDURA CL Chamber Only | RPC | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108146 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106611 | Applied Materials | ENDURA CL Chamber Only | RPC | 300 mm | 01.06.2002 | 1 | as is where is | |
| 108147 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 70004 | Applied Materials | Baccini | Misc parts For Baccini Solar Line - see attached list | Spares | 1 | as is where is | immediately | |
| 108148 | Applied Materials | Producer SE Chamber | LLTO Chamber only | 300 mm | 01.06.2014 | 1 | as is where is | |
| 106613 | Applied Materials | ENDURA2 CHAMBER ONLY | PVD CHAMBER | 300 mm | 1 | as is where is | ||
| 108149 | Applied Materials | PRODUCER SE CHAMBER | PECVD Silane Chamber Only | 300 mm | 1 | as is where is | ||
| 106614 | Applied Materials | ENDURA2 VOLTA CO | CHAMBER QTY 2 SETS | 300 mm | 1 | as is where is | ||
| 108150 | Applied Materials | PRODUCER SE CHAMBER | PECVD TEOS Chamber Only | 300 mm | 1 | as is where is | ||
| 106615 | Applied Materials | G5-MESA | DRY ETCH EFEM | 300 MM | 1 | as is where is | ||
| 86136 | Applied Materials | PRODUCER_SE_2CH | CVD | 300 mm | 31.05.2007 | 1 | as is where is | |
| 106616 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106872 | Applied Materials | Centura AP AdvantEdge Minos Poly | Polysilicon Etch (3 CH ETCH AND 1 CH STRIP) | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 106617 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106618 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 93051 | Applied Materials | P5000 | WXL | 150 mm | 31.05.1994 | 1 | as is where is | |
| 106619 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 106620 | Applied Materials | MESA CHAMBER ONLY | DRY ETCH CHAMBER | 300 mm | 1 | as is where is | ||
| 93053 | Applied Materials | PRODUCER GT | LLTO | 300 mm | 31.05.2014 | 1 | as is where is | |
| 106621 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 150 mm | 01.06.1996 | 1 | as is where is | |
| 106622 | Applied Materials | P5000 | Delta Teos 3ch, Sputter 1ch | 200 mm | 01.06.1998 | 1 | as is where is | |
| 105855 | Applied Materials | 0040-35966-P1 | WLDMT,LAMP HOUSING,RTP CHMBR | 200 mm | 01.05.1997 | 1 | as is where is | immediately |
| 106623 | Applied Materials | P5000 | DxL 2ch | 200 mm | 01.06.1996 | 1 | as is where is | |
| 106624 | Applied Materials | PRODUCER GT | ACL 1ch / Server X | 300 mm | 1 | as is where is | ||
| 106625 | Applied Materials | PRODUCER GT | CH_A_FOX / CH_B_eHARP / Server OS Type | 300 mm | 01.06.2009 | 1 | as is where is | |
| 106626 | Applied Materials | PRODUCER GT | Ht_Acl 3ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106627 | Applied Materials | PRODUCER GT | Siconi 3ch | 300 mm | 01.06.2009 | 1 | as is where is | |
| 108931 | Applied Materials | SEMVISION G5 MAX | Defect Review SEM | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
| 106628 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 106629 | Applied Materials | Producer GT Chamber | HARP | 300 mm | 1 | as is where is | ||
| 106630 | Applied Materials | Producer GT Chamber | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 36487 | APPLIED MATERIALS | P-5000 DxL | DxL, TEOS | 150mm | 1 | inquire | ||
| 106631 | Applied Materials | Producer GT Chamber | SIH4 | 300 mm | 1 | as is where is | ||
| 101768 | Applied Materials | 0010-00557 REV A | Heat Exchanger | FACILITIES | 31.08.1988 | 1 | as is where is | immediately |
| 106632 | Applied Materials | Producer GT Chamber only | SICONI Chamber only | 300 mm | 01.06.2017 | 1 | as is where is | |
| 106633 | Applied Materials | PRODUCER SE | CH_A_ACL / CH_B_PE-Sin / CH_C_PE-Teos / Server OS Type | 300 mm | 01.06.2004 | 1 | as is where is | |
| 106634 | Applied Materials | PRODUCER SE | Ht_SiN 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106635 | Applied Materials | PRODUCER SE | SILANE 2ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 106636 | Applied Materials | PRODUCER SE | Teos 2ch / Server OS Type | 300 mm | 01.06.2006 | 1 | as is where is | |
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 106637 | Applied Materials | ENDURA 2 Chamber Only | (IMP Ti) | 300 mm | 1 | as is where is | ||
| 106638 | Applied Materials | ENDURA 2 Chamber Only | EXTENSA Ti | 300 mm | 01.06.2008 | 1 | as is where is | |
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91284 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91285 | Applied Materials | Etch dry chamber Only | AXIOM, DPS | 300 mm | 1 | as is where is | ||
| 91286 | Applied Materials | P5000 | DELTA DLH | 150 mm | 1 | as is where is | ||
| 91287 | Applied Materials | P5000 | DELTA DLH | 150 mm | 31.05.1993 | 1 | as is where is | |
| 18840 | APPLIED MATERIALS | 0230-00101 | Precision etch 8300 | 1 | as is where is | |||
| 18841 | APPLIED MATERIALS | 0230-09130 | Precision 5000 Mark II spare part identified | 1 | as is where is | |||
| 105881 | Applied Materials | Reflexion GT | CMP system with integrated cleaner | 300 MM | 01.05.2011 | 1 | as is where is | immediately |
| 18842 | APPLIED MATERIALS | 0230-09259 | Precision 5000 Mark II Mainframe and support equipment manual | 1 | as is where is | |||
| 18843 | APPLIED MATERIALS | 079-1202-0D | PR 5000 Advanced prev. And corrective main | 1 | as is where is | |||
| 108699 | Applied Materials | Oasis | HF Wafer cleaning system | 300 MM | 01.06.2006 | 1 | inquire | |
| 4252 | Applied Materials | 0230-09130 | P5000 SPARE PARTS IDENTIFIER | Spares | 01.01.1992 | 1 | as is where is | |
| 18844 | APPLIED MATERIALS | 026-110-0B1 | PR 5000 Func desc. Practice exercici and basic prev. maintenance procedures | 1 | as is where is | |||
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | |
| 91052 | APPLIED MATERIALS | CENTURA E-MAX CT 3CH | DRY ETCH | 300 mm | 1 | as is where is | ||
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93108 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 31.05.2017 | 1 | as is where is | |
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 93109 | Applied Materials | PRODUCER GT | UV Bake Photostabilizer | 300 mm | 31.05.2017 | 1 | as is where is | |
| 95928 | Applied Materials | Centura AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately |
| 106944 | Applied Materials | Endura 5500 (spare parts) | Endura 6" process kit for Degas Chamber, NEW, in AMAT box , including 0020-28140 and other parts | 150 mm | 01.11.2001 | 1 | as is where is | immediately |
| 102855 | Applied Materials | Centura 5200 | WxP Chamber (Mechanical Clamp Chuck) Tungsten etch Back | 200 mm | 4 | as is where is | ||
| 102856 | Applied Materials | Centura 5200 DPS II | Metal Etch with 2 x DPS2 Metal etch and 2 x Axiom CH | 300 mm | 31.05.2008 | 1 | as is where is | |
| 102857 | Applied Materials | P5000 | PECVD TEOS with 3 x SACVD chambers | 200 mm | 1 | as is where is | ||
| 91602 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 98514 | Applied Materials | P5000 | PE CVD | 200 mm | 1 | as is where is | ||
| 91603 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91604 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91605 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91606 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91607 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 91608 | Applied Materials | ENDURA CL Chamber Only | AxZ | 300 mm | 1 | as is where is | ||
| 98264 | Applied Materials | VANTAGE (Rediance 3.x) | RTP | 300 mm | 31.05.2003 | 1 | as is where is | |
| 106203 | Applied Materials | Mirra 3400 Stand-Alone | Oxide/STI CMP | 200 mm | 01.06.1998 | 1 | inquire | |
| 108254 | Applied Materials | P5000 | CVD system with 4 x DXZ chambers, Silane process | 200 mm | 01.06.2001 | 1 | as is where is | |
| 106207 | Applied Materials | 0240-20611 REV E | KIT SLIT VALVE PER CHAMBER REV E | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91616 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 106208 | Applied Materials | 0040-13659 REV P1 | BLOCK, MTG | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91617 | Applied Materials | ENDURA CL Chamber Only | AL | 300 mm | 1 | as is where is | ||
| 106209 | Applied Materials | 0020-21089 | SHIELD | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91618 | Applied Materials | ENDURA CL Chamber Only | Chamber 1 (Ver. 001) CPI-VMO | 300 mm | 1 | as is where is | ||
| 106210 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106211 | Applied Materials | 0050-20072 REV B | GAS LINE CHAMBER 3 HEATER MFC 1 VCR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 91620 | Applied Materials | ENDURA CL Chamber Only | SOURCE D (Ver. 003) CPI-VMO | 300 mm | 1 | as is where is | ||
| 94436 | Applied Materials | CENTURA MOCVD | NLighten NEON | 31.05.2010 | 1 | as is where is | immediately | |
| 106212 | Applied Materials | 0050-76652 REV A | GAS LINE CHAMBER 2 PROCESS MFC 19 MIXED | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106980 | Applied Materials | Reflexion | CMP system | 300 mm | 1 | inquire | immediately | |
| 106213 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1999 | 2 | as is where is | immediately |
| 106981 | Applied Materials | Reflexion LK | CMP system | 300 mm | 1 | inquire | immediately | |
| 106214 | Applied Materials | 0090-20042 REV D | ASSY 3 WAY VALVE | Spares | 01.06.1999 | 5 | as is where is | immediately |
| 106982 | Applied Materials | Mesa | CMP cleaning system | 300 mm | 1 | inquire | immediately | |
| 91623 | Applied Materials | ENDURA CL Chamber Only | Chamber D (Ver. 001) CPI-VMO(eSIP TAN) | 300 mm | 1 | as is where is | ||
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 106215 | Applied Materials | 0020-20483 REV E | HUB LAMP CORNER COVER | Spares | 01.06.1998 | 2 | as is where is | immediately |
| 106983 | Applied Materials | Desica | CMP Cleaning system | 300 mm | 1 | inquire | immediately | |
| 106216 | Applied Materials | 0140-20502 REV D | HARN ASSY AC 2-PHASE DRIVER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106984 | Applied Materials | Kawasaki 4.0 | Fab Interface Module | 300 mm | 1 | inquire | immediately | |
| 106217 | Applied Materials | 0020-20523 | COVER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106218 | Applied Materials | 0240-70416 REV C | KIT BLOW OUT VALVE PER CHAMBER | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106219 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 94444 | Applied Materials | ENDURA CL Chamber only | AxZ | 300 mm | 31.05.2017 | 1 | as is where is | |
| 106220 | Applied Materials | 0190-20015 REV D | VALVE / MANIFOLD | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106221 | Applied Materials | 3830-01018 REV | LABEL LASERTAB MARKER WHT POLYEST LAM | Spares | 01.06.1999 | 2 | as is where is | immediately |
| 106222 | Applied Materials | 3830-01034 REV | LABEL LASERTAB MARKER WHT POLYEST LAM | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106223 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 106224 | Applied Materials | 3870-01281 REV | VALVE BLANK PLATE ASSY FOR SMC P/N NVJ11 | Spares | 01.06.1999 | 3 | as is where is | immediately |
| 106225 | Applied Materials | 3870-01284 | VALVE BLANK PLATE ASSY FOR SMC P/N NVJ3023 | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106226 | Applied Materials | 0090-20042 REV D | ASSY 3 WAY VALVE | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106227 | Applied Materials | 0190-20015 REV E | GAS LINE NO. 3 PRECLEAN CHAMBER REACTIVE PR | Spares | 01.06.1999 | 1 | as is where is | immediately |
| 106228 | Applied Materials | 0020-20626 REV C | BLOCK MOUNTING SHUT-OFF VALVE | Spares | 01.06.1998 | 1 | as is where is | immediately |
| 108023 | Applied Materials | P5000 | CVD | 200 mm | 01.11.1990 | 1 | as is where is | |
| 71931 | Applied Materials | 0050-76664 REV A | GAS LINE CHAMBER 2 PROCESS WC UPPER MIXE | spares | 01.06.1999 | 1 | as is where is | immediately |
| 71932 | Applied Materials | 0020-20919 REV C | COVER CVD POST | spares | 31.05.1999 | 1 | as is where is | immediately |
| 71933 | Applied Materials | 0150-21344 | CHAMBER D INTERCONNECT EMC COMPLIANT | spares | 31.05.1999 | 1 | as is where is | immediately |
| 105851 | Applied Materials ® | 079-018-05 | P5000 Mk II Functional description Practice exercises | Spares | 30.04.1995 | 1 | as is where is | immediately |
| 105852 | Applied Materials ® | 0230-09258B | P5000 Mk II Mainframe and Support Equipment Manual | Spares | 30.06.1994 | 1 | as is where is | immediately |
| 105853 | Applied Materials ® | 0230-00103 | Precision Etch 8300 Corrective Maintenance Rev 3 | Spares | 30.04.1990 | 2 | as is where is | immediately |
| 105854 | Applied Materials ® | 0230-20005 | Endura Operations and Programming Training Course Student Workbook | Spares | 31.08.1993 | 1 | as is where is | immediately |
| 105858 | Applied Materials ® | 0021-35163 Rev A | Gold-plated RTP Reflector Plate, 200 MM, chamber bottom | 200 mm | 31.05.1997 | 1 | as is where is | immediately |
| 6536 | Applied Materials ® | 0230-09258 B | P5000 Mk II Mainfame support and equipment manual cleanroom July 1994 | Spares | 01.07.1994 | 1 | as is where is | immediately |
| 6537 | Applied Materials ® | 026-105-03 C | P5000 Mk II Functional description training manual | Spares | 01.04.1995 | 1 | as is where is | immediately |
| 6538 | Applied Materials ® | 079-109-0D | P5000 Mk II Advanced calibration proceedures manual Jan 1995 | Spares | 01.01.1995 | 1 | as is where is | immediately |
| 6539 | Applied Materials ® | 079-102-0D | P5000 Mk II Advanced preventive and corrective maintenance Apr 1996 | Spares | 01.04.1996 | 1 | as is where is | immediately |
| 6540 | Applied Materials ® | 026-110-0B.1 | P5000 Mk II Functional description , practice exercises and basic maintenance proceedures | Spares | 01.03.1996 | 1 | as is where is | immediately |