Please find below a list of Used Mask and Reticle Manufacturing Equipment for sale by fabsurplus.com .Click on any listed item of Mask and Reticle Manufacturing Equipment to see further data. In semiconductor device manufacturing, a photomask is a quartz or glass substrate, coated with a light-blocking film , typically made of chrome, or a phase shifting material, containing the design of the device being manufactured. The photomask plays a critical role in the lithography process in the manufacture of integrated circuits (ICs), photonic devices, and micro-electro-mechanical systems (MEMS).
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 109133 | Applied Materials | AERA 4 | Reticle Inspection | RETICLE | 1 | as is where is | ||
| 110687 | Applied Materials | Aera 2 | Photomask Inspection System | 300 mm | 01.06.2009 | 1 | as is where is | immediately |
| 83513 | Entegris | RSPX-EUV-036 | Reticle Direct Purge Cabinet | Facilities | 01.07.2010 | 1 | as is where is | immediately |
| 108068 | Hitachi | HL7000M | E-Beam Litho (6 inch mask) | RETICLE | 1 | as is where is | ||
| 108069 | Hitachi | HL7500M | E-Beam Litho (6 inch mask) | RETICLE | 1 | as is where is | ||
| 108070 | Hitachi | HL7800M | E-Beam Litho (6 inch mask) | RETICLE | 1 | as is where is | ||
| 108071 | Hitachi | HL8000M | E-Beam Litho (6 inch mask) | RETICLE | 1 | as is where is | immediately | |
| 109188 | JEOL | JWS-7855S | Mask Inspection & Repair System | RETICLE | 1 | as is where is | ||
| 108758 | KARL SUSS | MA6 | Mask Aligner | 50-150 mm | 1 | as is all rebuilt | 1 month | |
| 108908 | Karl Suss | MA200 | Mask Aligner | 200 mm | 01.05.2000 | 1 | as is where is | |
| 106143 | KLA | 740-064388-000 | RETICLE TRANSFER SYSTEM FOR 5 AND 6 INCH PHOTOMASKS | 5 INCH/6 INCH | 01.06.1999 | 1 | as is where is | immediately |
| 54208 | SemiNet Automation | Infinity SACS 251216-120-CE | Semi-Automatic Carousel Boxed Wafer Stocker | 200 mm | 01.10.2007 | 1 | as is where is | immediately |
| 106741 | SIGMAMELTEC | SFG3000 | Photomask | 300 mm | 01.06.2006 | 1 | as is where is | |
| 106755 | VISTEC | LWM9000 | CD SEM for 65 nm mask measurement | Reticle / 150 mm | 01.06.2005 | 1 | as is where is | immediately |