Please find below a list of Used Fab Metrology , Inspection and QC Equipment for sale by fabsurplus.com .Click on any listed item of Fab Metrology , Inspection and QC Equipment to see further data. Semiconductor metrology and wafer defect detection are vital in the semiconductor fabrication process. They provide the means to monitor and control the quality of each step in a sub-microscopic manufacturing sequence which can have hundreds of steps and a processing time of several weeks.
SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
---|---|---|---|---|---|---|---|---|
103225 | ADE | NanoMapper FA | Nano-Defects Inspection System | 300 mm | 1 | inquire | immediately | |
108791 | ADE | 5810 | Non-Contact Capacitance Gauging Module with 2ea ADE 2248 Probes | 1 | inquire | |||
108792 | ADE | 6033 | Wafer Thickness Tester | 1 | inquire | |||
108793 | ADE | 6033T | Wafer Thickness Tester | 1 | inquire | |||
109554 | ADE | NANOMAPPER Phase Shift | nano defect inspection system | 300 mm | 01.11.2001 | 1 | as is where is | immediately |
83514 | Applied Materials | Opal 7830i Enhanced | CD MEASUREMENT SEM FOR 200 mm / 150 mm wafers | 100 mm to 200 mm | 01.05.1997 | 1 | as is where is | immediately |
108556 | Applied Materials | Uvision 600SP | Brightfield Inspection System | 300 mm | 01.05.2008 | 1 | as is where is | immediately |
108931 | Applied Materials | SEMVISION G5 MAX | Defect Review SEM | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
109088 | Applied Materials | SEMVISION G3 Lite | Defect Review SEM | 300 mm | 01.08.2007 | 1 | as is where is | 6 months |
109112 | Applied Materials | Verity 2 | CD MEASUREMENT SEM | 200 mm | 01.06.2004 | 1 | immediately | |
109149 | Applied Materials | ComPLUS MP | Darkfield Inspection | 200mm | 1 | as is where is | ||
109150 | Applied Materials | ComPLUS MP | Darkfield Inspection | 200mm | 1 | as is where is | ||
110661 | APPLIED MATERIALS | UVISION 5 | Bright Field Inspection | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
110684 | Applied Materials | Sting | Dark Field Defect Inspection | 300 mm | 01.06.2009 | 1 | as is where is | immediately |
110687 | Applied Materials | Aera 2 | Photomask Inspection System | 300 mm | 01.06.2009 | 1 | as is where is | immediately |
109055 | ASML | Yieldstar S200B | Wafer metrology system | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
109158 | ASML | YieldStar S-200B | Overlay Measurement System | 300mm | 1 | as is where is | ||
109159 | ASML | YieldStar S-250 | Overlay Measurement System | 300mm | 1 | as is where is | ||
108153 | ATI | OAK-1 | Auto Scope Inspection | 01.06.2013 | 1 | as is where is | ||
98447 | August | 3DI-8000 | wafer bump inspection | 300mm | 1 | as is where is | immediately | |
98448 | August | NSX-95 | 2D Auto inspection system / Macro defect inspection system | 200 mm | 4 | as is where is | immediately | |
101818 | August | NSX105 | Wafer Bumping Inspection System / Macro defect inspection | 200mm | 1 | inquire | ||
108734 | Bio-Rad | Q8 | Overlay Metrology | 1 | as is all rebuilt | 1 month | ||
108735 | Bio-Rad | QS-1200 | FT-IR Spectrometer | 100-200 mm | 01.05.2004 | 1 | as is where is | immediately |
108736 | Bio-Rad | QS-300 | FT-IR Spectrometer | 1 | as is where is | immediately | ||
108800 | BIO-RAD | ECN4900PC | Profilers, 2ea Available - Parts Only | 1 | inquire | |||
108801 | BIO-RAD | Q7 | Overlay Metrology Tool | 1 | inquire | |||
108802 | BIO-RAD | Q8 | Overlay Metrology / CD Measurement Tool for up to 200mm Wafers | 1 | inquire | |||
108737 | BIORAD | Q5 | Overlay Metrology Tool | 200 mm | 2 | as is where is | immediately | |
106642 | BROOKS | METARA 7200 | Overlay | 200 mm | 01.06.1996 | 1 | as is where is | |
108025 | BRUKER | VERTEX 80V | FT-IR Spectrometer | 1 | as is where is | |||
110694 | BRUKKER | D8 Fabline MH | Atomic Force Microscope | 150 mm | 01.06.2009 | 1 | as is where is | immediately |
106645 | CAMECA | EX300 | Secondary Ion Mass Spectrometer | 300 mm | 1 | as is where is | ||
108394 | CAMECA | EX-300 | Implant Dosing Measurement | 300 mm | 1 | as is where is | ||
109533 | Creative Design Engineering (CDE) | ResMap 178 | Resistivity Mapping System | Up to 200 mm | 01.06.2012 | 1 | as is where is | immediately |
106647 | CYBER OPTICS | CYBERSCAN C212/110 | Laser Measure | 200 mm | 1 | as is where is | ||
110675 | Dektak | 3ST | Stylus Profileometer | 150 mm | 1 | as is all rebuilt | immediately | |
108201 | DNS | INSPECTION SCOPE | Inspection Scope | 1 | as is where is | |||
106200 | EDAX | Eagle 2 | Micro-probe EDX analyser | Laboratory | 01.06.2000 | 1 | as is where is | immediately |
108026 | FEI | CLM 3D | Fully Automated Dual Beam FIB-SEM | 300 mm | 01.04.2012 | 1 | as is where is | immediately |
108932 | FEI | ExSolve CLM Next Gen | High Accuracy FIB SEM | 300 mm | 01.06.2016 | 2 | as is where is | immediately |
110678 | FEI | Helios 1200+ | Dual beam FIB SEM | 300 mm | 01.06.2011 | 1 | as is where is | immediately |
108710 | Fogale | DeepProbe 300M | Low Coherence IR wafer interferometry | 200 mm and 300 mm | 01.06.2014 | 1 | inquire | |
108817 | FOUR DIMENSIONS | CV92A | Semi Auomatic Mercury Probe CV Plotter | up to 200 mm | 01.06.1998 | 1 | inquire | immediately |
110723 | Four Dimensions | CVMAP 3092-A | Wafer CV mapper | 100-200 MM | 01.06.2005 | 1 | as is where is | immediately |
93084 | FSM | SYMPHONYMC | Life Time | 300 MM | 1 | as is where is | ||
96543 | Gaertner | L115C-8 | Ellipsometer, cassette to cassette | 100-200 mm | 28.02.1995 | 1 | as is where is | immediately |
108751 | GCA TROPEL | 9000 | Wafer Flatness Analyzer | 1 | as is where is | |||
71907 | Hamamatsu | C7103 | PC Controlled IC Back-side Lapping and Wafer Grinding System | 200 mm and packages | 30.09.2001 | 1 | as is where is | immediately |
52166 | Hitachi | 545-5515 | DC power supply module for CD SEM | spares | 1 | as is where is | immediately | |
52167 | Hitachi | 6280H | Power Supply Module 4channels | spares | 1 | as is where is | immediately | |
52168 | Hitachi | 545-5540 | Power Supply unit for CD SEM | Spares | 1 | as is where is | immediately | |
52312 | Hitachi | 545-5522 | VG board for CD SEM | spares | 31.05.1994 | 1 | as is where is | immediately |
52339 | Hitachi | 545-5521 | EVAC PCB FOR HITACHI CD-SEM | spares | 31.05.1994 | 1 | as is where is | immediately |
52340 | Hitachi | 545-5537 | IP-PC2 for cd-sem | spares | 31.05.1994 | 1 | as is where is | immediately |
52343 | Hitachi | 377-7592 | Power Supply Module for CD SEM | spares | 31.05.1994 | 1 | as is where is | immediately |
53054 | HITACHI | 6280H (SPARES) | SORD Computer for cd sem system | spares | 1 | as is where is | immediately | |
60939 | HITACHI | S4160 | Scanning electron microscope | 31.05.1996 | 1 | as is where is | ||
74794 | Hitachi | S5200 | FE SEM with EDX | Inspection | 31.05.2005 | 1 | as is where is | immediately |
83849 | Hitachi | S4500 Type I | FE SEM | Laboratory | 01.05.1995 | 1 | inquire | immediately |
91397 | HITACHI | IS2700SE | Dark Field inspection | 1 | as is where is | |||
91403 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | ||
91404 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | ||
91405 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | ||
91407 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | ||
91408 | HITACHI | S-5000 | FE SEM | 150 mm,200 mm | 1 | as is where is | ||
91417 | HITACHI | LS-6800 | wafer surface inspection | 300 mm | 31.08.2007 | 1 | as is where is | immediately |
91418 | HITACHI | UA-7200 | Stripper/Asher | 31.05.2001 | 1 | as is where is | ||
98269 | HITACHI | RS 4000 | Defect Review SEM | 300 mm | 01.05.2003 | 1 | as is where is | immediately |
98270 | HITACHI | RS 4000 | Defect Review SEM | 300 mm | 01.05.2003 | 1 | as is where is | immediately |
103525 | HITACHI | S4700-l | Scanning Electron Microscope | Laboratory | 31.05.2004 | 1 | as is where is | immediately |
103526 | HITACHI | S4700-ll | FE Sem with Horriba EMAX EDX | Laboratory | 31.05.2001 | 1 | as is where is | immediately |
103527 | HITACHI | S4700-ll | FE Sem with Horriba EMAX EDX (Destocking Status) | Laboratory | 31.05.2003 | 1 | as is where is | immediately |
106160 | HITACHI | RS6000 (Enhanced) | Defect Review SEM | 300 mm | 01.06.2013 | 1 | as is where is | immediately |
106662 | HITACHI | FB2100 | FIB | 200 mm | 01.06.2003 | 1 | as is where is | |
106663 | HITACHI | IS3000SE | WAFER PARTICLE INSPECTION | 300 mm | 01.06.2006 | 1 | as is where is | |
106664 | HITACHI | IS3200SE | WAFER PARTICLE INSPECTION | 300 mm | 01.06.2010 | 1 | as is where is | |
106665 | HITACHI | LS9000 | Wafer Surface Inspection | 300 mm | 01.06.2010 | 1 | as is where is | |
106666 | HITACHI | LS-6800 | Wafer Surface Inspection | 300 mm | 01.06.2007 | 1 | as is where is | |
108027 | HITACHI | N-6000 | NANO PROBER | Laboratory | 01.09.2007 | 1 | as is where is | |
108072 | Hitachi | S-6280H | CD SEM | 1 | as is where is | |||
108159 | HITACHI | S4700II | FE SEM with EDAX (Detecting Unit) | 1 | as is where is | |||
108160 | HITACHI | CV4000 | High Voltage SEM | 300 mm | 01.06.2014 | 1 | as is where is | |
108413 | Hitachi | CG4000 | SEM | 300 mm | 3 | as is where is | ||
108568 | HITACHI | LS9000 | Wafer Surface Inspection System | 300mm | 01.06.2010 | 1 | as is where is | immediately |
108752 | HITACHI | S7000 | CD SEM | 150 mm | 01.05.1989 | 1 | as is where is | immediately |
108896 | Hitachi | RS4000 | Defect Review SEM | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
108902 | Hitachi | RS4000 | Defect Review SEM | 300 mm | 01.05.2007 | 1 | as is where is | immediately |
109183 | Hitachi | CG4000 | SEM - Critical Dimension (CD) Measurement | 300mm | 1 | as is where is | ||
109287 | Hitachi | SU 8010 | Ultra High Resolution Field Emission Scanning Electron Microscope | 100 mm | 01.06.2007 | 1 | as is where is | immediately |
109555 | Hitachi | IS3000 | DARK FIELD INSPECTION | 300 mm | 01.05.2007 | 1 | as is where is | |
109556 | Hitachi | HD2300 | STEM (Scanning Transmission Electron Microscope) | Laboratory | 01.06.2006 | 1 | as is where is | immediately |
109561 | Hitachi | S5500 | HIGH RESOLUTION INSPECTION SEM | Laboratory | 01.06.2014 | 1 | as is where is | immediately |
109568 | Hitachi | CG-4100 | Critical Dimension (CD) Measurement SEM | 300 mm | 01.06.2012 | 1 | as is where is | immediately |
109569 | Hitachi | CG-4000 | Critical Dimension (CD) Measurement SEM | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
110781 | Hitachi | S-7840 | High Resolution Imaging and CD-SEM | 150 mm to 200 mm | 01.09.2000 | 1 | inquire | immediately |
109114 | HMI | EScan 400XP | E-Beam wafer inspection system | 300 mm | 01.06.2010 | 2 | as is where is | immediately |
109115 | HMI | EScan EP3 | E-Beam wafer inspection system | 300 mm | 01.06.2010 | 2 | as is where is | immediately |
109179 | HMI | eP3 XP | E-beam Inspection | 300mm | 1 | as is where is | ||
109180 | HMI | eScan 300 | E-beam Inspection | 300mm | 1 | as is where is | ||
109181 | HMI | eScan 320 | E-beam Inspection | 300mm | 1 | as is where is | ||
109182 | HMI | eScan 320 | E-beam Inspection | 300mm | 1 | as is where is | ||
108161 | HP | 4145B | CV Measurement | 1 | as is where is | |||
106667 | HSEB | AXIOSPECT 300 | MICROSCOPE INSPECTION STATION | 300 mm | 1 | as is where is | ||
102559 | HSEB Zeiss | Axiotron 300 | AOI microscope with 2 units of Brooks load port | 300 mm | 1 | as is where is | immediately | |
108819 | HYPERVISION | Visionary 2 | Emmission Microscope with Karl Suss PM-8 Analytical Prober | 1 | inquire | |||
106504 | Irvine Optical | Auto Wafer Loader Microscope Inspection | WAFER INSPECTION MICROSCOPE WITH AUTOLOADER | 200 mm | 01.06.1990 | 1 | as is where is | immediately |
91419 | J.A Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 mm | 1 | as is where is | ||
91420 | J.A Woollam | VUV-VASE VU302 (Gen I) | Ellipsometer | 200 mm | 31.05.2001 | 1 | as is where is | |
91422 | JEOL | JSM-5600 | FE SEM | 31.05.1999 | 1 | as is where is | ||
91424 | JEOL | JSM-6700F | FE SEM | 1 | as is where is | |||
106668 | JEOL | JWS-7500E | SCANNING ELECTRON MICROSCOPE | 200 mm | 1 | as is where is | ||
108164 | JEOL | JSM-6340F | FE Sem | 1 | as is where is | |||
108323 | JEOL | JFS-9855S | Focused Ion Beam System | 200mm | 01.05.2000 | 1 | as is where is | immediately |
108324 | JEOL | JWS-7555 | SEM - Defect Review (DR) | 200mm | 1 | as is where is | immediately | |
108822 | JEOL | JSM-6600F | Scanning Electron Microscope | 1 | inquire | |||
108907 | JEOL | JEM3200FS | High Resolution TEM | Laboratory | 01.05.2006 | 1 | as is where is | immediately |
109185 | JEOL | JEM-2010F | TEM | Laboratory | 1 | as is where is | ||
109186 | JEOL | JFS-9815 | Focused Ion Beam System | 200mm | 1 | as is where is | ||
109187 | JEOL | JSM-6400F | FE SEM | Laboratory | 1 | as is where is | ||
109558 | JEOL | JSM-7500F | SEM | Laboratory | 01.05.2009 | 1 | as is where is | immediately |
110627 | JEOL | JSM-6460LV | Scanning Electron Microscope | Laboratory | 1 | as is where is | ||
91427 | Jordan Valley | JVX 6200 | X-ray metrology (X-Ray Reflectivity) | 300 mm | 1 | as is where is | ||
99830 | JORDAN VALLEY | JVX6200I | X-ray Metrology System | 300 mm | 28.02.2011 | 1 | as is where is | immediately |
100917 | Jordan Valley | JVX6200 | X-Ray Inspection System | 300 mm | 31.05.2010 | 1 | as is where is | |
108415 | Jordan Valley Semiconductors LTD | JVX 7200 | X-ray Fluorescence Spectrometer | 300 mm | 1 | as is where is | ||
106865 | KLA | 2830 (PARTS) | EFEM ONLY with Yaskawa XURCM9206 robot | 300 mm | 01.02.2010 | 1 | as is where is | immediately |
106968 | KLA | SP2 (spare parts) | Complete set of calibration standard wafers for a KLA SP2 | 200 mm | 01.11.2022 | 1 | inquire | immediately |
108009 | KLA | UV1250SE | Wafer Film measurement / Ellipsometer | 200 mm | 01.10.1996 | 1 | as is where is | immediately |
108421 | KLA | eDR-5210 | SEM - Defect Review (DR) | 300 mm | 4 | as is where is | ||
108424 | KLA | eS805 | E-beam Inspection | 300 mm | 1 | as is where is | ||
108426 | KLA | SM-300/SpectraMap | Film Thickness Measurement System | 1 | as is where is | |||
108428 | KLA | Surfscan 7700 | Particle Measurement | 200 MM | 1 | as is where is | ||
108430 | KLA | TP300 | Implant Dosing Measurement | 200 MM | 1 | as is where is | ||
108431 | KLA | VisEdge CV300R | Edge Defect | 300 mm | 1 | as is where is | ||
108569 | KLA | 2131 | Inspection System | 200 mm | 01.05.1995 | 1 | as is where is | immediately |
108775 | KLA | AlphaStep 300 | Profilometer | 1 | inquire | |||
109106 | KLA | Surfscan AIT 3 | Wafer particle Inspection | 200 mm | 01.06.2005 | 1 | as is where is | immediately |
109537 | KLA | 2351 | Brightfield Wafer Defect Inspection System | 200 mm | 01.06.2002 | 1 | as is where is | immediately |
109562 | KLA | 2367 | Brightfield wafer defect inspection system | 200 mm | 01.09.2006 | 1 | as is where is | immediately |
110659 | KLA | UV1250SE | Thin film meansurement system | 125 mm - 200 mm | 01.08.1998 | 1 | as is where is | immediately |
110660 | KLA | 7700 | Surfscan wafer particle detection system | 100 - 200 mm | 1 | as is where is | immediately | |
110668 | KLA | UV1280SE | Thin Film Thickness Measurement System / Ellipsometer | Up to 200 mm | 01.01.2000 | 1 | as is where is | immediately |
110679 | KLA | Surfscan 6400 | Unpatterned wafer surface particle inspection system | 100-200 MM | 01.06.1994 | 1 | inquire | immediately |
110686 | KLA | eDR-5200 | Defect Review Sem | 300 mm | 01.06.2009 | 2 | as is where is | immediately |
110751 | KLA | OP 2600 | THIN FILM MEASUREMENT | 200 mm | 1 | as is where is | immediately | |
110786 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm | 1 | inquire | immediately | |
110787 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm / 300 mm | 1 | inquire | immediately | |
110788 | KLA | SP1-TBI | Wafer Particle Detection System (Surfscan) | 200 mm | 1 | inquire | immediately | |
111346 | KLA | Quantox XP | Electrical Measurement | 300 mm | 01.10.2006 | 1 | as is where is | immediately |
111348 | KLA | P16 Plus | Profileometer | 200 mm | 01.06.2005 | 1 | as is where is | immediately |
32230 | KLA TENCOR | SFS6400 MECHANICAL CALIBRATION Document Number 238 | WAFERSURFACE ANALYSIS SYSTEM CUSTOMER MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | |
32231 | KLA TENCOR | Surfscan 64X0 Calibration Procedure | Surfscan 64X0 Calibration Procedure | MANUAL | 1 | as is where is | immediately | |
32232 | KLA TENCOR | surfscan 64XX optical alignments Document Number 236 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | |
32233 | KLA TENCOR | SFS6x00 MECHANICAL CALIBRATION Document number 200 | WAFER SURFACE ANALYSIS SYSTEM MAINTENANCE REFERENCE | MANUAL | 1 | as is where is | immediately | |
106481 | KLA Tencor | AIT I | Patterned Surface Inspection System | 150 mm/200 mm | 01.06.1995 | 1 | as is where is | immediately |
106574 | KLA TENCOR | SEM-3800C | Scanning Electron Microscope | N/A | 1 | as is where is | ||
106674 | KLA TENCOR | Viper 2430 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
106675 | KLA TENCOR | Viper 2435 | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | |
106676 | KLA TENCOR | Viper 2435XP | Macro Defect Inspection | 300 mm | 01.06.2004 | 1 | as is where is | |
106679 | KLA TENCOR | 2132 (mainbody only) | Wafer Inspection System | 150 mm,200 mm | 01.06.1995 | 1 | as is where is | |
106681 | KLA TENCOR | P-2 | Profileometer | 150 mm,200 mm | 01.06.1996 | 1 | as is where is | |
108075 | KLA Tencor | 2131 | Wafer Defect Inspection | 150 mm | 1 | as is where is | ||
108165 | KLA TENCOR | Surfscan 7200 | Surfscan wafer particle detection | 150 mm,200 mm | 01.06.1991 | 1 | as is where is | |
108166 | KLA TENCOR | Surfscan 7200 | Surfscan wafer particle detection | 150 mm,200 mm | 01.06.1990 | 1 | as is where is | |
1691 | KLA-TENCOR | 259 (spare parts) | Reticle Inspection - SPARE PARTS | up to 7 inch | 01.12.1991 | 1 | inquire | immediately |
52151 | KLA-Tencor | Hamamatsu R1924A | Photomultiplier | spares | 01.03.2007 | 1 | as is where is | immediately |
53035 | KLA-Tencor | 2132 (8 inch Wafer Chuck Assembly) | Ceramic Wafer chuck, 8" | spares | 1 | as is where is | immediately | |
53036 | KLA-Tencor | Compumotor M575L11 | Stepping motor drive | spares | 1 | as is where is | immediately | |
71632 | KLA-TENCOR | 2122 | Brightfield Wafer Defect Inspection System | 200 mm | 01.04.1996 | 1 | as is where is | immediately |
91435 | KLA-Tencor | AIT | Particle Review | 200 mm | 31.05.1997 | 1 | as is where is | |
91464 | KLA-Tencor | PROMETRIX FT750 | Film Thickness Measurement | 200 mm | 1 | as is where is | immediately | |
91466 | KLA-Tencor | PROMETRIX FT750 | Film Thickness Measurement | 1 | as is where is | |||
96998 | KLA-Tencor | Surfscan AIT | Patterned Wafer Inspection | 200 mm | 01.05.1997 | 1 | as is where is | immediately |
108716 | KLA-Tencor | Surfscan 4500 | Unpatterned Wafer Surface Inspection | 2 inch to 6 inch | 01.11.1989 | 1 | as is where is | immediately |
108760 | KLA-Tencor | Surfscan 4500 | Wafer Particle Inspection System | 2 to 6 inch | 01.05.1986 | 1 | as is where is | immediately |
109107 | KLA-Tencor | PROMETRIX FT-650 | WAFER FILM THICKNESS MEASUREMENT SYSTEM | 01.06.1991 | 1 | as is where is | immediately | |
109191 | KLA-Tencor | 2820 | Wafer Inspection Equipment | 300mm | 1 | as is where is | ||
109192 | KLA-Tencor | 2820 | Wafer Inspection Equipment | 300mm | 1 | as is where is | ||
109193 | KLA-Tencor | 2830 | Brightfield Inspection | 300mm | 1 | as is where is | ||
109194 | KLA-Tencor | AIT UV | Darkfield Inspection | 300mm | 1 | as is where is | ||
109195 | KLA-Tencor | ASET-F5x | Film Thickness Measurement System | 300mm | 1 | as is where is | ||
109196 | KLA-Tencor | Puma 9130 | Darkfield Inspection | 300mm | 1 | as is where is | ||
109197 | KLA-Tencor | Puma 9130 | Darkfield Inspection | 300mm | 1 | as is where is | ||
109198 | KLA-Tencor | Surfscan SP2 | Wafer Particle Measurement System | 300 mm | 01.12.2010 | 1 | as is where is | immediately |
109598 | KLA-Tencor | Surfscan 5500 | Wafer Particle Detection | 200 mm | 1 | inquire | ||
109613 | KLA-Tencor | AIT | Surfscan wafer particle detection system | 150 mm | 1 | inquire | ||
110725 | KLA-Tencor | ARCHER 5 | Optical Overlay measurement system | 150-200 mm | 01.06.2001 | 1 | as is where is | immediately |
110726 | KLA-Tencor | OmniMap AutoRS75TC | Wafer Resistivity Measurement | 150-200 mm | 01.06.1996 | 1 | as is where is | immediately |
110727 | KLA-Tencor | UV1080 | Thin film measurement system | 150-200 mm | 01.06.2000 | 1 | as is where is | immediately |
108837 | KOKUSAI | VR70 | Resistivity Test Tool | 1 | inquire | |||
94475 | LASERTEC | BGM300 | Wafer Surface Analyzing and VIsualization System | 200 mm | 31.05.2008 | 1 | as is where is | |
106702 | LASERTEC | BGM300 | Wafer Inspection System | 300 mm | 1 | as is where is | ||
106485 | Leica | LEICA INM20 | Microscope inspection station | 200 mm | 01.06.1995 | 1 | as is where is | immediately |
108171 | LEICA | INM100 | Microscope | 1 | as is where is | |||
108172 | LEICA | INM100 | Microscope | 1 | as is where is | |||
108173 | LEICA | INM100 | Microscope | 1 | as is where is | |||
108174 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108175 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108176 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108177 | LEICA | KENSINGTON 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108178 | LEICA | Polyvar SC | POLYVAR SCOPE | 1 | as is where is | |||
108179 | LEICA | Reichert POLYVAR SC | Wafer Inspection Microscope | 200 mm/300 mm | 01.06.2002 | 1 | as is where is | |
108180 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108181 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108182 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
108183 | LEICA | Reichert-Jung, Kensington 300901 | Wafer Inspection Microscope | 1 | as is where is | |||
109211 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | ||
109212 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | ||
109213 | Leica | INS3300 | Macro-Defect | 300mm | 1 | as is where is | ||
108464 | Metryx | Mentor DF3 | Mass Measurement | 300 mm | 1 | as is where is | ||
108465 | Metryx | Mentor OC23 | Mass Measurement | 200-300 mm | 1 | as is where is | immediately | |
109214 | Metryx | Mentor OC23 | Mass Measurement | 200mm | 1 | as is where is | ||
108848 | MINATO | MM-6600 | Wafer Mobility Tester with MECS UX-1000 Wafer Robot, 2ea Available | 1 | inquire | |||
108029 | MSP CORP. | 2300XP1 | Particle Depositioning | 300 mm | 1 | as is where is | ||
106703 | N&K | ANALYZER 5700-CDRT | Wafer Inspection System | 1 | as is where is | |||
106704 | n&k Technology | 6700-CDRT | Wafer Inspection System | 1 | as is where is | |||
106705 | NANO OPTICS | HAZE 2 | Nano Optics Haze 2 | 200 mm | 1 | as is where is | ||
91526 | NANOMETRICS | Caliper Mosaic | Overlay | 300 mm | 31.05.2003 | 1 | as is where is | immediately |
91529 | NANOMETRICS | Caliper Mosaic | Overlay | 300 mm | 28.02.2010 | 1 | as is where is | immediately |
91530 | NANOMETRICS | NANOMETRICS 9-7200-0195E | Mask & Wafer Inspection | 200 mm | 1 | as is where is | ||
98289 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 31.05.2005 | 1 | as is where is | |
98290 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 31.05.2005 | 1 | as is where is | |
98291 | NANOMETRICS | CALIPER ULTRA | Mask & Wafer Inspection | 300 mm | 30.06.2006 | 1 | as is where is | immediately |
98480 | Nanometrics | 8000X | film thickness measurement | 150mm | 2 | as is where is | immediately | |
98481 | Nanometrics | 8000Xse | film thickness measurement | 200mm | 2 | as is where is | ||
101585 | NANOMETRICS | CALIPER-ULTRA | Overlay Measurement | 300 mm | 30.06.2006 | 1 | as is where is | |
103544 | NANOMETRICS | CALIPER ELAN | Overlay | 300 mm | 31.05.2004 | 1 | as is where is | |
106179 | Nanometrics | 9000 | Nanospec Wafer Metrology film thickness measurement tool | 200 mm | 01.06.2005 | 1 | as is all rebuilt | immediately |
106706 | NANOMETRICS | CALIPER_ULTRA | Mask & Wafer Inspection | 300 mm | 01.06.2006 | 1 | as is where is | |
106823 | Nanometrics | Nanospec 9100 | Ox film thickness measurement (PC missing) | 200mm | 1 | as is where is | immediately | |
107027 | NANOMETRICS | Caliper Mosaic | Overlay measurement System | 300 mm | 01.08.2010 | 1 | inquire | immediately |
108186 | NANOMETRICS | CALIPER_MOSAIC | Overlay | 300 mm | 01.06.2001 | 1 | as is where is | |
108467 | Nanometrics | Tevet Trajectory T3 | Film Thickness Measurement System | 300 mm | 1 | as is where is | ||
109113 | Nanometrics | LynX 9010T | Optical CD Measurement (Scatterometry) system | 300 mm | 01.09.2008 | 1 | as is where is | immediately |
93103 | NGR | NGR2150 | E-beam wafer inspection | 300 MM | 1 | as is where is | ||
108853 | NICOLET | Avatar 370 DTGS | FT-IR Spectrometer | 1 | inquire | |||
108189 | NIDEC | Im15 | Wafer inspection | 1 | as is where is | |||
108190 | NIDEC | Im800 | Wafer inspection | 1 | as is where is | |||
99396 | Nikon | EpiPhot 200 | Inspection Microscope | 200 mm | 1 | as is where is | immediately | |
106503 | Nikon | Auto Wafer Loader for Microscope Inspection | WAFER INSPECTION MICROSCOPE | 150 mm/200 mm | 1 | as is where is | immediately | |
106707 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | ||
106708 | NIKON | AMI-3300 | Wafer Inspection System | 300 mm | 1 | as is where is | ||
106709 | NIKON | AMI-3500 | Wafer Inspection System | 300 mm | 1 | as is where is | ||
108092 | Nikon | OPTIPHOT-200 | Wafer inspection microscope | 200 mm | 3 | as is where is | ||
108093 | Nikon | OPTIPHOT-300 | Wafer inspection microscope | 300 mm | 1 | as is where is | ||
108094 | Nikon | OPTIPHOT-88-AC IN | Wafer inspection microscope | 200 mm | 1 | as is where is | ||
108643 | Nikon | Eclipse L200 | Wafer Inspection Microscope | 150 mm/200 mm | 01.06.2006 | 1 | as is where is | immediately |
108772 | Nikon | Optistation 3 | Wafer Inspection System | 150 mm | 01.05.1994 | 1 | as is where is | immediately |
108784 | Nikon | Optistation 3A | Automatic Wafer Inspection Station | 200 mm | 01.05.1997 | 1 | as is where is | immediately |
108785 | NIKON | Optiphot 200 (For spares use) | Wafer Inspection Microscope (Parts Tool Only) | 200 mm | 1 | as is where is | immediately | |
108789 | Nikon | Optiphot 200 | Wafer Inspection Microscope | 200 mm | 1 | as is all rebuilt | immediately | |
108790 | NIKON | Optiphot 88 | Wafer Inspection Microscope | 200 mm | 1 | as is where is | immediately | |
108854 | NIKON | NWL-860 | Automatic Microscope Wafer Loader for up to 200mm Wafers | 1 | inquire | |||
108855 | NIKON | Optiphot 200 | Wafer Inspection Microscope, B/Dfield & DIC Microscopy, Motorized Turret with 5ea Objectives, Prior ProScan Programmable Stage, 200mm X 200mm XY Travel, Color CCD Camera & More | 1 | inquire | |||
110610 | NIKON | OptiStation 3 | Wafer Inspection Microscope | 200 mm | 1 | as is where is | immediately | |
110618 | NIKON | Optistation 3 | Wafer Inspection Microscope | 01.07.1994 | 1 | as is where is | immediately | |
110695 | Nikon | NWL 860 TMB | Wafer Inspection Microscope with wafer autoloader | 150 mm, 200 mm | 1 | as is where is | immediately | |
110791 | Nikon | OptiStation 3200 | Fully Automated Wafer Inspection Microscope | 300 mm | 1 | as is where is | immediately | |
108033 | NOVA | NOVASCAN 3090 P/N 390-10000-11 | CMP metrology system | 300 mm | 1 | as is where is | immediately | |
108967 | NOVA | T600 MMSR | Ellipsometer for CD and thin film measurements | 300 mm | 01.01.2018 | 1 | as is where is | immediately |
109216 | Nova | NovaScan 3090 Next SA | Optical CD Measurement | 300mm | 1 | as is where is | ||
109217 | Nova | NovaScan 3090 Next SA | Optical CD Measurement | 300mm | 1 | as is where is | ||
109218 | Nova | NovaScan 3090 Next SA | Optical CD Measurement | 300mm | 1 | as is where is | ||
109219 | Nova | NovaScan 3090 Next SA | Optical CD Measurement | 300mm | 1 | as is where is | ||
109220 | Nova | V2600 | Integrated CMP Endpoint / Film Measurement | 300mm | 1 | as is where is | ||
109283 | NOVA MEASURING | Novascan | Novascan CMP Endpoint measurement unit | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
109284 | NOVA MEASURING | Novascan | Novascan CMP Endpoint measurement unit | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
106825 | Olympus | AL110-LMB6 with MX51 | wafer loader with Microscope | 150mm | 1 | as is where is | immediately | |
108786 | OLYMPUS | BH-BHM | Wafer Inspection Microscope | 150 mm | 1 | as is where is | immediately | |
108857 | OLYMPUS | AL100-L8 | Wafer Loader, 200mm, Parts Tool | 200 MM | 1 | inquire | ||
109035 | Olympus | AL110N-LMB6 | Wafer Inspection Microscope with autoloader | 100 MM AND 150 mm | 1 | as is where is | immediately | |
109058 | Olympus | AL110N-LMB6 | Microscope autoloader only (Not including the microscope) | 100 MM AND 150 mm | 1 | as is where is | immediately | |
110696 | Olympus | AL100-L6 | Wafer autoloader | 100MM TO 150 MM | 1 | as is where is | immediately | |
110697 | Olympus | AL100-LB6 | Wafer autoloader | 100MM TO 150 MM | 2 | as is where is | immediately | |
103547 | ONTO | WV320 | MACRO INSPECTING | 300 mm | 31.05.2004 | 1 | as is where is | |
109229 | ONTO | AutoEL III | Ellipsometer | 200mm | 1 | as is where is | ||
109230 | ONTO | Axi 935 | Macro-Defect | 300mm | 1 | as is where is | ||
109231 | ONTO | MetaPULSE 300 | Film Thickness Measurement System | 300mm | 1 | as is where is | ||
109232 | ONTO | MetaPULSE 300 | Film Thickness Measurement System | 300mm | 1 | as is where is | ||
109233 | ONTO | NSX 105 | Macro-Defect | 200mm | 1 | as is where is | ||
109559 | Philips | PHI 680 | Auger Nanoprobe | Laboratory | 01.05.1998 | 1 | as is where is | immediately |
110683 | Plasmos | SD2000 | Thin Film Thickness Measurement System / Ellipsometer | 200 mm | 01.06.1998 | 1 | as is where is | immediately |
31246 | PMS | Liquitrack 776200 | Non volatile residual Monitor for water-quality checking | facilities | 01.10.1999 | 1 | as is where is | immediately |
91552 | RAYTEX | RXW-800 | EDGE SCAN | 200 mm | 31.05.2008 | 1 | as is where is | |
98489 | Raytex | RXW-0826SFIX-SMIF | edge scanner | 200mm | 1 | as is where is | ||
108479 | Raytex | RXW-1227 EdgeScan | Edge Defect | 1 | as is where is | |||
108329 | ReVera | RVX1000 | Film Thickness Measurement System | 300 mm | 1 | as is where is | immediately | |
108480 | ReVera | RVX1000 | Film Thickness Measurement System | 1 | as is where is | |||
91557 | RIGAKU | XRF3640 (Handle include) | Wafer/ Disk Analyzer | 200 mm | 01.05.1995 | 1 | as is where is | |
108194 | RIGAKU | 3640 | WAFER/DISK Analyzer | 200 mm | 01.06.2000 | 1 | as is where is | immediately |
108865 | RIGAKU | V300 | Total Reflection Xray Fluoroescence Spectrometer | 1 | inquire | |||
91559 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2005 | 1 | as is where is | |
91560 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2005 | 1 | as is where is | |
91561 | RUDOLPH | AXI_S | Macro Inspection System | 300 mm | 31.05.2006 | 1 | as is where is | |
91563 | RUDOLPH | Meta Pulse | Film Metrology | 200 mm | 31.05.2005 | 1 | as is where is | |
91566 | Rudolph | WS3840 | 3D Bump Metrology | 300 mm | 31.05.2010 | 1 | as is where is | immediately |
91567 | RUDOLPH | META PULSE 200 | Surface Film Metrology | 200 mm | 31.05.2002 | 1 | as is where is | immediately |
94478 | RUDOLPH | FE-3 | Focus Ellipsometer | 200 mm | 1 | as is where is | ||
94479 | RUDOLPH | FE-4D | Focus Ellipsometer | 200 mm | 1 | as is where is | ||
98296 | RUDOLPH | Meta Pulse 300 | Film thickness measurement | 300 mm | 1 | as is where is | ||
98297 | RUDOLPH | Meta Pulse 300 | Film thickness measurement | 300 mm | 1 | as is where is | ||
98298 | RUDOLPH | MP1-300 | Film thickness measurement | 300 mm | 31.05.2007 | 1 | as is where is | |
98835 | RUDOLPH | AXI-S | Macro Wafer Inspection | 300 mm | 01.06.2004 | 1 | as is where is | immediately |
98837 | RUDOLPH | MP1-300XCU | Film Thickness Measurement System | 300 mm | 30.04.2008 | 1 | as is where is | immediately |
100928 | RUDOLPH | AXI-S | Macro Inspection System | 300 mm | 31.05.2003 | 1 | as is where is | |
100929 | RUDOLPH | FE-7 | Ellipsometer | 200 mm | 31.05.1996 | 1 | as is where is | |
100930 | RUDOLPH | MP300 | Film thickness measurement | 200 mm | 31.05.2007 | 1 | as is where is | |
100931 | RUDOLPH | MP300 | Film thickness measurement | 200 mm | 31.05.2009 | 1 | as is where is | |
100932 | RUDOLPH | S3000A | Focused Beam Ellipsometer | 200 mm | 31.05.2012 | 1 | as is where is | |
103553 | RUDOLPH | AXI-S | Macro Inspection | 300 mm | 31.05.2004 | 1 | as is where is | |
103554 | RUDOLPH | AXI935D | AVI | 300 mm | 1 | as is where is | ||
103555 | RUDOLPH | MP3 300XCU | FLIM THICKNESS MEASUREMENT SYSTEM | 300 mm | 1 | as is where is | immediately | |
106420 | Rudolph | NSX 115 | Automated Defect Inspection | 200 mm | 1 | as is where is | immediately | |
106421 | Rudolph | NSX 95 | Automated Macro Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | |
106422 | Rudolph | NSX-105 | Automated Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | |
106424 | Rudolph | NSX-95 | Automated Macro Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | |
106425 | Rudolph | NSX-95 | Manual Macro Wafer Defect Inspection | 150 mm/200 mm | 1 | as is where is | immediately | |
106715 | RUDOLPH | MP3_300A | METAL THICKNESS MEASUREMENT | 300 mm | 01.06.2012 | 1 | as is where is | |
106716 | RUDOLPH | MP-300 | Film thickness measurement | 300 mm | 01.06.2005 | 1 | as is where is | |
106717 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 01.06.2003 | 1 | as is where is | |
106718 | RUDOLPH | MP1-300 | Film Thickness Measurement | 300 mm | 1 | as is where is | ||
106719 | RUDOLPH | MP1-300XCU | Film thickness measurement system | 300 mm | 01.06.2008 | 1 | as is where is | |
106720 | RUDOLPH | NSX 105 | MACRO DEFECT INSPECTION SYSTEM | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
106721 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2010 | 1 | as is where is | |
106722 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | |
106723 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | ||
106724 | RUDOLPH | S3000A | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2011 | 1 | as is where is | |
106725 | RUDOLPH | S3000S | FBE(focused beam laser ellipsometry) | 300 mm | 01.06.2010 | 1 | as is where is | |
106726 | RUDOLPH | S3000S | FBE(focused beam laser ellipsometry) | 300 mm | 1 | as is where is | ||
106727 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2003 | 1 | as is where is | |
106728 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2003 | 1 | as is where is | |
106729 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2006 | 1 | as is where is | |
106730 | RUDOLPH | WS2500 | Wafer Inspection System | 200 mm | 01.06.2002 | 1 | as is where is | |
106731 | RUDOLPH | WV320 | Macro Inspection | 300 mm | 01.06.2006 | 1 | as is where is | |
106732 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.2003 | 1 | as is where is | |
106733 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | |
106734 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | ||
106735 | RUDOLPH | WV320 | Macro Defect Inspection System | 300 mm | 1 | as is where is | ||
106831 | Rudolph | MP200XCU | Cu Film thickness measurement | 200mm | 1 | inquire | ||
106832 | Rudolph | MP300 | Metal Film thickness measurement | 300mm | 1 | inquire | ||
106833 | Rudolph | MP300 XCu | Cu Film thickness measurement | 300mm | 2 | inquire | ||
106871 | RUDOLPH | NSX 105 | Automated Wafer, Die and Bump Inspection System | 300 mm | 01.06.2008 | 1 | as is where is | immediately |
108034 | RUDOLPH | AXI-S930B | Macro Defect Inspection | 300 mm | 01.01.2007 | 1 | as is where is | |
108195 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.1999 | 1 | as is where is | |
108196 | RUDOLPH | META PULSE 200 | Film thickness measurement | 200 mm | 01.06.2005 | 1 | as is where is | |
108197 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2003 | 1 | as is where is | |
108198 | RUDOLPH | META PULSE 200X CU | Film thickness measurement (Including HDD) | 200 mm | 01.06.2001 | 1 | as is where is | |
108199 | RUDOLPH | META PULSE II 200X CU | Film thickness measurement | 200 mm | 01.06.2008 | 1 | as is where is | |
108200 | RUDOLPH | MP200 | Film thickness measurement | 200 mm | 01.06.2002 | 1 | as is where is | |
108482 | Rudolph | Axi 935 | Macro-Defect | 1 | as is where is | |||
108483 | Rudolph | Matrix S-300 | Ellipsometer | 300 mm | 1 | as is where is | ||
108484 | Rudolph | MetaPULSE 300 | Film Thickness Measurement System | 300 mm | 3 | as is where is | ||
108485 | Rudolph | NSX 105 | Macro-Defect | 300 mm | 8 | as is where is | ||
108587 | RUDOLPH | WV320 | Wafer Inspection System | 300mm | 1 | as is where is | immediately | |
108711 | Rudolph | Sonus 7800 | Acoustic Metrology and Defect Detection System | 300 MM | 01.06.2015 | 1 | inquire | |
109550 | Rudolph | AXI-S | Macro Defect Inspection System | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
109570 | Rudolph | WaferView 320 | Macro Wafer Defect Inspection System | 300 mm | 1 | as is where is | immediately | |
110735 | Rudolph | MetaPulse 200 | Metal film measurement system | 150-200 mm | 01.06.2006 | 1 | as is where is | immediately |
110736 | Rudolph | MetaPulse 200XCu | Metal film measurement system | 150-200 mm | 01.06.2006 | 1 | as is where is | immediately |
110759 | Rudolph | S300 Ultra II | METROLOGY | 300 mm | 1 | as is where is | immediately | |
110795 | Rudolph | S300D Ultra II | Thin Film Measurement Tool / Ellipsometer | 300 mm | 01.05.2005 | 1 | as is where is | immediately |
106661 | SDI | FAAST 230-DP+SPV+SLIC | CARRIER LIFETIME MEASUREMENT | 200 mm | 1 | as is where is | ||
108035 | SEMILAB | PMR_3000 | Dose Monitoring | 300 mm | 1 | as is where is | ||
109074 | Sensofar | PLu Neox Optical 3D Surface Profiler with motorized XY stage, 4 Lens (10X, 20X, 50X, 100X), anti vibration table | Optical 3D Surface Profiler | 01.06.2012 | 1 | as is where is | ||
108696 | SENTECH | Senduro 300 | Thin Film measurement | Up to 300 MM | 01.06.2008 | 1 | inquire | |
106742 | SSM | Fastgate 5200 | Resistivity / CV Measurement | 200 mm | 01.06.2008 | 1 | as is where is | immediately |
108773 | SSM | 470i | CV Plotter | 1 | inquire | |||
110780 | SSM | 5130 Hg-CV | Hg-CV measurement system | up to 12 inch | 01.01.2004 | 1 | as is where is | immediately |
91569 | Thermo Fisher | ECO 1000 | FTIR System | 200 mm | 01.05.2000 | 1 | as is where is | immediately |
107011 | Veeco | Dektak 200 Si | Contact Profilometer - for spares use (Not operational condition) | 150 mm | 01.06.2000 | 1 | as is where is | immediately |
108331 | Veeco | Dimension 7000 | Atomic Force Microscope (AFM) | 200mm | 1 | as is where is | immediately | |
108893 | VEECO | AP-150 | Automtic Four Point Probe, for up to 6" Wafers | 150 MM | 1 | as is where is | 2 weeks | |
108894 | VEECO | Dektak 3030ST | Profilometer | 1 | inquire | |||
108916 | Veeco | Dimension X3D | Model 340 Atomic Force Microscope | 300 MM | 01.05.2006 | 1 | as is where is | immediately |
109116 | Veeco | Vx340 Dimension | Atomic Force Proflier | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
109600 | Veeco Dimension | 3100 | Atomic Force Microscope | 1 | inquire | |||
93087 | Woollam | VUV-VASE (Gen II) | Ellipsometer | 300 MM | 1 | as is where is | immediately | |
108216 | ZEISS | AXIOTRON | Inspection Micro Scope | 1 | as is where is | |||
108217 | ZEISS | AXIOTRON | Inspection Micro Scope | 1 | as is where is | |||
108218 | ZEISS | AXIOTRON | High Perfomance Micro Scope | 01.06.2008 | 1 | as is where is | ||
108545 | Zeiss | Axiospect 300 | Optical Review System | 300 mm | 4 | as is where is | ||
108972 | Zeiss | Axiospect | Wafer Inspection Microscope | 300 mm | 01.06.2011 | 1 | as is where is | immediately |