Please find below a list of Used Photoresist Coat and Development Equipment for sale by fabsurplus.com .Click on any listed item of Photoresist Coat and Development Equipment to see further data.
| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 103026 | Brewer Science | 100GX Spinner | LARGE SUBSTRATE PHOTORESIST SPINNER | 1 | as is where is | |||
| 103149 | CEE | 200 | Photoresist Manual Developer | 200 mm | 1 | as is where is | immediately | |
| 103150 | CEE | CB-200 | Photoresist Coater Bake System | 200 mm | 1 | inquire | ||
| 69350 | Convac | Falcon | Coater Developer | 1 | ||||
| 99395 | Convac | CBA-M-2000-U | Photoresist coater | 31.01.1995 | 1 | as is where is | immediately | |
| 34469 | DNS | EEW-622-B | PHOTORESIST WAFER EDGE EXPOSURE SYSTEM. | 200mm | 1 | as is where is | ||
| 34470 | DNS | EEW 622-8 | PHOTORESIST EDGE EXPOSURE SYSTEM | 200mm | 1 | as is where is | ||
| 91577 | DNS | SD-W80A-AVP | Developer system (1D) | 200 mm | 31.05.2003 | 1 | as is where is | |
| 91581 | DNS | SK-80BW AVPE | Photoresist Coater and Developer system (2C/2D) | 200 mm | 31.05.1995 | 1 | as is where is | 3 months |
| 91584 | DNS | SK-80BW-BVPE | Coater/ Developer (2C/3D) | 150 mm | 31.05.1998 | 1 | as is where is | |
| 91585 | DNS | SK-W80A-AVP | Color Track (2C 1D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 91587 | DNS | SKW-80A-AVPE | Track (1C2D) | 200 mm | 31.05.1993 | 1 | as is where is | |
| 93075 | DNS | SK-W80B-AVPE | IN LINE Track (2C/2D) | 200 mm | 31.05.1996 | 1 | as is where is | |
| 93076 | DNS | SK-200W-AVPF | Coater / Developer system (2C/2D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 93077 | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 200 mm | 31.05.1997 | 1 | as is where is | |
| 97998 | DNS | SK-80BW-BVQ | Track coater/developer | 200 mm | 1 | as is where is | ||
| 101795 | DNS | SC-W80A-AG | SOG Coater | 200 mm | 1 | inquire | ||
| 101796 | DNS | SC-W80A-AVQ | Polyimide coater | 200 mm | 1 | inquire | ||
| 101798 | DNS | SD-W80A-AVQ | Polyimide developer | 200 mm | 1 | inquire | ||
| 102558 | DNS | RF3S | coater and developer( 4C4D) | 300mm | 1 | inquire | ||
| 102690 | DNS | SC-W80A-AVG | Spin On Glass (SOG) Coater | 200mm | 31.05.1998 | 1 | as is where is | |
| 102691 | DNS | SC-W80A-AVG | Spin On Glass (SOG) Coater | 200mm | 31.05.1998 | 1 | as is where is | |
| 102873 | DNS | SK-80BW-AVPE | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102874 | DNS | SK-W80B-AVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102875 | DNS | SKW-80A-BVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102876 | DNS | SKW-80A-BVPE | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102954 | DNS | RF3 | Photoresist coater and developer | 300 mm | 31.05.2006 | 1 | as is where is | |
| 102955 | DNS | RF3 | Photoresist coater and developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103556 | DNS | RF3S | PHOTORESIST COATER DEVELOPER TRACK | 300 mm | 1 | as is where is | ||
| 106022 | DNS | SK 2000 BVPE | COATER AND DEVELOPER TRACK WITH 2 CT, 2 BCT, 4 DEVELOPERS | 200 mm | 30.09.2003 | 1 | as is where is | immediately |
| 106023 | DNS | SK 2000 BVPE | Photoresist coater and developer - 2 ct - 2 bct - 4 dev | 200 mm | 31.03.2004 | 1 | as is where is | immediately |
| 98340 | EVG | 101 | Photoresist coater and developer | 200 mm | 31.05.2003 | 1 | as is where is | immediately |
| 103155 | EVG | 101 | Spray Coater | 1 | inquire | |||
| 83515 | Extraction Systems | TMB 150 | Photoresist Contamination Monitor System / Total Amine Analyzer | Facilities | 31.05.2004 | 1 | as is where is | immediately |
| 99363 | Fairchild Convac | Falcon | Polyimide developer track 2D | 31.05.1996 | 1 | as is where is | ||
| 90364 | FSI | Polaris 3500 | Mini Coater and Developer Track | 300 MM / 200 mm | 30.06.2004 | 1 | as is where is | immediately |
| 101710 | FSI | Polaris 2100 | Coater/Developer | 150 mm | 31.05.2008 | 1 | inquire | immediately |
| 102215 | Fusion | M150PCU | Lithography | 150 mm | 1 | as is where is | ||
| 102216 | Fusion | M150PCU | Lithography | 125 mm | 1 | as is where is | ||
| 102217 | Fusion | M150PCU | Lithography | 150 mm | 1 | as is where is | ||
| 103157 | Imtec | Star 2001 | Image Reversal Oven | 1 | inquire | |||
| 102254 | Karl Suss | ACS200 Gen3 | Litho coat and develop | 200 mm | 31.05.2013 | 1 | as is where is | |
| 102255 | Karl Suss | Gamma | Litho coat and develop | 200 mm | 31.05.2011 | 1 | as is where is | |
| 102944 | KARL SUSS | FALCON ACS 200 | Fully Automated High Throughput Coating, Developing Cluster System | 4 INCH / 6 INCH | 31.05.2001 | 1 | as is where is | immediately |
| 103159 | Karl Suss | Delta 80 T2 | Spin Coat & Bake System | 1 | inquire | |||
| 103160 | Karl Suss | RC8 | Spin Coater System | 1 | inquire | |||
| 33542 | Liebherr | FKV 3610 | Fridge for photoresist | facilities | 1 | as is where is | immediately | |
| 54909 | Nanometrrics | 8300 | Metrologi | 200mm | 01.06.1997 | 1 | as is where is | |
| 87805 | Nikon | NSR2205i12D | I-LINE STEPPER | 200mm | 31.05.1997 | 1 | as is where is | immediately |
| 103662 | PVA | SCS-4393 | Photo Resist Spray Coater | 1 | as is where is | |||
| 77519 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 77520 | Quaid Technologies | 8900 FC | Selective Conformal Coaters | 150 | 1 | as is where is | ||
| 102572 | SEMES | EKPS-01 | Coater/Developer | 1 | inquire | |||
| 102573 | SEMES | PVC-211 | Coater/Developer | 1 | inquire | |||
| 98862 | Semix | Tazmo | SOG track | 150 mm | 1 | inquire | ||
| 94289 | Sokudo | RF-300A | Multi Block (Resist Coater/Developer) | 300 mm | 31.05.2007 | 1 | as is where is | |
| 102176 | Sokudo | DT-3000 | SOH Coater, Resist/Poly Spin coater | 300 mm | 31.05.2013 | 1 | as is where is | |
| 102177 | Sokudo | DT-3000 | Sokudo Track | 300 mm | 31.05.2015 | 1 | as is where is | |
| 102178 | Sokudo | DT-3000 | SOHCoat_LIT | 300 mm | 31.05.2015 | 1 | as is where is | |
| 73208 | Solitec | 5110C | Manually loading Photoresist Spin Coater | 3 to 9 inch | 30.09.1998 | 1 | as is where is | immediately |
| 103176 | Solitec | 5100 | Manual Spin Coater | 1 | inquire | |||
| 103177 | Solitec | FlexiFab | Coater and Developer | 150 mm | 1 | inquire | ||
| 97878 | SOUTH BAY TECHNOLOGY, INC. | IBSe DD | IBS(Ion Coating) | 1 | as is where is | |||
| 78340 | Steag | 421 | Photoresist Coater and Developer | 01.06.1995 | 1 | as is where is | immediately | |
| 95005 | SUSS | PR800 | DUV Photoresist coater and developer track | 200 mm | 31.05.1999 | 1 | as is where is | |
| 98497 | SUSS | ACS200 | Photoresist coater and developer track, 1C, 1 D | 200 mm | 1 | as is where is | immediately | |
| 98426 | Suss MicroTec | Delta 20T | Spin Coater | 150 mm | 1 | as is where is | ||
| 103014 | Suss Microtech | Gamma 60 | Coating and Developing Cluster Tool | 150 mm | 31.05.2001 | 1 | as is where is | |
| 86451 | SVG | 8800 | photoresist track | 125 mm | 1 | as is where is | immediately | |
| 98427 | SVG | 8600 | Dual Track Coat/Develop 00mm | 100 mm | 1 | as is where is | ||
| 100749 | SVG | SVG 8800 | Auto Coater | 1 | as is where is | |||
| 101353 | SVG | 8600 | Coater and Developer | 100mm | 1 | as is where is | ||
| 101355 | SVG | 8800 Coaters and Developers | Coater and Developer | 150mm | 1 | as is where is | ||
| 86460 | Tazmo/Semix | TZP | photoresist coater and developer track | 150 mm | 1 | as is where is | immediately | |
| 84084 | TEL Tokyo Electron | MARK II Clean Track | Dual Block Coater / Developer | 300mm | 1 | as is where is | immediately | |
| 86253 | TEL TOKYO ELECTRON | 2985-429208-W4 | ACT 12 2985-429208-W4 ADH SUB UNIT BASE ASSY ADHESIVE MODULE | 300 mm | 1 | as is where is | immediately | |
| 92781 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92783 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92784 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92785 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92786 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92789 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2007 | 1 | as is where is | |
| 92791 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92793 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 1 | as is where is | ||
| 92794 | TEL Tokyo Electron | LITHIUS | Photoresist coater and developer track (Track) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 93892 | TEL Tokyo Electron | ACT-12(PRB) 1C3D | Photoresist Coater and Developer track | 300 mm | 1 | as is where is | immediately | |
| 94576 | TEL Tokyo Electron | LITHIUS | SINGLE TRACK | 300 mm | 1 | as is where is | ||
| 96386 | TEL Tokyo Electron | Lithius | Lithography Coater Developer | 31.05.2007 | 0 | as is where is | immediately | |
| 96652 | TEL Tokyo Electron | Mark 7 | Photoresist coater / developer track 1c 1d | 200 mm | 30.06.1996 | 1 | as is where is | immediately |
| 97036 | TEL Tokyo Electron | LITHIUS | Track Coater Developer | 300 mm | 31.05.2012 | 1 | as is where is | |
| 98182 | TEL Tokyo Electron | LITHIUS | COT/DEV | 300 mm | 1 | as is where is | ||
| 98306 | TEL Tokyo Electron | Mark-Vz | Coater/Developer 1C 2D | 31.05.1995 | 1 | as is where is | ||
| 99547 | TEL TOKYO ELECTRON | ACT12(1C2D) | Photoresist coater and developer track | 300 mm | 31.08.2003 | 1 | as is where is | immediately |
| 99873 | TEL Tokyo Electron | Mark Vz | 1C2D+WEE Track | 150 mm | 30.11.1994 | 1 | inquire | |
| 102407 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 31.05.2006 | 1 | as is where is | |
| 102408 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102409 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102410 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102411 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102412 | TEL Tokyo Electron | LITHIUS | Coat / Develop Track | 300 mm | 1 | as is where is | ||
| 102807 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) | 300 mm | 31.07.2005 | 1 | as is where is | |
| 102808 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) 248 NM PROCESS | 300 mm | 1 | as is where is | ||
| 102809 | TEL Tokyo Electron | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) | 300 mm | 31.05.2005 | 1 | as is where is | immediately |
| 102897 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 31.05.1998 | 1 | as is where is | immediately |
| 102898 | TEL Tokyo Electron | Clean Track ACT12 | Photo Resist Coat and Develop System | 300 mm | 31.05.1998 | 1 | as is where is | immediately |
| 102899 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102900 | TEL Tokyo Electron | ACT 8 | Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102901 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, Dual Block, 4C 4D | 200 mm | 1 | as is where is | immediately | |
| 102902 | TEL Tokyo Electron | Clean Track ACT8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102903 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, dual block, 3C 4D | 200 mm | 1 | as is where is | immediately | |
| 102904 | TEL Tokyo Electron | ACT 8 | DUV Photo Resist Coat and Develop System, 2C,2D,ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
| 102905 | TEL Tokyo Electron | Clean Track ACT8 | Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML | 200 mm | 31.05.1998 | 2 | as is where is | immediately |
| 102908 | TEL Tokyo Electron | Clean Track ACT 8 | Photo Resist Coat and Develop System DUV, Single Block, 2c, 2d, Canon I/F | 200 mm | 31.05.1999 | 1 | as is where is | immediately |
| 102909 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102910 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102911 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102912 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102913 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102914 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102915 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat and Develop System | 200 mm | 1 | as is where is | ||
| 102916 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102917 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102918 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102919 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102920 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102921 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102922 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102923 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Coat System | 200 mm | 1 | as is where is | ||
| 102924 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.1997 | 1 | as is where is | |
| 102925 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 31.05.2000 | 1 | as is where is | |
| 102926 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102927 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102928 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102929 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102930 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102931 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102932 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102933 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102934 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102935 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102936 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102937 | TEL Tokyo Electron | Clean Track Mark7 | Photo Resist Develop System | 200 mm | 1 | as is where is | ||
| 102938 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | |
| 102939 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 102940 | TEL Tokyo Electron | Clean Track Mark8 | Photo Resist Coat and Develop System | 200 mm | 31.05.1996 | 1 | as is where is | immediately |
| 103147 | TEL Tokyo Electron | I/F Block (Mark8 - i11D) | Track interface block for Nikon i11D | 200 mm | 31.05.1997 | 1 | as is where is | |
| 103622 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103623 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK (for NIKON S205) | 300 mm | 31.05.2006 | 1 | as is where is | |
| 103624 | TEL Tokyo Electron | LITHIUS | SINGLE BLOCK 2C/3D system (for NIKON S308) | 300 mm | 31.05.2004 | 1 | as is where is | |
| 103625 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103626 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103627 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103628 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103629 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103630 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103631 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103632 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103633 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 103634 | TEL Tokyo Electron | LITHIUS | High Reliability and Productivity Coater Developer | 300 mm | 1 | as is where is | ||
| 105834 | Tel Tokyo Electron | Lithius | Photoresist Coater and Developer Track | 300 mm | 30.06.2007 | 1 | as is where is | immediately |