Axcelis Purion M Medium Current Ion Implanter for Sale

-Still installed in the fab
-Shut down since August 2024

-The equipment was operational in the wafer fab up until August 2024. -The equipment will be provided decontaminated, in situ, in the wafer fab, and buyer is responsible for fab out costs -The format of the sale is closed  bidding. -The equipment can be inspected by appointment -The deadline for  submission of bids is 8th January 2025
-set up for open cassette 150 mm wafer loading
-CE marked
-Can be inspected by appointment.
-See attached photos for details
The Purion M ion implanter allows a broad-range of mid-current implants to be performed.
It also has a high energy capability.
Purity
It has a Hybrid beamline with magnetic and electrostatic filters.
Precision
Precise angle control with in-situ X and Y measurement. Constant Focal Length Scanning allow stable beam dose, angle, energy, and density across the whole wafer surface.
Productivity
EternaTM ELS source with energy range (2KeV – 1 MeV).
High-speed Purion End Station with throughput up to 500 WPH.
Suitable for SiC doping  with high Al+ beam current and hot implant (up to 650°C).