Meyer Burger MAiA 2.1 PlasmaMax PECVD Tool for Di-electric layer deposition (SiN, SiO) for Sale

At SDI-fabsurplus, we currently have several deposition systems that are no longer needed and which we would therefore like to sell. The systems have already been removed from the FAB and are stored in a heated warehouse since June 2024.
If you are interested in the systems or parts of them, we would be happy to discuss further details or offer an on-site inspection.

-an industrial-scale PECVD system (total weight approx. 19 tons).
-in good condition and working order before removal to warehouse.

Major parts included:-

Pumps (Busch)
Valves (Hamlet)
Pneumatics (Festo)
Vacuum valves (VAT)
Digital flow switches (SMC)
PLCs (Beckhoff)
Power supply units (Phoenix Contact)
Sensors (Sick)
Pressure switches (MKS)
Contactors, switches and relays (Eaton)
Mass flow meters (Bronkhorst)
Electric motors (Lenze)
Linear actuators (Elero)
Infrared heaters (Heraeus)
Magnetron heads (Muegge)
Microwave power supplies (Muegge)
Side channel blowers (Hapro)

4 x pcs. Cobra BC 1000 F pumps, including a refurbished pump that has not been used again and was
purchased as a backup
3 x pcs. Cobra BC 2000 F pumps

The system was used to coat silicon wafers with dielectric layers (silicon nitride, silicon oxide) or with amorphous
silicon as part of R&D work. Systems of this type were used in a modified form by PV manufacturers worldwide.

It has a modular design consisting of several chambers positioned one behind the other. The vapor phase deposition
itself took place in the two process chambers of the system. In addition to the two process chambers, there are three
modules for transfer, one between the two process chambers and two for transferring carriers in and out of the
system. "Carriers" here are transport racks made of carbon fiber on which several samples (silicon wafers) are
positioned horizontally in recesses provided for this purpose. The carrier passes through the system on driven
transport rollers in a continuous process. The individual chambers are separated from each other by airlocks. The
individual chambers are evacuated via high vacuum pumps.

Each chamber is closed at the top by a solid lid, which is attached to the side of the chamber and can be swung open
and closed by means of a drive.
The system is located in heated storage and is disassembled into its individual
modules ready for loading.
The dimensions and weights are as follows:
Infeed module: L × W × H [mm]: 2058 × 2997 × 2035, [kg]: 2500
Process module 1: L × W × H [mm]: 2200 × 3605 × 2054, [kg]: 4600
Buffer-out module BMO [mm]: 920 × 3002 × 2336, [kg]: 1600
Transfer module [mm]: 2042 × 2997 × 2035, [kg]:2500
Process module 2 [mm]: 2200 × 3605 × 2054, [kg]: 5000
Discharge module [mm]: 2072 × 3002 × 2336, [kg]: 2500
This results in a total of 6 packages with a total mass of approx. 19 tons.
The process chambers, including the chamber lids, are made of stainless steel.
All other modules, including the chamber lids, are made of an aluminum alloy
Due to its modular design, the system can theoretically also be operated as a system with only one process chamber
without a second process chamber and without the transfer module.
It should be noted that samples - these can also be made of a material other than silicon - must not exceed a height
of 5 mm on a separately produced transport carrier.
The cleanliness and general condition of the system correspond to eight years of operation within the scope of R&D.
The process chambers contain larger quantities of solid material, on the one hand in coherent porous layers and on
the other hand in the form of dust.
The same applies to the components from the exhaust gas lines of the two process chambers, i.e. the pipelines via
which the chambers were evacuated using the high vacuum pumps and valves located in the exhaust gas line.
The above-mentioned coatings and dusts consist of the following substances:
• Amorphous silicon nitride, SiN x , coherent layers and dust
• Amorphous silicon, dust
• Amorphous silicon dioxide, SiO x , continuous layers and dust
• Amorphous aluminum oxide, AlO x , continuous layers and dust
Boron-doped amorphous silicon nitride, continuous layers and dust
Phosphorus-doped amorphous silicon nitride, contiguous layers and dust
Boron-doped amorphous silicon, dust
Phosphorus-doped amorphous silicon, dust
The components coated with the above-mentioned substances are essentially easily removable steel sheets that serve
as coating protection and with which the process chambers are lined.
It is estimated that the proportion by weight of plant components contaminated with the above-mentioned
substances is < 5 %