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Evatec Solaris S151 Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used Evatec Solaris S151 Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO.
Please click on the "Get Quote" button at the end of the Solaris S151 description, if you'd like to get a quotation, photos and specifications of this Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This Evatec Solaris S151 Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


Evatec Solaris S151 Equipment Details

SDI ID: 113328
Manufacturer: Evatec
Model: Solaris S151
Description: Multi-chamber sputtering system for Ag, Al, W, TCO ITO and AZO
Version: 156 mm square (200 mm)
Vintage: 01.06.2015
Quantity: 1
Sales Condition: as is where is
Lead Time: immediately
Sales Price: Inquire
Comments:

At SDI-fabsurplus, we currently have several deposition systems that are no longer needed and which we would therefore like to sell. The systems have already been removed from the FAB and are stored in a heated warehouse.
If you are interested in the systems or parts of them, we would be happy to discuss further details or offer an on-site inspection.

EVATEC SOLARIS S151
Multi-chamber sputtering system

Brief description of the system
This system is a high-speed sputtering system for single wafers, which is designed similarly to high-
throughput production systems used in the optical disk systems industry for the production of DVD
and Blu-ray discs.

The system consists of a handling area with an automated unit for feeding and discharging the
substrates and the coating area; a main chamber with 6 cathode chambers arranged in a circle.
Various plasma processes (RF or DC, also reactive) or other substrate treatments (e.g. heating) can be
carried out using these sources. Equipment of the 6 cathode chambers: 2x sources with a diameter of
30 cm each, 1x heating source, 3x multisource (currently unused).

Condition of the system

During its operating time, the system has undergone customization to one of the coating
chambers and the software.
The SOLARIS S151 will continue to be built and sold by the manufacturer.
Depositions with silver, aluminium, possibly tungsten and the TCO layers ITO and
AZO were carried out on the SOLARIS S151. Consequently, residues of these materials can be found
inside some of the chambers.

After its last use, the system was taken out of operation and packed; it is currently stored in a
weather-protected, temperature-controlled warehouse.
Substrate sizes and throughput (for typical configurations):
Processable substrates: with ∅ 200 mm or 156 mm × 156 mm edge length
Maximum thickness: 2 mm
Capacity (depending on configuration and layer structure): Max. 1200 substrates per hour
Cycle time < 3 seconds.
Dimensions and weight of the system
Main system dimensions: L x W x H [cm] = 335 x 225 x 155
Weight of main system: 3.3 t
Media supply
Gases: Argon, oxygen, forming gas (Ar:H2 = 95:5), nitrogen
Compressed air
Cooling water
Exhaust air


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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