ASML AT1100B Twinscan DUV Lithography exposure system 193 nm for Sale

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The ASML AT 1100 Twinscan lithography system is designed to enable 100 nm volume manufacturing of 300 mm wafers.
The Zeiss Starlith 1100 lens uses ArF illumination, has 80,000 pixels and a numerical aperture variable between 0.75 to 0.50.
Calcium Fluoride (CaF2) is used for critical lens elements.
High transmission coatings are used to increase available illumination.
The lens is designed for low aberrations.
With a a 20 watt, 4 kHz laser, throughput is around 100 wph for a 10 mJ/cm2 dose.
The system uses a Twinscan stage, which is designed to allow better focusing by pre-scanning the wafer at a separate metrology position where the wafer is fully mapped in 3D prior to the second exposure stage. By aligning the wafer on the metrology stage, better throughput and intensity are also achieved.The scan speed of the twinscan stage is 320 mm. The system features z- interferometers for focus control.
The lens is balanced to allow 70 nm dynamics.

Key performance specifications:-

• Variable NA 0.75 to 0.50
• Resolution better than or equal to 100 nm
• Field size 26 mm x 32 mm
• Laser: 20 Watt 4 kHz
• Overlay to within 20 nm
• Throughput 93 wph or better

Laser type: Cymer Nanolith 7600A