Picosun P1000 High Volume ALD system for batch coating of parts for Sale

General Specifications:
The PICOSUN® P-1000 ALD system is designed for batch coating of various 3D items such as mechanical machinery parts, glass or metal sheets, coins, watch parts and jewelry, lenses, optics, and medical devices and implants.

Atomic Layer Deposition (ALD) is the most advanced thin film coating and
surface processing technology of today. ALD creates ultra-thin films of
various materials - oxides, nitrides, sulphides, carbides, fluorides, metals,
even polymers - on practically all kinds of surfaces with digitally precise
and repeatable control over film thickness, uniformity, composition, and
conformality. ALD films are pinhole-, crack-, and defect-free by nature. The
ALD process takes place in vacuum at relatively low temperatures, allow-
ing its application also to sensitive surfaces.
ALD has a central, well-established role in modern semiconductor indus-
tries. Functional material layers manufactured with ALD enable constantly
miniaturizing integrated circuit (IC) components for faster and more reli-
able computing, mobile communications, and data transfer and storage.

Some materials which have been deposited include the following:-

Al2O3 SiO2 TiO2 HfO2 ZnO Ta2O3 TiN CeO2 Pt

Typical substrate size and type

    All kinds of 3-dimensional items such as mechanical machinery parts, glass or metal sheets, coins, watch parts and jewelry, lenses, optics, and medical equipment, surgical implants and implantable devices

Processing temperature and capacity

    50 – 400°C

Typical processes

    Al2O3, ZnO, TiO2

Substrate loading

    Manual loading with loading accessory (e.g. forklift cart)

Precursors

    Liquid, solid, gas, ozone
    Level sensors, cleaning and refill service
    Up to 10 sources with 6 separate inlets
    Up to 10 sources with 6 separate inlets

The PICOSUN® P-1000 ALD system is designed for batch processing of various 3-dimensional items such as mechanical machinery parts, coins, watch parts and jewelry, lenses, optics, and medical equipment, surgical implants and implantable devices in a production environment. The main applications include various passivation and barrier layers to significantly improve the performance and lifetime of the coated items. The PICOSUN® P-1000 ALD system offers innovative and agile design to enable the highest quality ALD depositions with excellent uniformity, maximum yields, minimum system downtime and low cost-of-ownership with production-proven processes.

Technical features
Substrate size and type 156 mm x 156 mm solar Si wafers in batches of 50/100 pcs (both sides/back-to-back)
Up to 300 mm x 300 mm glass sheets in batches of 10-20 pcs
Large batches of 3D objects (e.g. watch parts, jewelry, coins, medical implants, machined parts)
Powder and particle substrates
Roll-to-roll, max. 300 mm width substrate
Porous, through-porous, and HAR samples
Process temperature 50 - 500 °C
Substrate loading options Manual loading with a pneumatic lift
Semi-automatic loading with a linear inline loader
Fully automatic loading with an industrial robot
Precursors Liquid, solid, gas, ozone
Level sensors, cleaning and refill service
Up to 6 sources with 4 separate inlets
Weight 400 + 300 kg
Dimensions (W x H x D) 149 cm x 191 cm x 111 cm