SDI fabsurplus.com is pleased to announce the availability of the following listed used TEL Tokyo Electron Clean Track ACT8 Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML.
Please click on the "Get Quote" button at the end of the Clean Track ACT8 description, if you'd like to get a quotation, photos and specifications of this Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML, and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This TEL Tokyo Electron Clean Track ACT8 Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.
|Manufacturer:||TEL Tokyo Electron|
|Model:||Clean Track ACT8|
|Description:||Photo Resist Coat and Develop System, DUV,Single Block, 2c, 2d, ASML|
|Sales Condition:||as is where is|
|Sales Price (each):||Inquire|
DUV, Single Block, 2C2D1IFB, 3PHP, Right to Left Flow, 4UNCs, ASML PAS5500
1. Maker : TEL/Tokyo Electron Limited
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The data provided herein is not an offer capable of acceptance.
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Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.
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