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12 inch PARTIAL Wafer Fab Line, including 300 mm equipment from ASML, AMAT, TEL, Canon, Nikon and KLA etc. for Sale


SDI fabsurplus.com is pleased to announce the availability of the following listed used 12 inch PARTIAL Wafer Fab Line, including 300 mm equipment from ASML, AMAT, TEL, Canon, Nikon and KLA etc..
Please click on the "Get Quote" button at the end of the PARTIAL description, if you'd like to get a quotation, photos and specifications of this Wafer Fab Line, including 300 mm equipment from ASML, AMAT, TEL, Canon, Nikon and KLA etc., and your request for this equipment will be forwarded to our SDI sales representatives automatically.
This 12 inch PARTIAL Wafer Fab Line, including 300 mm equipment from ASML, AMAT, TEL, Canon, Nikon and KLA etc. is available for immediate sale.
Crating, refurbishment and delivery for this equipment can be quoted on request.


12 inch PARTIAL Equipment Details

SDI ID: 111349
Manufacturer: 12 inch
Model: PARTIAL
Description: Wafer Fab Line, including 300 mm equipment from ASML, AMAT, TEL, Canon, Nikon and KLA etc.
Version: 300 mm
Vintage: 01.06.2010
Quantity: 94
Sales Condition: as is where is
Lead Time: immediately
Sales Price (each): Inquire
Comments:

A partial line of 12 inch wafer fab equipment for sale. Please refer to the attached list of the available tools below, and, attached in an excel file.

List No Manufacturer Model Description Process Area
261 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE Cluster TOOL (Cent/W_M1_BiCS) DRY ETCH
244 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Nor_BiCS) DRY ETCH
245 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Nor_BiCS) DRY ETCH
246 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Ti) DRY ETCH
247 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Ti) DRY ETCH
248 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Ti) DRY ETCH
249 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/Ti) DRY ETCH
250 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_BiCS) DRY ETCH
251 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_BiCS) DRY ETCH
252 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_BiCS) DRY ETCH
253 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_BiCS) DRY ETCH
256 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_GC) WITH 4 CHAMBERS DRY ETCH
259 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_M1_BiCS) DRY ETCH
260 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_M1_BiCS) DRY ETCH
257 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_M1) DRY ETCH
258 Applied Materials Centris MESA 2 Dry Etch Cluster Tool Poly/RIE(Cent/W_M1) DRY ETCH
254 Applied Materials Centris Minos Dry Etch Cluster Tool Poly/RIE(Cent/Nor) DRY ETCH
255 Applied Materials Centris Minos Dry Etch Cluster Tool Poly/RIE(Cent/W_FG) DRY ETCH
77 Applied Materials Centura Epitaxial Deposition with 4 chambers LP
241 Applied Materials Centura Minos Dry Etch Cluster Tool Poly/RIE(Cent/Nor) DRY ETCH
242 Applied Materials Centura Minos Dry Etch Cluster Tool Poly/RIE(Cent/Nor) DRY ETCH
243 Applied Materials Centura Minos Dry Etch Cluster Tool Poly/RIE(Cent/Nor) DRY ETCH
103 Applied Materials SEMVision G4 Defect Review SEM Metrology
104 Applied Materials SEMVision G4 Defect Review SEM Metrology
100 Applied Materials Verity 2+ CD-SEM Metrology
101 Applied Materials Verity 2+ CD-SEM Metrology
102 Applied Materials Verity 4i+ CD-SEM Metrology
1 Applied Materials VIISta-HCPt High Current Implanter Implant
6 ASML XT-1700Fi Immersion Lithography Lithography
10 ASML XT-1700Fi Immersion Lithography Lithography
12 ASML XT-1700Fi Immersion Lithography Lithography
14 ASML XT-1900Gi Immersion Lithography Lithography
17 Canon ES5a KrF_DUV Lithography
18 Canon ES5a KrF_DUV Lithography
19 Canon ES5a KrF_DUV Lithography
20 Canon ES5a KrF_DUV Lithography
186 EBARA EAC300bi-hv CMP RIMEN process CMP
187 EBARA EAC300bi-hv CMP RIMEN process CMP
95 Hitachi CG4100 CD-SEM Metrology
96 Hitachi CG4100 CD-SEM Metrology
97 Hitachi CG4100 CD-SEM Metrology
98 Hitachi S-9380 CD-SEM Metrology
99 Hitachi S-9380 CD-SEM Metrology
42 KLA Archer-100 Overlay Measurement Metrology
43 KLA Archer-100 Overlay Measurement Metrology
44 KLA Archer-100 Overlay Measurement Metrology
45 KLA Archer-100 Overlay Measurement Metrology
46 KLA Archer-100 Overlay Measurement Metrology
47 KLA Archer-100 Overlay Measurement Metrology
48 KLA Archer-300 Overlay Measurement Metrology
49 KLA Archer-300 Overlay Measurement Metrology
108 KLA SP1-DLS Wafer Particle Detection (Surfscan) Metrology
81 Kokusai Quixace Vertical Furnace ONO Process LP
80 Kokusai Quixace Ultimate Vertical Furnace LP TiN Process LP
235 Lam e5-Exelan ES Dry Etch Cluster Tool Exelan(ES/Al_M0) DRY ETCH
236 Lam e5-Exelan ES Dry Etch Cluster Tool Exelan(ES/Al_M0) DRY ETCH
85 Lam SABRE Copper Electroplating METAL
237 Lam V2-Exelan 45ES Dry Etch Cluster Tool Exelan(ES/Nor) DRY ETCH
238 Lam V2-Exelan 45ES Dry Etch Cluster Tool Exelan(ES/Nor) DRY ETCH
239 Lam V2-Exelan 45ES Dry Etch Cluster Tool Exelan(ES/Nor) DRY ETCH
240 Lam V2-Exelan 45ES Dry Etch Cluster Tool Exelan(ES/Nor) DRY ETCH
210 Lam Vector Express SiN CVD Cluster tool TV-SiN process CVD
211 Lam Vector Express SiN CVD Cluster tool TV-SiN process CVD
105 Nikon AMI3000 Wafer Defect Inspection Metrology
106 Nikon AMI3000 Wafer Defect Inspection Metrology
107 Nikon AMI3000 Wafer Defect Inspection Metrology
21 Nikon S207D KrF_DUV Lithography
3 Nikon S308F ArF(Dry) Lithography
4 Nikon S308F ArF(Dry) Lithography
5 Nikon S308F ArF(Dry) Lithography
2 Nissin Exceed3000AH High Current Implanter Implant
78 TEL A303i Vertical Furnace LP-TEOS Process LP
79 TEL A303i Vertical Furnace LP-TEOS Process LP
52 TEL ACT 12 Photoresist Coater and Developer Track Litho
53 TEL ACT 12 Photoresist Coater and Developer Track Litho
209 TEL Certas LEAGA H2O CVD Silica process CVD
82 TEL Indy Advance Vertical Furnace Th-ALD-SiN Process LP
83 TEL Indy Irad Vertical Furnace ULT-SiO Process LP
7 TEL Lithius ArF(Dry) Coater and Developer Lithography
8 TEL Lithius ArF(Dry) Coater and Developer Lithography
9 TEL Lithius ArF(Dry) Coater and Developer Lithography
11 TEL Lithius ArF(Dry) Coater and Developer Lithography
13 TEL Lithius ArF(Dry) Coater and Developer Lithography
15 TEL Lithius ArF(Immersion) Coater and Developer Lithography
22 TEL Lithius KrF Coater and Developer Lithography
23 TEL Lithius KrF Coater and Developer Lithography
24 TEL Lithius KrF Coater and Developer Lithography
16 TEL Lithius Pro ArF(Immersion) Coater and Developer Lithography
232 TEL Telius DRM Dry Etch Cluster Tool DRM(ZL) DRY ETCH
233 TEL Telius DRM3 Dry Etch Cluster Tool DRM3(L-power) DRY ETCH
234 TEL Telius DRM3 Dry Etch Cluster Tool DRM3(L-power) DRY ETCH
84 ULVAC Entron EX Co PVD cluster tool Co-Ti/TiN Process METAL PVD
93 ULVAC Entron EX(SIS-TiN) PVD Cluster tool Liner BM Process METAL PVD
94 ULVAC Entron EX(SIS-TiN) PVD Cluster tool Liner BM Process METAL PVD

 


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The data provided herein is not an offer capable of acceptance.
The information contained on this page is, to our knowledge and information, accurate, but it may contain errors and therefore we do not warrant the completeness or accuracy of the information contained on this page.
Any offer by you to purchase the equipment described on this page shall be subject to our standard terms and conditions of sale.

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